Author
Wang Yuan
Other affiliations: Xi'an Jiaotong University
Bio: Wang Yuan is an academic researcher from Railway Institute. The author has contributed to research in topics: Thin film & Sputter deposition. The author has an hindex of 2, co-authored 2 publications receiving 10 citations. Previous affiliations of Wang Yuan include Xi'an Jiaotong University.
Papers
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TL;DR: In this paper, a strategy integrating discrete wavelet transform and fractal geometry concepts was developed for analyzing the anisotropy of surface structure of Cu-W thin films, and the results indicated that the agglomeration of thin films occurs primarily during annealing process.
Abstract: Cu–W films were deposited on Al 2 O 3 substrates by magnetron sputtering and then annealed in Ar gas at different temperatures for an hour. The evolution of surface morphology of the films during deposition and annealing was investigated by mathematical techniques. A strategy integrating discrete wavelet transform and fractal geometry concepts was developed for analyzing the anisotropy of surface structure of Cu–W thin films. The results indicated that the agglomeration of Cu–W thin films occurs primarily during annealing process. Based on the observation of positive correlation between the surface anisotropy and W-like phase transition, the relationship between the evolution of surface morphology of Cu–W thin films and the transition of phase structure was constructed. It was concluded that the changes of phase structures could have a significant impact on the anisotropy behavior of surface structure of Cu–W thin films.
10 citations
TL;DR: In this paper, the power spectra density was used to calculate the fractal dimension of the atomic force microscopy (AFM) images, and the results showed that fractal values increase with the film thickness and there is a relationship between fractal dimensions and resistivity of the films.
Abstract: Thin films of Cu-W were deposited on Si wafers by magnetron sputtering,and characterized by atomic force microscopy(AFM).Power spectra density was used to calculate the fractal dimension of the AFM images.The results show that the fractal dimension values increase with the film thickness and there is a relationship between the fractal dimension and the resistivity of the films.The change of resistivity is directly proportional to the fractal dimension.
2 citations
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TL;DR: In this paper, the topography of the annealed ITO thin film has very definite, dominant and predictable roles in the evolution of fractal and superstructures acquired by atomic force microscopy (AFM).
Abstract: In this work it has been noticed that the topography of the annealed ITO thin film has very definite, dominant and predictable roles in the evolution of fractal and superstructures in ITO thin film topographies acquired by atomic force microscopy (AFM). It is found that, the spectral roughness of the films increases as the annealing temperature increases. The PSDs of all thin films exhibit inverse power law variation at the high spatial frequency region suggesting the existence of fractal components in the surface topographies. The fractal dimensions of the ITO film surfaces are in the range of 2.67–2.91.
83 citations
TL;DR: In this article, an improved sol-gel process was used for the preparation of fluorine-doped tin oxide (FTO) films, where the coating and sintering processes were combined in the evaporation method, with the advantage of reduced probability of films cracking and simplified preparation process.
36 citations
TL;DR: In this paper, the structure evolution of immiscible Cu-W alloy thin films during preparation was investigated by X-ray diffraction, transmission electron microscopy and high resolution transmission electron microscope.
16 citations
TL;DR: In this paper, the effect of the substrate surface treating technique on the adhesive strength of Cu-W thin films was studied and it was found that the technique of ion beam assisting bombardment implanting of W particles can remarkably improve the adhesive property of the thin films and the critical load is doubled over than the sample only sputter-cleaned by ion beam.
10 citations
TL;DR: Fractal analysis reveals the surface roughness of nanostructure surfaces is decreased after the annealing process, and a mathematical modeling method is described for the observation of the fractal dimension in semiconductor nanost structure films.
10 citations