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Y. Li

Researcher at Rensselaer Polytechnic Institute

Publications -  31
Citations -  1213

Y. Li is an academic researcher from Rensselaer Polytechnic Institute. The author has contributed to research in topics: Light-emitting diode & Quantum well. The author has an hindex of 15, co-authored 29 publications receiving 1144 citations.

Papers
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Experimental analysis and theoretical model for anomalously high ideality factors (n≫2.0) in AlGaN/GaN p-n junction diodes

TL;DR: In this paper, it was shown that moderately doped unipolar heterojunctions as well as metal-semiconductor junctions, in particular the metal contact to p-type GaN, can increase the ideality factor to values greater than 2.
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Influence of junction temperature on chromaticity and color-rendering properties of trichromatic white-light sources based on light-emitting diodes

TL;DR: In this article, the luminous efficacy and color rendering indices of trichromatic white light sources were analyzed for a very broad range of wavelength combinations, and the peak emission wavelength, spectral width and output power of LEDs strongly depend on temperature and the dependencies for red, green, and blue LEDs were established.
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Carrier dynamics in nitride-based light-emitting p-n junction diodes with two active regions emitting at different wavelengths

TL;DR: In this article, the carrier transport and recombination dynamics of monolithic InGaN/GaN light-emitting p-n junction structures with two active regions are investigated.
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P-type conductivity in bulk AlxGa1-xN and AlxGa1-xN/AlyGa1-yN superlattices with average Al mole fraction > 20%

TL;DR: In this article, it was shown that the increased oxygen donor incorporation can result in a conductivity-type change from p-type to n-type in Mg-doped AlxGa1−xN.
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Ohmic contact technology in III nitrides using polarization effects of cap layers

TL;DR: In this article, a low-resistance ohmic contacts to III nitrides is presented, which employ polarization-induced electric fields in strained cap layers grown on lattice mismatched III-nitride buffer layers.