Y
Yoshihiro Sato
Researcher at The Furukawa Electric Co., Ltd.
Publications - 23
Citations - 345
Yoshihiro Sato is an academic researcher from The Furukawa Electric Co., Ltd.. The author has contributed to research in topics: Layer (electronics) & Field-effect transistor. The author has an hindex of 10, co-authored 23 publications receiving 345 citations.
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Patent
Semiconductor electronic device
TL;DR: In this article, a semiconductor electronic device comprises a substrate; a buffer layer formed on the substrate, the buffer layer including not less than two layers of composite layer, in which a first semiconductor layer formed of a nitride-based compound semiconductor, having a lattice constant smaller than a substrate and a thermal expansion coefficient larger than a thermalexpansion coefficient of the substrate; and an intermediate layer provided between the substrate and buffer layer, the intermediate layer being formed by a polysilicon-based semiconductor having a linear combination of lattice constants smaller than the first
Patent
Method for manufacturing electrostatic charge image developing toner
TL;DR: In this paper, a manufacturing method for obtaining toner particles having uniform dispersion of particles of a release agent in the toner particle without being exposed on the surfaces and having narrow and sharp distribution of the particle size in the manufacture of toner by an emulsion dispersion method was proposed.
Patent
Vertical type semiconductor device and manufacturing method of the device
Abstract: A vertical semiconductor element comprises: an electro-conductive substrate; a GaN layer, as a nitride compound semiconductor layer, which is selectively grown as a convex shape on one surface of the electro-conductive substrate through a buffer layer; a source electrode as a first electrode formed on the GaN layer; and a drain electrode as a second electrode formed on another surface of the electro-conductive substrate.
Patent
Semiconductor device, wafer structure and method for fabricating semiconductor device
Yoshihiro Sato,Takehiko Nomura +1 more
TL;DR: In this paper, two parallel trenches are formed between neighboring elements forming regions in a p-type semiconductor layer containing a plurality of arrayed element forming regions and a convex portion formed between the two trenches is cut in separating the semiconductor devices.
Patent
GaN-based semiconductor device and method of manufacturing the same
Shusuke Kaya,Seikoh Yoshida,Sadahiro Kato,Takehiko Nomura,Nariaki Ikeda,Masayuki Iwami,Yoshihiro Sato,Hiroshi Kambayashi,Koh Li +8 more
TL;DR: In this article, an active layer of a GaN-based semiconductor is formed on a silicon substrate and a trench is formed in the active layer and extends from a top surface of active layer to a depth reaching the silicon substrate.