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Zhong Chen

Researcher at Nanyang Technological University

Publications -  1114
Citations -  37928

Zhong Chen is an academic researcher from Nanyang Technological University. The author has contributed to research in topics: Chemistry & Catalysis. The author has an hindex of 80, co-authored 1000 publications receiving 28171 citations. Previous affiliations of Zhong Chen include Institute of High Performance Computing Singapore & National Institute of Education.

Papers
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Journal ArticleDOI

A novel detection scheme for high-resolution two-dimensional spin-echo correlated spectra in inhomogeneous fields.

TL;DR: The results reveal that the new sequence provides an attractive way to eliminate the inhomogeneous spectral line broadening for the spin-echo correlated spectrum and is a promising tool for the study of metabolites in metabonomics, even for the applications on in vivo and in situ high-resolution 2D NMR spectroscopy.
Journal Article

Vaginal reconstruction using perineal-thigh flaps with subcutaneous pedicle.

TL;DR: A technique of vaginal reconstruction using bilateral, perineal-thigh flaps with subcutaneous pedicle with good sensitivity in the wall of the artificial vagina because sensory nerves run through the flaps.
Journal ArticleDOI

Comparative study of BiVO4 and BiVO4/Ag2O on their properties and photocatalytic degradation mechanism

TL;DR: In this article , a BiVO4/Ag2O composite was prepared to promote the separation of photogenerated carriers of the visible light catalyst, which was used as a visible light catalyzer.
Book ChapterDOI

Extremely Wetting Pattern by Photocatalytic Lithography and Its Application

TL;DR: Lai et al. as mentioned in this paper defined superhydrophilicity and super-hydrophobicity based on the conventional water contact angle experiment, where if the contact angle is smaller than 5°, the surface is said to be super hydrophilic.
Journal ArticleDOI

Investigation on Key Parameters in the Fabrication of Stamps for Transfer Printing of Micro Devices

TL;DR: In this paper, the elastic modulus of posts is measured using the atomic force microscope and the Derjaguin, Muller, and Toporov model, and the authors subsequently explore the law of photoresist development under different design widths as well as development time, establish mathematical models, and offer relevant explanations for the formation of various developmental topographies.