Institution
ASML Holding
Company•Veldhoven, Netherlands•
About: ASML Holding is a company organization based out in Veldhoven, Netherlands. It is known for research contribution in the topics: Substrate (printing) & Extreme ultraviolet lithography. The organization has 5170 authors who have published 5078 publications receiving 59255 citations. The organization is also known as: ASM Lithography & ASML.
Topics: Substrate (printing), Extreme ultraviolet lithography, Lithography, Reticle, Photolithography
Papers published on a yearly basis
Papers
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03 Oct 1997TL;DR: In this paper, the displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which was fastened to a balancing unit (69, 149, 205).
Abstract: A positioning device (3, 97, 179) with a first displacement unit (25, 189) for displacing a first object holder (11, 181) and a second displacement unit (27, 191) for displacing a second object holder (13, 183). The object holders can be displaced by the positoning device alternately from a measuring position into an operational position and can be displaced by the respective displacement units independently of one another in the measuring position and in the operational position. The displacement units are provided with force actuators which each have a first part (47, 49; 117, 119; 215, 217) which is coupled to the relevant object holder and which is displaceable under the influence of a driving force relative to a second part (59, 61; 133, 135, 137, 139; 219, 221) which is fastened to a balancing unit (69, 149, 205) which is common to the two displacement units. The balancing unit is displaceably guided relative to a base (81, 209), so that reaction forces of the displacement units are converted into displacements of the balancing unit relative to the base, and mechanical vibrations in the balancing unit and the base are prevented. The use of the force actuators prevents the displacements of the balancing unit from disturbing the positions of the object holders relative to the base. The positioning device is further provided with a control unit (83, 169, 237) by means of which at least the parts (47, 49; 121, 123; 219, 221) directed parallel to an X-direction of the X-actuators (39, 41; 105, 107; 211, 213) coupled to the object holders are held in positions parallel to the X-direction. It is also prevented in this manner that positions of the object holders relative to the base are interfered with by rotations of the balancing unit caused by the reaction forces of the displacement units. The positioning device can be used in a lithographic device for the displacement of a semiconductor substrate relative to an exposure system of the lithographic device and for the displacement of a mask relative to the exposure system.
641 citations
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TL;DR: Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits as discussed by the authors. But some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.
Abstract: Extreme ultraviolet lithography extends photolithography to much shorter wavelengths and is a cost-effective method of producing more-advanced integrated circuits. Although some infrastructure challenges still remain, this technology is expected to begin high-volume microchip production within the next three years.
472 citations
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28 Jan 2008TL;DR: In this article, a lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is described, which includes a first radiation dose detector and a second radiation dose detectors, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux.
Abstract: A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
451 citations
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08 Aug 2006TL;DR: In this article, a method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate was proposed.
Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent and may include the intensity of TM- and TE-polarized radiation and their relative phase difference.
400 citations
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27 Feb 1998TL;DR: In this paper, the displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled, and the displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the second object holder into an intermediate position between the first and second positions.
Abstract: A positioning device has first and second object holders that are guided over a guiding surface extending parallel to an X-direction and parallel to a Y-direction perpendicular to the X-direction and which are displaceable over the guiding surface from a first position into a second position by means of a displacement system. The displacement system includes a first displacement unit and a second displacement unit to which the object holders can be alternately coupled. The first displacement unit is suitable for carrying out a first series of positioning steps of the first object holder in the first position and for displacing the first object holder from the first position into an intermediate position between the first and second positions. The second displacement unit is suitable for carrying out a second series of positioning steps of the second object holder in the second position, simultaneously with and independently of the first displacement unit, and for displacing the second object holder from the second position into the intermediate position. In the intermediate position, the object holders are exchanged, after which the first series of positioning steps can be carried out by the first displacement unit with the second object holder in the first position and the second series of positioning steps can be carried out by the second displacement unit with the first object holder in the second position. The positioning device is suitable for use in a lithographic device to carry out an exposure process with a first semiconductor substrate in an exposure position and, simultaneously therewith and independently thereof, a characterization process with a second semiconductor substrate in a characterization position.
361 citations
Authors
Showing all 5173 results
Name | H-index | Papers | Citations |
---|---|---|---|
Alex Q. Huang | 68 | 592 | 19774 |
Muhammad Arif | 63 | 826 | 16762 |
Wolfgang Osten | 52 | 715 | 10857 |
M Maarten Steinbuch | 51 | 630 | 11892 |
William N. Partlo | 44 | 192 | 5919 |
Igor V. Fomenkov | 43 | 176 | 5365 |
Michael Young | 40 | 158 | 8092 |
Kjeld S. E. Eikema | 37 | 181 | 3925 |
Alexander I. Ershov | 36 | 128 | 4038 |
Richard L. Sandstrom | 36 | 113 | 3673 |
Paul K. L. Yu | 34 | 315 | 4638 |
Palash P. Das | 33 | 105 | 2756 |
Jacobus E. Rooda | 33 | 324 | 4410 |
Vadim Yevgenyevich Banine | 32 | 266 | 4126 |
Erik Roelof Loopstra | 31 | 261 | 4816 |