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Institution

Cabot Corporation

CompanyBoston, Massachusetts, United States
About: Cabot Corporation is a company organization based out in Boston, Massachusetts, United States. It is known for research contribution in the topics: Carbon black & Carbon. The organization has 1279 authors who have published 1399 publications receiving 36736 citations.
Topics: Carbon black, Carbon, Alloy, Oxide, Tantalum


Papers
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Patent
Robert A. Hard1
27 Feb 1987
TL;DR: Disclosed is a process for the reduction of oxygen content in tantalum and/or columbium-containing material comprising heating the material under a hydrogen atmosphere in the presence of an oxygen-active metal as mentioned in this paper.
Abstract: Disclosed is a process for the reduction of oxygen content in tantalum and/or columbium-containing material comprising heating the material under a hydrogen atmosphere in the presence of an oxygen-active metal.

100 citations

Journal ArticleDOI
A. E. Germeles1
TL;DR: In this paper, the mixing of two miscible liquids of slightly different densities was considered, where one of them (cargo) was injected into a tank partially filled with the other (inventory), such that buoyancy and inertia act in concert on the plume produced by the cargo.
Abstract: We consider the mixing between two miscible liquids of slightly different density (< 10%) when one of them (cargo) is injected into a tank partially filled with the other (inventory). The injection of the cargo is such that buoyancy and inertia act in concert on the plume produced by the cargo. The two basic processes that govern the mixing of the two liquids in the tank are the entrainment of tank liquid by the plume and the tank circulation set up by this entrainment and by the plume discharge. Unlike plumes in an environment of infinite extent, the plume in this case changes its environment continuously, which, in turn, has a continuously-varying effect on the plume. A mathematical model for the mixing of the two liquids is presented, from which one can compute the tank stratification that may result when given amounts of cargo and inventory are thus mixed. Plume entrainment theory is used for the plume dynamics and a ‘filling-box’ model is used for the tank circulation. The partial differential equations of the model are integrated by an original and unique numerical method. The problem was also treated experimentally. The tank stratification is expressed in terms of a normalized density-difference variable δ. Except for some very localized large discrepancies, due to certain local effects not included in the model, computed and experimental profiles of δ agree very well, their maximum and average deviations being within 4 and 2%, respectively. It is found that values of the empirical plume parameters α and λ that are used commonly for steady plumes in environments of infinite extent are approximately right for the time-dependent plumes under consideration too.

99 citations

Patent
12 Feb 1998
TL;DR: Barium titanate-based particles having a coating comprising an oxide, hydrous oxide or organic acid salt of a metal other than barium or titanium, wherein at least 90 percent of said particles have a particle size less than 0.9 micrometer when said particles are dispersed by high shear mixing, useful in the fabrication of thin, fine-grained dielectric layers for multilayer ceramic capacitors with high breakdown voltage.
Abstract: Barium titanate-based particles having a coating comprising an oxide, hydrous oxide, hydroxide or organic acid salt of a metal other than barium or titanium, wherein at least 90 percent of said particles have a particle size less than 0.9 micrometer when said particles are dispersed by high shear mixing, useful in the fabrication of thin, fine-grained dielectric layers for multilayer ceramic capacitors with high breakdown voltage.

96 citations

Patent
17 Apr 1998
TL;DR: A polishing pad for polishing a semiconductor wafer which includes an open-celled, porous substrate having sintered particles of synthetic resin is described in this paper, where the porous substrate is a uniform, continuous and tortuous interconnected network of capillary passage.
Abstract: A polishing pad for polishing a semiconductor wafer which includes an open-celled, porous substrate having sintered particles of synthetic resin. The porous substrate is a uniform, continuous and tortuous interconnected network of capillary passage.

94 citations

Patent
05 Jun 1997
TL;DR: In this paper, the silicon-treated carbon black was used for improving the jetness, improving blue tone, improving the platewear, reducing the premix residue, modifying rheological properties, or improving waterfastness of ink and coating compositions.
Abstract: Ink and coating compositions are disclosed comprising a silicon-treated carbon black. The silicon-treated carbon black may have at least one attached organic group, and the ink and coating compositions may comprise a combination of silicon-treated carbon black products, with and/or without at least one attached organic group, and untreated carbon black. Methods are disclosed for improving the jetness, improving the blue tone, improving the platewear, reducing the premix residue, modifying rheological properties, or improving waterfastness, of ink and coating compositions by incorporating therein silicon-treated carbon black.

93 citations


Authors

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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20212
20204
20199
201818
201714
201613