Institution
Cabot Corporation
Company•Boston, Massachusetts, United States•
About: Cabot Corporation is a company organization based out in Boston, Massachusetts, United States. It is known for research contribution in the topics: Carbon black & Carbon. The organization has 1279 authors who have published 1399 publications receiving 36736 citations.
Topics: Carbon black, Carbon, Alloy, Oxide, Tantalum
Papers published on a yearly basis
Papers
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08 Jul 2005TL;DR: In this paper, the authors describe a process for forming conductive features from one or more inks and conductive feature formed from the processes, which includes a step of applying a first ink comprising a metal precursor to at least a portion of a first substrate to form an at least partially coated substrate.
Abstract: Processes for forming conductive features from one or more inks and conductive features formed from the processes. In one aspect, the process includes a step of applying a first ink comprising a metal precursor to at least a portion of a first substrate to form an at least partially coated substrate. In a second step, the first ink is contacted with a reducing agent, optionally derived from a second ink, under conditions effective to reduce the metal in the metal precursor to its elemental form.
91 citations
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23 Apr 2010TL;DR: In this article, the authors present a method for preparing slurries or composites that combine an aerogel component with a surfactant, binder and other ingredients, such as fibers.
Abstract: Compositions include an aerogel component and have low thermal conductivity. Methods for preparing slurries or composites include, for example combining the aerogel component with a surfactant, binder and other ingredients, such as, for instance, fibers. The compositions can be slurries that can be used in coating applications or self supporting rigid composites.
91 citations
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04 Jun 1997TL;DR: A chemical mechanical polishing slurry comprising an oxidizing agent, a fluoride containing additive and an abrasive was proposed in this article to remove tungsten and titanium from substrates.
Abstract: A chemical mechanical polishing slurry comprising an oxidizing agent, a fluoride containing additive and an abrasive and a method for using the fluoride containing additive chemical mechanical polishing slurry to remove tungsten and titanium from substrates.
90 citations
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12 Dec 2005TL;DR: In this paper, a process of producing a blanket is described and can involve forming an aqueous slurry of hydrophobic aerogels, fibers, and at least one wetting agent, drying the slurry to form a substantially dried product, and calendaring the substantially dry product to form the blanket.
Abstract: A process of producing a blanket is described and can involve forming an aqueous slurry of hydrophobic aerogels, fibers, and at least one wetting agent, drying the aqueous slurry to form a substantially dried product, and calendaring the substantially dried product to form the blanket. The blanket can be used in a variety of applications, including windows.
89 citations
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29 Oct 1998TL;DR: In this article, a modified particle with an attached group having formula (I) is disclosed, wherein A represents an aromatic group or an alkyl group; R 1 represents a bond; R 2 represents a stable free radical; and R 3 represents an aryl group.
Abstract: A modified particle is disclosed wherein a particle has an attached group having formula (I), wherein A represents an aromatic group or an alkyl group; R1 represents a bond, an arylene group, an alkylene group (i), (ii) or (iii), wherein R4 is an alkyl or alkylene group or an aryl or arylene group; R?2 and R3?, which can be the same or different, represent hydrogen, an alkyl group, an aryl group, -OR?5, -NHR5, -NR5R5?, or -SR5, wherein R5, which is the same or different, represents an alkyl group or an aryl group; and SFR represents a stable free radical. Also disclosed is a modified particle or aggregate having attached a group having formula (II), wherein CoupA represents an Si-containing group, a Ti-containing group, a Cr-containing group or a Zr-containing group; R?8 and R9?, which can be the same or different, represent hydrogen, an alkyl group, an aryl group, -OR?10, -NHR10, -NR10R10?, or -SR10, wherein R10 represents an alkyl group or an aryl group; SFR represents a stable free radical; and n is an integer of from 1 to 3. A modified particle having an attached -SFR or -X-SFR is additionally disclosed. Also, modified particles with attached polymers are also disclosed as well as methods of making the modified particles.
88 citations
Authors
Showing all 1279 results
Name | H-index | Papers | Citations |
---|---|---|---|
Plamen Atanassov | 73 | 439 | 21442 |
Marek Skowronski | 48 | 264 | 7679 |
Toivo T. Kodas | 47 | 240 | 8342 |
Andrew A. Peterson | 41 | 87 | 12292 |
Hong Liang | 39 | 297 | 5981 |
Mark J. Hampden-Smith | 35 | 162 | 5631 |
Karel Vanheusden | 31 | 89 | 9289 |
Paolina Atanassova | 29 | 66 | 2919 |
Narasi Sridhar | 27 | 202 | 3017 |
James A. Belmont | 25 | 52 | 2387 |
Berislav Blizanac | 22 | 44 | 4047 |
Andreas Zimmermann | 21 | 71 | 1193 |
Quint H. Powell | 21 | 45 | 1918 |
Klaus Kunze | 21 | 37 | 2074 |
Rimple Bhatia | 21 | 49 | 1380 |