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Institution

Cabot Corporation

CompanyBoston, Massachusetts, United States
About: Cabot Corporation is a company organization based out in Boston, Massachusetts, United States. It is known for research contribution in the topics: Carbon black & Carbon. The organization has 1279 authors who have published 1399 publications receiving 36736 citations.
Topics: Carbon black, Carbon, Alloy, Oxide, Tantalum


Papers
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Patent
08 Jul 2005
TL;DR: In this paper, the authors describe a process for forming conductive features from one or more inks and conductive feature formed from the processes, which includes a step of applying a first ink comprising a metal precursor to at least a portion of a first substrate to form an at least partially coated substrate.
Abstract: Processes for forming conductive features from one or more inks and conductive features formed from the processes. In one aspect, the process includes a step of applying a first ink comprising a metal precursor to at least a portion of a first substrate to form an at least partially coated substrate. In a second step, the first ink is contacted with a reducing agent, optionally derived from a second ink, under conditions effective to reduce the metal in the metal precursor to its elemental form.

91 citations

Patent
23 Apr 2010
TL;DR: In this article, the authors present a method for preparing slurries or composites that combine an aerogel component with a surfactant, binder and other ingredients, such as fibers.
Abstract: Compositions include an aerogel component and have low thermal conductivity. Methods for preparing slurries or composites include, for example combining the aerogel component with a surfactant, binder and other ingredients, such as, for instance, fibers. The compositions can be slurries that can be used in coating applications or self supporting rigid composites.

91 citations

Patent
04 Jun 1997
TL;DR: A chemical mechanical polishing slurry comprising an oxidizing agent, a fluoride containing additive and an abrasive was proposed in this article to remove tungsten and titanium from substrates.
Abstract: A chemical mechanical polishing slurry comprising an oxidizing agent, a fluoride containing additive and an abrasive and a method for using the fluoride containing additive chemical mechanical polishing slurry to remove tungsten and titanium from substrates.

90 citations

Patent
12 Dec 2005
TL;DR: In this paper, a process of producing a blanket is described and can involve forming an aqueous slurry of hydrophobic aerogels, fibers, and at least one wetting agent, drying the slurry to form a substantially dried product, and calendaring the substantially dry product to form the blanket.
Abstract: A process of producing a blanket is described and can involve forming an aqueous slurry of hydrophobic aerogels, fibers, and at least one wetting agent, drying the aqueous slurry to form a substantially dried product, and calendaring the substantially dried product to form the blanket. The blanket can be used in a variety of applications, including windows.

89 citations

Patent
29 Oct 1998
TL;DR: In this article, a modified particle with an attached group having formula (I) is disclosed, wherein A represents an aromatic group or an alkyl group; R 1 represents a bond; R 2 represents a stable free radical; and R 3 represents an aryl group.
Abstract: A modified particle is disclosed wherein a particle has an attached group having formula (I), wherein A represents an aromatic group or an alkyl group; R1 represents a bond, an arylene group, an alkylene group (i), (ii) or (iii), wherein R4 is an alkyl or alkylene group or an aryl or arylene group; R?2 and R3?, which can be the same or different, represent hydrogen, an alkyl group, an aryl group, -OR?5, -NHR5, -NR5R5?, or -SR5, wherein R5, which is the same or different, represents an alkyl group or an aryl group; and SFR represents a stable free radical. Also disclosed is a modified particle or aggregate having attached a group having formula (II), wherein CoupA represents an Si-containing group, a Ti-containing group, a Cr-containing group or a Zr-containing group; R?8 and R9?, which can be the same or different, represent hydrogen, an alkyl group, an aryl group, -OR?10, -NHR10, -NR10R10?, or -SR10, wherein R10 represents an alkyl group or an aryl group; SFR represents a stable free radical; and n is an integer of from 1 to 3. A modified particle having an attached -SFR or -X-SFR is additionally disclosed. Also, modified particles with attached polymers are also disclosed as well as methods of making the modified particles.

88 citations


Authors

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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20212
20204
20199
201818
201714
201613