Freescale Semiconductor

About: Freescale Semiconductor is a based out in . It is known for research contribution in the topics: Layer (electronics) & Signal. The organization has 7673 authors who have published 10781 publications receiving 149123 citations. The organization is also known as: Freescale Semiconductor, Inc..

Digital and rf system and method therefor

Abstract: A stacked die system (10) has a first die (16) having a first surface with active circuitry, a second die (18) having a first surface with active circuitry, and a conductive shield (28) interposed between the first surface of the first die and the first surface of the second die. In one embodiment, the distance between the first surfaces of the first and second die is less than one millimeter. The stacked die system may also include a package substrate (12) where the active circuitry of the first and second die are electrically connected to the package substrate. The electrical connections may be formed using wire bonds (56, 58, 60, 62). Alternatively, the first die may be connected to the package substrate in a flip chip configuration. In one embodiment, the active circuitry of the first die generates RF signals where the shield helps protect the RF signals from interference caused by the active circuitry of the second die.

Geometry Dependence of Total-Dose Effects in Bulk FinFETs

Abstract: The total ionizing dose (TID) response of bulk FinFETs is investigated for various geometry variations, such as fin width, channel length, and fin pitch. The buildup of oxide-trapped charge in the shallow trench isolation turns on a parasitic transistor, leading to increased leakage current (higher IOFF.) The TID-induced degradation increases with decreasing fin width. Transistors with longer channels degrade less than those with shorter channels. Transistors with large fin pitch degrade more, compared to those with narrow fin pitch. TCAD simulations are used to analyze the buildup of trapped charge in the trench isolation oxide and its impact on the increase in leakage current. The strong influence of charge in the STI in narrow-fin transistors induces a parasitic leakage current path between the source and the drain, while in wide-fin devices, for the same amount of trapped charge in the isolation oxide, the subsurface leakage path is less effective.

Method of making a contact structure

Abstract: The horizontal surface area required to contact semiconductor devices, in integrated circuits fabricated with trench isolation, is minimized without degrading contact resistance by utilizing the vertical surface area of the trench sidewall. A trench isolation region (40) is formed within the semiconductor substrate (12). A doped region (74, 96) is then formed such that it abuts the trench sidewall (24). A portion (56, 110) of the trench sidewall (24), abutting the doped region (74, 96), is then exposed by forming a recess (55, 112) within the trench isolation region (40). A conductive member (66, 114, 118) is then formed such that it is electrically coupled to the doped region (74, 96) along the exposed trench sidewall, as well as along the major surface (13) of the semiconductor substrate (12), and results in the formation of a low resistance contact structure.

Adaptive equalizer for communication channels

Abstract: Adaptive equalizers for a communication channel and corresponding methods of equalizing are described. The adaptive equalizer includes: a fixed pre-filter configured to be coupled to a received signal and provide a pre-filter signal; an adaptive filter coupled to and configured to compensate the pre-filter signal for changes in phase and amplitude; and an interference remover coupled to the adaptive filter and configured to reduce interference in the received signal.

Improving model-based OPC performance for the 65-nm node through calibration set optimization

Abstract: As lithography continues to increase in difficulty with low k1 factors, and ever-tighter process margins, model-based optical proximity correction (OPC) is being used for the majority of patterning layers. As a result, the engineering effort consumed by the development and calibration of OPC models is continuing to increase at an alarming rate. One of the major focal points of this effort is the increasing emphasis on improving the accuracy of the model-based OPC corrections. One of the major contributors to final OPC accuracy is the quality of the resist model. As a result of these trends, the number of sample points used to calibrate OPC models is increasing rapidly from generation to generation. However, this increase is largely due to an antiquated approach to the construction of these calibration sets, focusing on structure variations. In this study, a new approach to the calibration of a resist model will be proposed based upon the location of calibration structures within the actual resist space over which the resist model is expected to be predictive.