IBM

About: IBM is a company organization based out in Armonk, New York, United States. It is known for research contribution in the topics: Layer (electronics) & Cache. The organization has 134567 authors who have published 253905 publications receiving 7458795 citations. The organization is also known as: International Business Machines Corporation & Big Blue.

A mechanism for retrieving information using data encoded on an object

Abstract: A client computer (102) with a scanner (118) capable of scanning objects (115) for a code (117). The client computer (102) scans the object (115) of interest and translates the code (117) into a URL (Uniform Ressource Locator) that specifies both a server computer (122, 160) and the location within the server of information that is relevant to the object (115). The client computer (102) transmits the URL to the server computer (122, 160), receives the information related to the object (115) from the server computer (122, 160), and communicates the information to the customer.

True Atomic Resolution by Atomic Force Microscopy Through Repulsive and Attractive Forces

Abstract: The (1014) cleavage plane of calcite has been investigated by atomic force microscopy in water at room temperature. True lateral atomic-scale resolution was achieved; the atomic-scale periodicities as well as the expected relative positions of the atoms within each unit cell were obtained. Along monoatomic step lines, atomic-scale kinks, representing point-like defects, were resolved. Attractive forces on the order of 10-11 newton acting between single atomic sites on the sample and the front atoms of the tip were directly measured and provided the highest, most reliable resolution on a flat, well-ordered surface.

High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

Abstract: Detailed investigations of the limits of a new negative-tone near-UV resist (IBM SU-8) have been performed. SU-8 is an epoxy-based resist designed specifically for ultrathick, high-aspect-ratio MEMS-type applications. We have demonstrated that with single-layer coatings, thicknesses of more than 500 μm can be achieved reproducibly. Thicker resist layers can be made by applying multiple coatings, and we have achieved exposures in 1200 μm thick, double-coated SU-8 resist layers. We have found that the aspect ratio for near-UV (400 nm) exposed and developed structures can be greater than 18 and remains constant in the thickness range between 80 and 1200 μm. Vertical sidewall profiles result in good dimensional control over the entire resist thickness. To our knowledge, this is the highest aspect ratio reported for near-UV exposures and the given range of resist thicknesses. These results will open up new possibilities for low-cost LIGA-type processes for MEMS applications. The application potential of SU-8 is demonstrated by several examples of devices and structures fabricated by electroplating and photoplastic techniques. The latter is especially interesting as SU-8 has attractive mechanical properties.

The Organization of Computations for Uniform Recurrence Equations

Abstract: A set equations in the quantities ai(p), where i = 1, 2, · · ·, m and p ranges over a set R of lattice points in n-space, is called a system of uniform recurrence equations if the following property holds: If p and q are in R and w is an integer n-vector, then ai(p) depends directly on aj(p - w) if and only if ai(q) depends directly on aj(q - w). Finite-difference approximations to systems of partial differential equations typically lead to such recurrence equations. The structure of such a system is specified by a dependence graph G having m vertices, in which the directed edges are labeled with integer n-vectors. For certain choices of the set R, necessary and sufficient conditions on G are given for the existence of a schedule to compute all the quantities ai(p) explicitly from their defining equations. Properties of such schedules, such as the degree to which computation can proceed “in parallel,” are characterized. These characterizations depend on a certain iterative decomposition of a dependence graph into subgraphs. Analogous results concerning implicit schedules are also given.

High-Speed Arithmetic in Binary Computers

Abstract: Methods of obtaining high speed in addition, multiplication, and division in parallel binary computers are described and then compared with each other as to efficiency of operation and cost. The transit time of a logical unit is used as a time base in comparing the operating speeds of different methods, and the number of individual logical units required is used in the comparison of costs. The methods described are logical and mathematical, and may be used with various types of circuits. The viewpoint is primarily that of the systems designer, and examples are included wherever doing so clarifies the application of any of these methods to a computer. Specific circuit types are assumed in the examples.