KLA-Tencor

About: KLA-Tencor is a company organization based out in Milpitas, California, United States. It is known for research contribution in the topics: Wafer & Metrology. The organization has 3038 authors who have published 3281 publications receiving 45644 citations.

Methods and systems for utilizing design data in combination with inspection data

Abstract: Various methods and systems for utilizing design data in combination with inspection data are provided. One computer-implemented method for binning defects detected on a wafer includes comparing portions of design data proximate positions of the defects in design data space. The method also includes determining if the design data in the portions is at least similar based on results of the comparing step. In addition, the method includes binning the defects in groups such that the portions of the design data proximate the positions of the defects in each of the groups are at least similar. The method further includes storing results of the binning step in a storage medium.

A computationally efficient superresolution image reconstruction algorithm

Abstract: Superresolution reconstruction produces a high-resolution image from a set of low-resolution images. Previous iterative methods for superresolution had not adequately addressed the computational and numerical issues for this ill-conditioned and typically underdetermined large scale problem. We propose efficient block circulant preconditioners for solving the Tikhonov-regularized superresolution problem by the conjugate gradient method. We also extend to underdetermined systems the derivation of the generalized cross-validation method for automatic calculation of regularization parameters. The effectiveness of our preconditioners and regularization techniques is demonstrated with superresolution results for a simulated sequence and a forward looking infrared (FLIR) camera image sequence.

Focused beam spectroscopic ellipsometry method and system

Abstract: A method and system for spectroscopic ellipsometry employing reflective optics to measure a small region of a sample by reflecting radiation (preferably broadband UV, visible, and near infrared radiation) from the region. The system preferably has an autofocus assembly and a processor programmed to determine from the measurements the thickness and/or complex refractive index of a thin film on the sample. Preferably, only reflective optics are employed along the optical path between the polarizer and analyzer, a sample beam reflects with low incidence angle from each component of the reflective optics, the beam is reflectively focused to a small, compact spot on the sample at a range of high incidence angles, and an incidence angle selection element is provided for selecting for measurement only radiation reflected from the sample at a single, selected angle (or narrow range of angles). The focusing mirror preferably has an elliptical shape to reduce off-axis aberrations in the focused beam. Some embodiments include both a spectrophotometer and an ellipsometer integrated together as a single instrument. In such instrument, the spectrophotometer and ellipsometer share a radiation source, and radiation from the source can be focused by either the spectrophotometer or the ellipsometer to the same focal point on a sample. Preferred embodiments of the ellipsometer employ a rotating, minimal-length Rochon prism as a polarizer, and include a spectrometer with an intensified photodiode array to measure reflected radiation from the sample, and a reference channel (in addition to a sample channel which detects radiation reflected from the sample).

Search for Neutrinoless Double-Beta Decay in $^{136}$Xe with EXO-200

Abstract: Several properties of neutrinos, such as their absolute mass, their possible Majorana nature or the mechanisms that lead to small neutrino masses, are still unknown. The EXO-200 experiment is trying to answer some of these questions by searching for the hypothetical neutrinoless double beta decay of the isotope 136 Xe. This thesis describes an analysis of two years of detector data, which yields a lower limit on the half-life of neutrinoless double beta decay of 136 Xe of 1.1·10 25 years.

Apparatus and methods for detecting overlay errors using scatterometry

Abstract: Disclosed is a method for determining an overlay error between at least two layers in a multiple layer sample. An imaging optical system is used to measure a plurality of measured optical signals from a plurality of periodic targets on the sample. The targets each have a first structure in a first layer and a second structure in a second layer. There are predefined offsets between the first and second structures. A scatterometry overlay technique is then used to analyze the measured optical signals of the periodic targets and the predefined offsets of the first and second structures of the periodic targets to thereby determine an overlay error between the first and second structures of the periodic targets.