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Institution

Motorola

CompanySchaumburg, Illinois, United States
About: Motorola is a company organization based out in Schaumburg, Illinois, United States. It is known for research contribution in the topics: Signal & Communications system. The organization has 27298 authors who have published 38274 publications receiving 968710 citations. The organization is also known as: Motorola, Inc. & Galvin Manufacturing Corporation.


Papers
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Journal ArticleDOI
TL;DR: In this article, the authors describe the fabrication techniques, surface activity, atomic bonds, LIGA and SLIGA, and bury and destroy of miniature electromechanical sensors and actuators.
Abstract: Miniature electromechanical sensors and actuators can be mass produced on silicon wafers much like ICs. They combine readily with signal-processing circuitry into powerful tools that measure, analyze, and control their environments. The authors describe the fabrication techniques, surface activity, atomic bonds, LIGA and SLIGA, and bury and destroy. The following applications are discussed: pressure sensors, medical equipment, industrial/consumer equipment, avionics, and mechanical applications. >

290 citations

Journal ArticleDOI
Michael Diaz1, J. Sligo
TL;DR: The authors offer metrics and data that show the results of Motorola's CMM usage, and suggest the model should be considered as a vehicle for software process improvement.
Abstract: Many organizations are using or considering the Capability Maturity Model as a vehicle for software process improvement But does the CMM provide real benefits? The authors offer metrics and data that show the results of Motorola's CMM usage

290 citations

Proceedings ArticleDOI
I.A. Gerson1, M.A. Jasiuk1
03 Apr 1990
TL;DR: The vector sum excited linear prediction speech coder is presented, and it utilizes a codebook with a structure that allows for a very efficient search procedure.
Abstract: The vector sum excited linear prediction speech coder is presented. It utilizes a codebook with a structure that allows for a very efficient search procedure. Other advantages of the VSELP codebook structure are discussed, and a detailed description of an 8-kb/s VSELP coder is given. This coder was selected by the Telecommunications Industry Association (TIA) as the standard for use in North American digital cellular telephone systems. The coder uses two VSELP excitation codebooks, a gain quantizer which is robust to channel errors, and a novel adaptive pre/postfilter arrangement. >

288 citations

Journal ArticleDOI
TL;DR: This analysis relies on experience collected and shared among four SEC members namely ABB, DaimlerChrysler, Motorola, and Nokia to generalize their findings by analyzing some of their common experiences in the particular context of large organizations with well-established structures and processes.
Abstract: The need to see compelling evidence before adopting new methods looms greater in large organizations because of their complexity and the need to integrate new technologies and processes with existing ones. To further evaluate agile methods and their underlying software development practices, several Software Experience Center (SEC) member companies initiated a series of activities to discover if agile practices match their organizations' needs. Although each organization evaluated agile methods according to its specific needs, here we attempt to generalize their findings by analyzing some of their common experiences in the particular context of large organizations with well-established structures and processes. We base this analysis on experience collected and shared among four SEC members namely ABB, DaimlerChrysler, Motorola, and Nokia.

287 citations

Patent
Cindy Reidsema Simpson1
12 Feb 1998
TL;DR: In this paper, a conductive interconnect is formed in a semiconductor device by depositing a dielectric layer (28 ) on the semiconductor substrate, and a tantalum nitride barrier layer is then formed within the interconnect opening.
Abstract: In one embodiment, a conductive interconnect ( 38 ) is formed in a semiconductor device by depositing a dielectric layer ( 28 ) on a semiconductor substrate ( 10 ). The dielectric layer ( 28 ) is then patterned to form an interconnect opening ( 29 ). A tantalum nitride barrier layer ( 30 ) is then formed within the interconnect opening ( 29 ). A catalytic layer ( 31 ) comprising a palladium-tin colloid is then formed overlying the tantalum nitride barrier layer ( 30 ). A layer of electroless copper ( 32 ) is then deposited on the catalytic layer ( 31 ). A layer of electroplated copper ( 34 ) is then formed on the electroless copper layer ( 32 ), and the electroless copper layer ( 32 ) serves as a seed layer for the electroplated copper layer ( 34 ). Portions of the electroplated copper layer ( 34 ) are then removed to form a copper interconnect ( 38 ) within the interconnect opening ( 29 ).

287 citations


Authors

Showing all 27298 results

NameH-indexPapersCitations
Georgios B. Giannakis137132173517
Yonggang Huang13679769290
Chenming Hu119129657264
Theodore S. Rappaport11249068853
Chang Ming Li9789642888
John Kim9040641986
James W. Hicks8940651636
David Blaauw8775029855
Mark Harman8350629118
Philippe Renaud7777326868
Aggelos K. Katsaggelos7694626196
Min Zhao7154724549
Weidong Shi7052816368
David Pearce7034225680
Douglas L. Jones7051221596
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20232
20229
202129
2020131
2019134
2018144