National Physical Laboratory

About: National Physical Laboratory is a facility organization based out in London, United Kingdom. It is known for research contribution in the topics: Dielectric & Thin film. The organization has 7615 authors who have published 13327 publications receiving 319381 citations.

Effect of Ni doping on thick film SnO2 gas sensor

Abstract: Ni- and/or Al-doped and undoped SnO2 thick film gas sensors were prepared using screen printing technique and tested for their LPG gas sensitivity. Tin oxide powder was prepared using a chemical precipitation technique. The sensitivity, optimum working temperature and response time were investigated in relation to dopants as well as preparation route. The results show that the gas sensitivity is affected not only by the additive but the way it is added into the sensor material. The results indicated a reduction in grain size on Al and Ni doping. The results on resistance, response and recovery time were explained in terms of n–p junction formation between SnO2 and NiO, which increases the depletion barrier height.

Numerically stable methods for quadratic programming

Abstract: Numerically stable algorithms for quadratic programming are discussed. A new algorithm is described for indefinite quadratic programming which utilizes methods for updating positivedefinite factorizations only. Consequently all the updating procedures required are common to algorithms for linearly-constrained optimization. The new algorithm can be used for the positive-definite case without loss of efficiency.

Frontiers of magnetic force microscopy

Abstract: Since it was first demonstrated in 1987, magnetic force microscopy (MFM) has become a truly widespread and commonly used characterization technique that has been applied to a variety of research and industrial applications. Some of the main advantages of the method includes its high spatial resolution (typically ∼50 nm), ability to work in variable temperature and applied magnetic fields, versatility, and simplicity in operation, all without almost any need for sample preparation. However, for most commercial systems, the technique has historically provided only qualitative information, and the number of available modes was typically limited, thus not reflecting the experimental demands. Additionally, the range of samples under study was largely restricted to “classic” ferromagnetic samples (typically, thin films or patterned nanostructures). Throughout this Perspective article, the recent progress and development of MFM is described, followed by a summary of the current state-of-the-art techniques and objects for study. Finally, the future of this fascinating field is discussed in the context of emerging instrumental and material developments. Aspects including quantitative MFM, the accurate interpretation of the MFM images, new instrumentation, probe-engineering alternatives, and applications of MFM to new (often interdisciplinary) areas of the materials science, physics, and biology will be discussed. We first describe the physical principles of MFM, specifically paying attention to common artifacts frequently occurring in MFM measurements; then, we present a comprehensive review of the recent developments in the MFM modes, instrumentation, and the main application areas; finally, the importance of the technique is speculated upon for emerging or anticipated to emerge fields including skyrmions, 2D-materials, and topological insulators.