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Institution

NEC

CompanyTokyo, Japan
About: NEC is a company organization based out in Tokyo, Japan. It is known for research contribution in the topics: Signal & Layer (electronics). The organization has 33269 authors who have published 57670 publications receiving 835952 citations. The organization is also known as: NEC Corporation & NEC Electronics Corporation.


Papers
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Patent
Tetsuya Homma1
24 Nov 1992
TL;DR: In this article, a method of fabricating a multi-layered interconnection structure which comprises the steps of: forming a first wiring layer on a silicon oxide film having a compressive stress; forming a thick (2 to 3.5 μm) fluorine-containing silicon dioxide film at a temperature not higher than 200 ° C; etching back the fluorine containing silicon oxide material to flatten the surface of the film; and forming a silicon oxide film having an insulating film, a resistance to cracking, flatness and reliability are improved.
Abstract: A method of fabricating a multi-layered interconnection structure which comprises the steps of: forming a first wiring layer on a silicon oxide film having a compressive stress; forming a thick (2 to 3.5 μm) fluorine-containing silicon oxide film at a temperature not higher than 200 ° C.; etching back the fluorine-containing silicon oxide film to flatten the surface of the film; forming a silicon oxide film having a compressive stress; forming a through-hole in position; and forming a second wiring layer. Since the fluorine-containing silicon oxide film is used as part of an insulating film, a resistance to cracking, flatness and reliability are significantly improved.

191 citations

Journal ArticleDOI
TL;DR: This work demonstrates an approximately 10x increase in conversion efficiency for optical second-harmonic generation from a periodically nanostructured metal structure consisting of a single subwavelength aperture in a thin silver film surrounded by a set of concentric surface grooves.
Abstract: We demonstrate an ∼104 increase in conversion efficiency for optical second-harmonic generation (SHG) from a periodically nanostructured metal structure consisting of a single subwavelength aperture in a thin silver film surrounded by a set of concentric surface grooves. The forward-transmitted second-harmonic radiation from this structure is measured relative to that from an identical aperture with no surrounding surface periodicity. We explain the observed SHG enhancement quantitatively in terms of a measured 120× increase in the strength of the fundamental radiation in the vicinity of the aperture resulting from the periodic nanostructuring.

191 citations

Journal ArticleDOI
01 Jan 1999-Carbon
TL;DR: In this paper, a cloth-like soot was produced, containing about 40% single wall carbon nanotubes (SWCNTs) by characterization with high resolution transmission electron microscope (HREM) and Raman spectroscopy.

191 citations

Journal ArticleDOI
TL;DR: Numerical results show that a sinusoidal grating is antireflective over wide groove depth, wavelength and incident angle ranges, and a grating with nearly triangular section, having a circle arc index distribution, has a very low reflectivity, >10(-4)%.
Abstract: An interpretation model for low reflectivity in ultrahigh spatial-frequency holographic relief gratings is proposed. The model is based on the concept that the grating effective index, caused by grating ultrahigh spatial frequency, is graded in the depth direction and forms an antireflective constitution similar to the multilayer coating. Numerical results show that a sinusoidal grating is antireflective over wide groove depth, wavelength and incident angle ranges, and a grating with nearly triangular section, having a circle arc index distribution, has a very low reflectivity, >10(-4)%. Reflectivity vs groove depth, obtained experimentally for a holographically recorded photoresist grating, agrees fairly well with the numerical results.

191 citations

Proceedings ArticleDOI
01 May 1998
TL;DR: This paper presents the first comprehensive framework that simultaneously evaluates the tradeoffs of energy dissipations of software and hardware such as caches and main memory and shows that the Avalanche framework can drastically reduce system energy dissipation.
Abstract: Embedded system design is one of the most challenging tasks in VLSI CAD because of the vast amount of system parameters to fix and the great variety of constraints to meet. In this paper we focus on the constraint of low energy dissipation, an indispensable peculiarity of embedded mobile computing systems. We present the first comprehensive framework that simultaneously evaluates the tradeoffs of energy dissipations of software and hardware such as caches and main memory. Unlike previous work in low power research which focused only on software or hardware, our framework optimizes system parameters to minimize energy dissipation of the overall system. The trade-off between system performance and energy dissipation is also explored. Experimental results show that our Avalanche framework can drastically reduce system energy dissipation.

190 citations


Authors

Showing all 33297 results

NameH-indexPapersCitations
Pulickel M. Ajayan1761223136241
Xiaodong Wang1351573117552
S. Shankar Sastry12285886155
Sumio Iijima106633101834
Thomas W. Ebbesen9930570789
Kishor S. Trivedi9569836816
Sharad Malik9561537258
Shigeo Ohno9130328104
Adrian Perrig8937453367
Jan M. Rabaey8152536523
C. Lee Giles8053625636
Edward A. Lee7846234620
Otto Zhou7432218968
Katsumi Kaneko7458128619
Guido Groeseneken73107426977
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20238
202220
2021234
2020518
2019952
20181,088