Panasonic

About: Panasonic is a company organization based out in Kadoma, Ôsaka, Japan. It is known for research contribution in the topics: Signal & Layer (electronics). The organization has 49129 authors who have published 71118 publications receiving 942756 citations. The organization is also known as: Panasonikku Kabushiki-gaisha & Panasonic.

Hydrogen generator and fuel cell system

Abstract: In a hydrogen generator according to the invention, a reformer temperature sensor detects the temperature of a reformer at a start of a stop operation of a hydrogen generator. In a controller, a processing and controlling portion compares the detected temperature with first to fourth reference temperatures pre-stored in a storage portion, and determines which of the following conditions is the temperature condition of the hydrogen generator at the stop; a first condition in which water condensation occurs, a second condition in which water condensation and carbon deposition are avoidable, a third condition in which carbon deposition occurs, a fourth condition in which disproportionation reaction occurs, and a fifth condition in which oxidization of catalyst occurs. According to the determination result, an appropriate setting is selected among first to fifth replacement settings pre-stored in the controller corresponding to the first to fifth conditions, and an internal gas replacement operation is performed according to the selected setting.

Laser processing method

Abstract: A laser processing method is to be executed by a pair of turning mirrors of which axes of rotation are arranged in mutually twisted positions, a flat field lens for converging a laser beam reflected on the pair of turning mirrors on a specified plane, and an X-Y stage which carries and moves thereon an object to be processed to which the laser beam is applied, the object having a plurality of rectangular planar areas of the same shape as each other in a matrix form and adjoining the rectangular planar areas while not overlapping the rectangular planer area nor leaving any space therebetween The method includes a first step of executing application of the laser beam of which a laser applying position is determined by the pair of turning mirrors and the flat field lens to one of the rectangular planar areas of the object, a second step of moving an X-axis stage or a Y-axis stage of the X-Y stage after the first step is completed, a third step of executing application of the laser beam to one of the rectangular planar areas which is adjacent to the rectangular planar area to which the latest application of the laser beam is performed, and a fourth step of executing the second and third steps alternately to process the plurality of rectangular planar areas of the object

Solid state image sensor

Abstract: The consumed power of a MOS type sensor including a floating diffusion (FD) amplifier in each pixel is reduced. For this purpose, drain regions (regions for supplying a pulse voltage to FD portions through reset transistors) of unit pixels are connected to different drain lines row by row, so as to selectively supply a power pulse to each row. The power pulse is set to a HIGH level potential at least during a period when signal charge stored in the FD portion is reset and a period when the signal charge stored in the FD portion is detected.

Device and method for determining the concentration of a substrate

Abstract: A method for determining the concentration of a substrate in a sample solution using an electrode system comprising a working electrode and a counter electrode, both being formed on an electrically insulating base plate, and a reaction layer which contains at least an oxidoreductase and an electron mediator and is formed on the electrode system to electrochemically measure a reduced amount of the electron mediator resulting from enzyme reaction in the reaction layer, wherein a third electrode is formed as an interfering substance detecting electrode somewhere apart from the reaction layer to detect supply of the sample solution on the basis of an electrical change between the counter electrode and the third electrode. A current flowing between the counter electrode and the third electrode is measured which is taken as a positive error. Subsequently, voltage application between the counter electrode and the third electrode is released and a voltage for oxidizing the reduced form electron mediator is applied between the working electrode and the counter electrode to measure a current flowing between the two electrodes. Influences of any interfering substance such as easy-to-oxidize substance are reduced, whereby a highly reliable value of substrate determination can be obtained.

Pattern formation method and exposure system

Abstract: After forming a resist film made from a chemically amplified resist material, pattern exposure is carried out by irradiating the resist film with exposing light while supplying, between a projection lens and the resist film, a solution of water (having a refractive index of 1.44) that includes an antifoaming agent and is circulated and temporarily stored in a solution storage. After the pattern exposure, the resist film is subjected to post-exposure bake, and the resultant resist film is developed with an alkaline developer. Thus, a resist pattern made of an unexposed portion of the resist film can be formed in a good shape.