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Institution

Samsung

CompanySeoul, South Korea
About: Samsung is a company organization based out in Seoul, South Korea. It is known for research contribution in the topics: Layer (electronics) & Signal. The organization has 134067 authors who have published 163691 publications receiving 2057505 citations. The organization is also known as: Samsung Group & Samsung chaebol.


Papers
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Journal ArticleDOI
TL;DR: A graphic method of analyzing the spectral displacements of a long-period fiber grating as a function of ambient index is presented.
Abstract: We present a graphic method of analyzing the spectral displacements of a long-period fiber grating as a function of ambient index. Mode dependence of the maximum displacement, disappearance of a particular resonance peak, and spectral behavior when the ambient index is larger than that of the cladding material are investigated and compared with experimental results.

190 citations

Proceedings ArticleDOI
01 Dec 2006
TL;DR: GAA TSNWFET with 15 nm gate length and 4 nm radius nanowires is demonstrated and shows excellent short channel immunity in this article, which shows high driving current of 1.94 mA/?m.
Abstract: GAA TSNWFET with 15 nm gate length and 4 nm radius nanowires is demonstrated and shows excellent short channel immunity. p-TSNWFET shows high driving current of 1.94 mA/?m while n-TSNWFET shows on-current on-current on-current of 1.44 mA/?m. Merits of TSNWFET and performance enhancement of p-TSNWFET are explored using 3-D and quantum simulation.

189 citations

Patent
12 Oct 1999
TL;DR: In this paper, a lower electrode having a surface and a rounded protruding portion is formed on a semiconductor substrate, and a chemisorption layer is then formed on the surface and the rounding protruding part by supplying a first reactant.
Abstract: The present invention discloses a method for forming a dielectric film having improved leakage current characteristics in a capacitor. A lower electrode having a surface and a rounded protruding portion is formed on a semiconductor substrate. The surface and the protruding portion define at least one concave area. A chemisorption layer is then formed on the surface and the rounded protruding portion by supplying a first reactant. Also, a physisorption layer is formed on the chemisorption layer from the first reactant. Next, a portion of the physisorption layer is removed and a portion of the physisorption layer is left on the concave area. Subsequently, the chemisorption layer and the portion of the physisorption layer on the concave area react with a second reactant to form a dielectric film on the surface of the lower electrode. The thickness of said dielectric film is greater on the concave area than on the protruding portion, thereby reducing leakage current.

189 citations

Journal ArticleDOI
TL;DR: The Ag NW-graphene hybrid transparent conducting electrode (TCE) showed highly enhanced thermal oxidation and chemical stabilities because of the superior gas-barrier property of the graphene protection layer and the organic solar cells with the AgNW-gRaphene hybrid TCE showed excellent photovoltaic performance as well as superior long-term stability under ambient conditions.
Abstract: A new AgNW–graphene hybrid transparent conducting electrode (TCE) was prepared by dry-transferring a chemical vapor deposition (CVD)-grown monolayer graphene onto a pristine AgNW TCE. The AgNW–graphene hybrid TCE exhibited excellent optical and electrical properties as well as mechanical flexibility. The AgNW–graphene hybrid TCE showed highly enhanced thermal oxidation and chemical stabilities because of the superior gas-barrier property of the graphene protection layer. Furthermore, the organic solar cells with the AgNW–graphene hybrid TCE showed excellent photovoltaic performance as well as superior long-term stability under ambient conditions.

189 citations

Journal ArticleDOI
TL;DR: Key differences in the propagation characteristics between the microwave and mmWave bands are explained, and examples of how these differences impact 5G system design are given.
Abstract: Fifth generation cellular systems will be deployed in the microwave and millimeterwave (mmWave) frequency bands (i.e., between 0.5100 GHz). Propagation characteristics at these bands have a fundamental impact on each aspect of the cellular architecture, ranging from equipment design to real-time performance in the field. While we have a reasonable understanding of the propagation characteristics at microwave (< 6 GHz) frequencies, the same cannot be said for mmWave. This article explains key differences in the propagation characteristics between the microwave and mmWave bands, and further gives examples of how these differences impact 5G system design.

189 citations


Authors

Showing all 134111 results

NameH-indexPapersCitations
Yi Cui2201015199725
Hyun-Chul Kim1764076183227
Hannes Jung1592069125069
Yongsun Kim1562588145619
Yu Huang136149289209
Robert W. Heath128104973171
Shuicheng Yan12381066192
Shi Xue Dou122202874031
Young Hee Lee122116861107
Alan L. Yuille11980478054
Yang-Kook Sun11778158912
Sang Yup Lee117100553257
Guoxiu Wang11765446145
Richard G. Baraniuk10777057550
Jef D. Boeke10645652598
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20239
202289
20213,060
20205,735
20195,994
20185,885