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Institution

Solid State Physics Laboratory

FacilityDelhi, India
About: Solid State Physics Laboratory is a facility organization based out in Delhi, India. It is known for research contribution in the topics: Quantum dot & Dielectric. The organization has 1754 authors who have published 2597 publications receiving 50601 citations.


Papers
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Proceedings ArticleDOI
04 May 2007
TL;DR: With this method the ability to measure very low current and noise levels is demonstrated and the full counting statistics of current fluctuations in a semiconductor quantum dot are measured by real-time detection of single electron tunneling with a quantum point contact.
Abstract: We present measurements of counting statistics for electron transport in a quantum dot. By counting the electrons one by one using a quantum point contact as a charge detector, we are able to generate the distribution function of the current fluctuations. From the distribution function, higher order noise correlations can be determined. We measure a reduction of both the second moment (variance, related to shot noise) and the third moment (asymmetry) of the current distribution compared to a Poisson distribution. The reduction of noise can be explained by the increase in electron correlation due to Coulomb blockade.

43 citations

Journal ArticleDOI
TL;DR: In this paper, an analytical device model for a graphene field effect transistor (GFET) on a highly conducting substrate, playing the role of the back gate, with relatively short top gate which controls the source-drain current was presented.
Abstract: We present an analytical device model for a graphene field-effect transistor (GFET) on a highly conducting substrate, playing the role of the back gate, with relatively short top gate which controls the source–drain current The equations of the GFET device model include the Poisson equation in the weak nonlocality approximation. Using this model, we find explicit analytical formulae for the spatial distributions of the electric potential along the channel and for the voltage dependences of the thermionic and tunneling currents. (© 2008 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim)

43 citations

Journal ArticleDOI
TL;DR: In this paper, different Ni-Cr alloys were sputter-deposited on silicon nitride-coated GaAs substrates and covered with a spincoated polyimide layer to develop thin film metal resistors for GaAs monolithic microwave integrated circuits (MMICs).

43 citations

Journal ArticleDOI
TL;DR: In this article, a new architecture based on an intentional misalignment between the core and shell gate is presented for the nanotube tunnel field effect transistor (NT-TFET).
Abstract: In this paper, a new architecture based on an intentional misalignment between the core and shell gate is presented for the nanotube tunnel field-effect transistor (NT-TFET). The misaligned core gate overlaps with the source region and facilitates line tunneling in the core-gate–source overlapped region significantly increasing the band-to-band tunneling (BTBT) rate. Using the calibrated 3-D simulations, we show that the proposed misaligned (MG) NT-TFET outperforms the conventional NT-TFET both in terms of static as well as dynamic performance. The MGNT-TFET exhibits an increased ON-state current by nearly 11 times as compared to the conventional NT-TFET with an ultrasteep subthreshold slope (minimum point subthreshold swing of ~5 mV/dec and an average subthreshold slope of 15.5 mV/dec). The higher effective drive current also leads to an improved dynamic performance in the MGNT-TFET

43 citations

Journal ArticleDOI
TL;DR: In this article, a 2D 10-element test microbolometer array was fabricated without an air-gap thermal isolation structure, which uses vanadium oxide film deposited by pulsed laser deposition at room temperature as the infrared (IR) sensitive layer.
Abstract: A 2D 10-element test microbolometer array was fabricated without an air-gap thermal isolation structure. The microbolometer uses vanadium oxide film deposited by pulsed laser deposition at room temperature as the infrared (IR) sensitive layer. The IR response of the uncooled microbolometer was evaluated in the spectral region of 8–15 μm. The detectivity and the responsivity were determined as ~ 6 × 105 cm Hz1/2 W−1 and 36 V W−1 respectively at a 10 Hz chopper frequency with 50 μA bias current for a thermal conductance G ~ 10−3 W K−1 between the thermal sensing layer and the substrate. The preliminary results for the test microbolometer array are discussed and compared with those for microbolometers fabricated on micromachined thermally isolated structures.

43 citations


Authors

Showing all 1757 results

NameH-indexPapersCitations
Alain Dufresne11135845904
Yang Ren7988026341
Klaus Ensslin7063821385
Werner Wegscheider6993321984
Takashi Takahashi6542414234
Liu Hao Tjeng6432213752
Nicholas E. Geacintov6345315636
Manfred Sigrist6146818362
Thomas Ihn6147514159
Takafumi Sato5926311032
Christoph Stampfer5931514422
Christian Colliex5828914618
Takashi Mizokawa5740011697
Eberhard Bodenschatz5737413208
Bertram Batlogg551909459
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20231
202210
202174
202087
201992
201878