Sony Broadcast & Professional Research Laboratories

About: Sony Broadcast & Professional Research Laboratories is a company organization based out in Taipei, Taiwan. It is known for research contribution in the topics: Signal & Image processing. The organization has 38708 authors who have published 63864 publications receiving 865637 citations.

Simple method for calculating camera defocus from an image scene

Abstract: An imaging acquisition system that generates a picture depth from an auto focus curve generated from picture of a three dimensional spatial scene is described. The auto focus curve comprises a step edge. The system generates the depth based on the step edge and a reference auto focus normalization curve.

Method and arrangement for power control

Abstract: A method for selecting a transport format to transmit messages in a wireless communication system. The method includes the steps of obtaining (620) transmission information from a wireless subscriber unit, and modifying a communication channel format (660) in response to said transmission information. Preferably, the transmission information is retransmission requests from a wireless subscriber unit, which are transmitted frequently.

On-line Imitative Interaction with a Humanoid Robot Using a Dynamic Neural Network Model of a Mirror System:

Abstract: This study presents experiments on the imitative interactions between a small humanoid robot and a user. A dynamic neural network model of a mirror system was implemented in a humanoid robot, based...

Glasses type display apparatus

Abstract: A glasses type head mounted display apparatus for seeing a virtual image through left and right lens systems provided with corresponding left and right display portions displaying left and right pictures, respectively. The display apparatus includes left and right slide mechanisms for moving the respectively left and right display portions on the main point axes of the lens systems and on segment lines through the central points of the left and right lens systems and focuses of the left and right lens systems so that the user sees through the left and right lens systems a virtual image synthesized with pictures of the left and right display portions.

Correction method and correction apparatus of mask pattern

Abstract: A method of correction of a mask pattern in which the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point arrangement step for arranging a plurality of evaluation points along an outer periphery of the desired design pattern; a simulation step for simulating the transfer image to be obtained where exposure is carried out under predetermined transfer conditions by using a photomask of a design pattern given the evaluation points; a comparison step for comparing a difference between the simulated transfer image and the design pattern for every evaluation point; and a deformation step for deforming the design pattern according to the difference compared for every evaluation point so that the difference becomes smaller and a correction apparatus for the same.