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Institution

Sony Broadcast & Professional Research Laboratories

CompanyTaipei, Taiwan
About: Sony Broadcast & Professional Research Laboratories is a company organization based out in Taipei, Taiwan. It is known for research contribution in the topics: Signal & Image processing. The organization has 38708 authors who have published 63864 publications receiving 865637 citations.


Papers
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Proceedings Article
17 Jul 2017
TL;DR: DeepBach, a graphical model aimed at modeling polyphonic music and specifically hymn-like pieces, is introduced, which is capable of generating highly convincing chorales in the style of Bach.
Abstract: This paper introduces DeepBach, a graphical model aimed at modeling polyphonic music and specifically hymn-like pieces. We claim that, after being trained on the chorale harmonizations by Johann Sebastian Bach, our model is capable of generating highly convincing chorales in the style of Bach. DeepBach's strength comes from the use of pseudo-Gibbs sampling coupled with an adapted representation of musical data. This is in contrast with many automatic music composition approaches which tend to compose music sequentially. Our model is also steerable in the sense that a user can constrain the generation by imposing positional constraints such as notes, rhythms or cadences in the generated score. We also provide a plugin on top of the MuseScore music editor making the interaction with DeepBach easy to use.

190 citations

Patent
29 May 1998
TL;DR: In this paper, a heterojunction field effect transistor (HEMT) is proposed to realize a high performance by a significant decrease in source resistance while maintaining a sufficiently high gate resistivity to voltage.
Abstract: A heterojunction field effect transistor realizing a high performance by a significant decrease. in source resistance while maintaining a sufficiently high gate resistivity to voltage is provided. Sequentially stacked on a c-face sapphire substrate via a buffer layer are an undoped GaN layer, undoped Al 0 .3 Ga 07 N layer, undoped GaN channel layer, undoped Al 0 .15 Ga 0 .85 N spacer layer, n-type Al 0 .15 Ga 0 .85 N electron supply layer, graded undoped Al z Ga 1-z N barrier layer and n-type Al 0 .06 Ga 0 .94 N contact layer, and a gate electrode, source electrode and drain electrode are formed on the n-type Al 0 .06 Ga 0 .94 N contact layer to form a AlGaN/GaN HEMT. The Al composition z in the graded undoped Al z Ga 1-z N barrier layer continuously decreases from 0.15 to 0.06, for example, from the n-type Al 0 .15 Ga 0 .85 N electron supply layer toward the n-type Al 0 .06 Ga 0 .94 N contact layer. An n ++ -type GaN contact layer may be formed on the n-type Al 0 .06 Ga 0 .94 N contact layer in the region for the source electrode and the drain electrode, and the source electrode and the drain may be formed on it.

190 citations

Patent
16 Mar 1993
TL;DR: In this article, a local access unit counter is used to detect lost or false access unit headers, and correct the AV synchronization error caused by storage media or transmission errors. But it does not support editing.
Abstract: A compressed video signal and a compressed audio signal decoding apparatus which including a local access unit counter intended for digital AV applications where access unit headers (e.g. frame headers, audio unit headers or other kind of data unit headers) may be lost or generated by storage media or transmission errors. In order to prevent a resulting AV sync error a value called "access unit count" is included in each elementary stream. With this value each decoder can detect lost or false access unit headers, and correct the AV synchronization. In order to support editing, an extra bit can be added to indicate discontinuity in the access unit count.

190 citations

Journal ArticleDOI
TL;DR: The mechanism of formation of a "Si recess" that appears during gate poly-Si etching was studied in this paper, where the damage was successfully minimized by controlling the high energy peak in the ion energy distribution function (IEDF) to be lower than the threshold energy of ion penetration.
Abstract: The mechanism of formation of a "Si recess" that appears during gate poly-Si etching was studied. Hydrogen in HBr plasma penetrates through a thin gate oxide film and generates dislocated sites in the Si substrate. We developed a molecular dynamics (MD) simulation to clarify both the penetration depth of H and O and the dislocation of Si. The damage was successfully minimized by controlling the high energy peak in the ion energy distribution function (IEDF) to be lower than the threshold energy of ion penetration.

190 citations

Patent
17 Dec 2008
TL;DR: In this article, a solid-state imaging device includes pixel cells that are formed on a substrate having a first substrate surface side, on which light is irradiated, and a second substrate surface surface side on which elements are formed, separated by an adjacent cell group and an element separation layer for each of the pixel cells or with plural pixel cells as a unit.
Abstract: A solid-state imaging device includes pixel cells that are formed on a substrate having a first substrate surface side, on which light is irradiated, and a second substrate surface side, on which elements are formed, and separated by an adjacent cell group and an element separation layer for each of the pixel cells or with plural pixel cells as a unit Each of the pixel cells has a first conductive well formed on the first substrate surface side and a second conductive well formed on the second substrate surface side The first conductive well receives light from the first substrate surface side and has a photoelectric conversion function and a charge accumulation function for the received light A transistor that detects accumulated charges in the first conductive well and has a threshold modulation function is formed in the second conductive well

190 citations


Authors

Showing all 38711 results

NameH-indexPapersCitations
Hui Li1352982105903
Susumu Kitagawa12580969594
Shree K. Nayar11338445139
Takashi Kobayashi10360651385
Bo Huang9772840135
Muhammad Imran94305351728
Xiaodong Xu94112250817
Mitsuo Kawato8642235640
Takashi Yamamoto84140135169
Atsuo Yamada7844423989
Katsushi Ikeuchi7863620622
Yoshihiro Iwasa7745427146
Satoshi Miyazaki7634120483
Hiroshi Yamazaki7495327216
Alexei Gruverman6930118610
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20223
2021294
2020902
20191,297
20181,111
20171,078