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Institution

STMicroelectronics

CompanyGeneva, Switzerland
About: STMicroelectronics is a company organization based out in Geneva, Switzerland. It is known for research contribution in the topics: Transistor & Signal. The organization has 17172 authors who have published 29543 publications receiving 300766 citations. The organization is also known as: SGS-Thomson & STM.


Papers
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Journal ArticleDOI
TL;DR: The problems that concern the turn-on, turn-off, and short-circuit ofIGBT devices are dealt with and an optimal new driving circuit is proposed which gives excellent device output performances.
Abstract: IGBT devices are increasingly used in power electronic equipment due to their high power handling capability. This paper deals with the problems that concern the turn-on, turn-off, and short-circuit of these devices. An optimal new driving circuit is proposed which gives excellent device output performances. Experimental oscillogram traces of transient condition tests are given, which demonstrate the advantages of using the new driving circuit. The suitability of the driving circuit for integration is analyzed. >

77 citations

Patent
19 Jul 2006
TL;DR: In this article, a radio frequency device comprising an electrically conductive element associated with at least one continuous magnetic element including a substrate coated with a magnetic film having a granular structure with grains inclined relative to the normal to the substrate or a fibrous texture was described.
Abstract: The invention concerns a radio frequency device comprising an electrically conductive element associated with at least one first continuous magnetic element including a substrate coated with a magnetic film having a granular structure with grains inclined relative to the normal to the substrate or a fibrous texture inclined relative to the normal to the substrate.

77 citations

Journal ArticleDOI
TL;DR: The suitability of FinFET-based multi-gate devices for the 32 nm technology and beyond will be discussed and some technological challenges will be addressed.
Abstract: Due to the limited control of the short channel effects, the high junction leakage caused by band-to-band tunneling and the dramatically increased VT statistical fluctuations, the scaling of planar bulk MOSFETs becomes more and more problematic with every technology node. The ITRS roadmap predicts that from the 32 nm technology node on, planar bulk devices will not be able to meet the stringent leakage requirements anymore and that multi-gate devices will be required. In this paper, the suitability of FinFET-based multi-gate devices for the 32 nm technology and beyond will be discussed. Apart from the benefits, some technological challenges will be addressed.

77 citations

Journal ArticleDOI
TL;DR: A color image was taken with a CMOS image sensor without any infrared cut-off filter, using red, green and blue metal/dielectric filters arranged in Bayer pattern with 1.75 µm pixel pitch, potentially enabling a reduction of optical crosstalk for smaller pixels.
Abstract: A color image was taken with a CMOS image sensor without any infrared cut-off filter, using red, green and blue metal/dielectric filters arranged in Bayer pattern with 1.75µm pixel pitch. The three colors were obtained by a thickness variation of only two layers in the 7-layer stack, with a technological process including four photolithography levels. The thickness of the filter stack was only half of the traditional color resists, potentially enabling a reduction of optical crosstalk for smaller pixels. Both color errors and signal to noise ratio derived from optimized spectral responses are expected to be similar to color resists associated with infrared filter.

77 citations

Journal ArticleDOI
06 Nov 2009
TL;DR: This paper describes a single-chip, 70-80 GHz wireless transceiver utilizing a direct mm-wave QPSK modulator that can operate at data rates in excess of 18 Gb/s and achieves a maximum output power of +9 dBm.
Abstract: This paper describes a single-chip, 70-80 GHz wireless transceiver utilizing a direct mm-wave QPSK modulator. The transceiver was fabricated in a 130 nm SiGe BiCMOS technology and can operate at data rates in excess of 18 Gb/s. The peak gain of the zero-IF receiver is 50 dB, the double sideband noise figure remains below 7 dB, while the 3-dB receive-chain bandwidth extends from DC to over 6 GHz. The differential transmitter achieves a maximum output power of +9 dBm. The total power consumption of the 1.9 mm × 1.1 mm transceiver is 1.2 W from 1.5, 2.5 and 3.3 V power supplies, including the 4 × 20-Gb/s PRBS generator.

77 citations


Authors

Showing all 17185 results

NameH-indexPapersCitations
Bharat Bhushan116127662506
Albert Polman9744542985
G. Pessina8482830807
Andrea Santangelo8388629019
Paolo Mattavelli7448219926
Daniele Ielmini6836716443
Jean-François Carpentier6245914271
Robert Henderson5844013189
Bruce B. Doris5660412366
Renato Longhi551778644
Aldo Romani5442511513
Paul Muralt5434412694
Enrico Zanoni5370513926
Gaudenzio Meneghesso5170312567
Franco Zappa502749211
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
202225
2021560
2020798
2019952
2018948
2017781