scispace - formally typeset
Search or ask a question

Showing papers by "Swedish Defence Research Agency published in 1990"


Journal ArticleDOI
TL;DR: Sera collected 2 years after infection revealed higher IgG ELISA OD readings than convalescent sera, and very high values were still detectable 10 to 20 years postinfection, which is useful for the testing of immunity and in seroepidemiological studies.

38 citations


Journal ArticleDOI
TL;DR: A microscopic identification of a hydrogen-related-complex defect in electron-irradiated, hydrogenated, boron-doped, single-crystalline silicon, by optical detection of magnetic resonance is presented.
Abstract: We present a microscopic identification of a hydrogen-related-complex defect in electron-irradiated, hydrogenated, boron-doped, single-crystalline silicon, by optical detection of magnetic resonance. The symmetry of this defect has been deduced as C 2v , and from the observed hyperfine interactions the defect is identified as a di-hydrogen-vacancy complex, where the H atoms passivate two of the four dangling bonds in a monovacancy. A spin triplet is the lowest electronic excited state of the defect, which exhibits a strong recombination channel for the free carriers

22 citations


Journal ArticleDOI
TL;DR: In this paper, the presence of electrically active defects in C+ and CO+ implanted boron-doped silicon has been monitored using deep level transient spectroscopy and resistivity measurements.
Abstract: The presence of electrically active defects in C+ and CO+ implanted boron‐doped silicon has been monitored using deep level transient spectroscopy and resistivity measurements. Activation energies of trapped carriers, implanted ion dependencies, and annealing behavior of these defects have been determined. The introduction of defects by annealing has been observed. A total of ten hole and electron traps are reported. Among these traps, a dominant hole trap 0.65 eV above the valence band, and an electron trap 0.53 eV below the conduction band, are tentatively ascribed to the silicon di‐interstitial and the carbon‐oxygen pair, respectively. Other traps detected in the samples have been correlated with multi‐oxygen‐ and carbon‐related complexes. Annealing at temperatures up to 400 °C gives rise to similar deep level transient spectroscopy spectra comprising the same traps in both C+ and CO+ implanted material. However , annealing at temperatures >500 °C produces defect states that are dependent on the implan...

4 citations