Varian Associates

About: Varian Associates is a based out in . It is known for research contribution in the topics: Beam (structure) & Wafer. The organization has 2160 authors who have published 2591 publications receiving 46002 citations.

Magnetic beam deflection system free of chromatic and geometric aberrations of second order

Abstract: In a magnetic deflection system for deflecting a beam of charged particles, through a given beam bending angle at least four beam deflecting stations are serially arranged along the beam path for bending the beam through the beam bending angle Ψ. Each of the beam bending stations includes a magnet for producing a static magnetic field component of a strength and of a shape so that the beam is deflected free of transverse geometric aberrations of second order. The beam deflection system also includes sextupole magnetic field components of such a strength and location so as to eliminate second order chromatic aberrations of the deflected beam without introducing second order geometric aberrations, whereby a magnetic beam deflection system is provided which is free of both transverse chromatic and geometric aberrations of second order.

Targets for magnetron sputter device having separate confining magnetic fields to separate targets subject to separate discharges

Abstract: A first target for a magnetron sputter device has a planar annular emitting surface bounded by an inner radius R1 and an outer radius R2. A second target has a concave emitting surface defined by a side wall of a frustum of a cone. The second target is limited by an inner radius R3 and outer radius R4. R3 is greater than R2. Each target element has pins in diametrically opposite holes to assist in holding the target elements in situ in bayonet slots in the sputter device. The targets are fit closely in cooling rings so that as the targets heat during operation, thermal expansion of the targets assists thermal conduction into the cooling rings.

Method for trapping ions into ion traps and ion trap mass spectrometer system thereof

Abstract: A method and mass spectrometer system for trapping ions within an ion trap by increasing the flight path of ions therein. An ion beam is produced by external ion source and is directed to the ion trap which comprises at least one trapping electrode in proximity to an exit region of the ion beam from the ion trap. A retarding DC voltage is applied to the trapping electrode during ion accumulation time for creating a fringing reflection field and for retaining ions within the ion trap.

Target assembly for sputtering magnetic material

Abstract: An optimized annular sputter target assembly for use in sputtering magnetic material, comprising a thin target piece of magnetic material mounted on a backing structure of nonmagnetic material. Said backing structure provides means for easy mounting and removal of the target assembly and for providing good thermal and electrical contact with the cooling wall of the sputter source. The target piece has a portion extending radially outwardly from said cooling wall thereby providing greater target surface area.