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Varian Associates

About: Varian Associates is a based out in . It is known for research contribution in the topics: Beam (structure) & Wafer. The organization has 2160 authors who have published 2591 publications receiving 46002 citations.
Topics: Beam (structure), Wafer, Amplifier, Cathode, Resonance


Papers
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Patent
16 May 1980
TL;DR: A method for determining the end point for a physical etching process step measures the current at the target being etched and detects changes in the current, which is indicative of transitions between dissimilar materials or of depth of penetration in a particular material as mentioned in this paper.
Abstract: A method for determining the end point for a physical etching process step measures the current at the target being etched and detects changes in the current. Changes in the current measured at the target are indicative of transitions between dissimilar materials or of depth of penetration in a particular material. Momentary changes in the etching flux of the physical etching process are factored out by measuring the current on a mask placed in the vicinity of the target and by subtracting mask current from current measured at the target.

51 citations

Journal ArticleDOI
TL;DR: This work shows that a Hadamard encoded version of the HSQC, which relies on a multiplexed, frequency selective, excitation in the 15N dimension, extends application to rates that are as much as an order of magnitude faster than those previously accessible.
Abstract: The rates of amide proton exchange in protein backbones are very useful reporters of accessibility and structural stability of specific residues and secondary structure elements. Measurement by monitoring changes in intensity of cross-peaks in standard 15N-1H HSQC spectra as protons are replaced by solvent deuterons has become widely accepted. However, these methods are limited to relatively slow rates due to time limitations of the conventional 2D HSQC experiment. Here we show that a Hadamard encoded version of the HSQC, which relies on a multiplexed, frequency selective, excitation in the 15N dimension, extends application to rates that are as much as an order of magnitude faster than those previously accessible.

51 citations

Journal ArticleDOI
TL;DR: In this article, a grain boundary reflection coefficient of 0.17 is calculated, assuming pure specular electron reflection at the film surfaces, and the grain size is independent of film thickness and the presence of a collimator but sensitive to an applied substrate bias.

51 citations


Authors

Showing all 2160 results

NameH-indexPapersCitations
Richard R. Ernst9635253100
Fred E. Regnier8841225169
Norbert Schuff8828025442
James S. Hyde7941235755
Carl Djerassi77152337630
Ray Freeman7326922872
Robert Kaptein7243624275
Minghwei Hong5851514309
Jesse L. Beauchamp5527510971
Herbert Kroemer522379936
Hans J. Jakobsen492748401
James N. Eckstein421686634
Ivan Bozovic311285060
John Glushka31763004
Gary Virshup241132374
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20171
20161
20122
20111
20104
20093