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Institution

Varian Associates

About: Varian Associates is a based out in . It is known for research contribution in the topics: Beam (structure) & Amplifier. The organization has 2160 authors who have published 2591 publications receiving 46002 citations.
Topics: Beam (structure), Amplifier, Wafer, Cathode, Resonance


Papers
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Patent
19 Nov 1987
TL;DR: In this paper, a method of mapping implanted ion dose uniformity is disclosed in which wafers of polysilicon-on-silicon (Psiliconon-oxidized) or polyicon-onsilicon (Polysilicon on-oxide) are implanted with the ion dose to be mapped and then scanned in a spectrophotmeter using monochromatic radiation.
Abstract: A method of mapping implanted ion dose uniformity is disclosed in which wafers of polysilicon-on-silicon or polysilicon-on-oxidized-silicon are implanted with the ion dose to be mapped and then scanned in a spectrophotmeter using monochromatic radiation An interference spectral technique is used to achieve improved sensitivity while preserving thermal and electrical properties close to those of actual devices

39 citations

Journal ArticleDOI
Frank J. Yang1

39 citations

Patent
10 Jan 1995
TL;DR: In this article, a method of using a quadrupole ion trap mass spectrometer for high-resolution mass spectroscopy is described, where the mass spectrum to be analyzed is divided into a plurality of contiguous segments (s1, s2, s3...) and each of the segments is separately scanned.
Abstract: A method of using a quadrupole ion trap mass spectrometer (10) for high resolution mass spectroscopy is disclosed. In the preferred embodiment, the space charge in the ion trap is controlled with high accuracy. The mass spectrum to be analyzed is divided into a plurality of contiguous segments (s1, s2, s3...) and each of the segments is separately scanned. To control space charge, a broadband supplemental waveform (Vs) is applied to the ion trap (1) during the ionization period (Ts1, Ts2, Ts3...) for each segment, the broadband signal being constructed to eliminate all unwanted ions from the ion trap by resonance ejection such that only those ions having masses within the desired mass segment remain in the trap. Preferably, the ionization of each mass segment is performed under identical trapping conditions, and the ionization parameters for each segment is adjusted to optimize the space charge in the trap for that particular segment. Conveniently, the adjustment of ionization parameters may be based on the previous analytical scan of the same mass segment.

39 citations

Patent
09 May 1990
TL;DR: In this paper, a high velocity gas jet for introducing sample materials into the plasma is introduced to avoid the formation of carbon deposits in the plasma discharge tube caused by premature pyrolysis of organic materials outside the plasma and prevent other sample materials from being adsorbed on the surface of the plasma tube.
Abstract: A spectroscopic plasma torch suitable for use at atmospheric pressure disclosed. The torch utilizes a microwave induced helium plasma confined in a plasma discharge tube. The plasma is suspended and stabilized by a vortex flow of helium. The torch includes a high velocity gas jet for introducing sample materials into the plasma The design avoids the formation of carbon deposits in the plasma discharge tube caused by the premature pyrolysis of organic materials outside the plasma and prevents other sample materials from being adsorbed on the surface of the plasma tube. Because of these characteristics, the torch is particularly well suited for use as a component in a gas chromatography detector which employs helium as the plasma support gas.

39 citations


Authors

Showing all 2160 results

NameH-indexPapersCitations
Richard R. Ernst9635253100
Fred E. Regnier8841225169
Norbert Schuff8828025442
James S. Hyde7941235755
Carl Djerassi77152337630
Ray Freeman7326922872
Robert Kaptein7243624275
Minghwei Hong5851514309
Jesse L. Beauchamp5527510971
Herbert Kroemer522379936
Hans J. Jakobsen492748401
James N. Eckstein421686634
Ivan Bozovic311285060
John Glushka31763004
Gary Virshup241132374
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Performance
Metrics
No. of papers from the Institution in previous years
YearPapers
20171
20161
20122
20111
20104
20093