Institution
Varian Associates
About: Varian Associates is a based out in . It is known for research contribution in the topics: Beam (structure) & Amplifier. The organization has 2160 authors who have published 2591 publications receiving 46002 citations.
Topics: Beam (structure), Amplifier, Wafer, Cathode, Resonance
Papers published on a yearly basis
Papers
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27 Feb 1987TL;DR: In this article, the average power capacity of a rotating-anode X-ray generator tube is limited by the slow radiation cooling of the anode, which can be removed by rotating the entire vacuum envelope (22") so the heat can be conducted directly to the air or to a circulating liquid.
Abstract: The average power capacity of a rotating-anode X-ray generator tube is limited by the slow radiation cooling of the anode. The invention removes this limitation by rotating the entire vacuum envelope (22') so the heat can be conducted directly to the air or to a circulating liquid. The cathode (33) and anode (36') are made as figures of revolution about the axis. A stationary source of X-rays is produced by focusing a stationary spot of light (32') onto a rotating photocathode (33). The photoelectrons (34') are drawn off and focused onto a stationary spot on the rotating anode, to provide a stationary source of X-rays (40').
28 citations
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05 Aug 1985TL;DR: In this paper, an automatic sputtering apparatus for coating semiconductor wafers uses a shuttle wafer carrier and elevators to handle waferers within the apparatus, and the elevator has a cantilevered shaft.
Abstract: An automatic sputtering apparatus for coating semiconductor wafers uses shuttle wafer carriers and elevators to handle wafers within the apparatus. The wafer carrier has a hole in the center. One side of the wafer carrier is opened, thereby forming a throat in the shuttle wafer carrier in the form of the letter C. The elevator has a cantilevered shaft. The upper part of the shaft of the elevator is centered under the wafer while the lowest part of the cantilevered shaft is under a point outside the wafer carrier. The connecting portion of the shaft passes through the throat of the wafer carrier as the wafer is lifted. Since the lifting portion of the shaft is outside the wafer carrier, the shuttle can move with the elevator in the up position. The pedestal for holding the wafer on the elevator is equipped with arms which project upward at an angle to the horizontal, thereby confining the wafer to a pedestal.
28 citations
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10 Dec 1993TL;DR: In this paper, a conformal-groove geometry was proposed to reduce the gas leakage around the elastomer O-ring in an ultra high vacuum (UHV) joint.
Abstract: An ultra high vacuum (UHV) joint is scaled by an elastomer O-ring (7) between adjacent flanges (3,4), fitting in a seal cavity formed by grooves (41,42) in the flange (3,4) surfaces. The groove surfaces (41,42) are highly polished and shaped such that the O-ring (7) conforms to the groove surfaces (41,42) and contacts them substantially entirely when the flanges (3,4) are clamped together. This improved structure significantly reduces the permeation through and the gas leakage around the seal (7). The resulting seal (7) can support a vacuum of 10 -11 torr or better. The conformal-groove geometry of the present invention can be used with seals other than elastomer seals, such as soft metal seals (55,65).
27 citations
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16 Aug 1991TL;DR: In this article, a rotatable closed-loop magnet with a plurality of curved sections of different average radius interconnected by an equal number of radial sections is used as a source for sputtering from concentric rings.
Abstract: A source for sputtering from concentric rings (15) on the surface of a single target is shown. The source comprises a rotatable closed-loop magnet (21) having a plurality of curved sections of different average radius interconnected by an equal number of radial sections. In the preferred embodiment the curved sections each have a shape which results in a predetermined erosion profile in the associated concentric ring (15) of the sputter target (17). The relative rate of sputtering from each of the rings (15) may be controlled by adjusting the relative lengths of the curved portions of the closed-loop magnet (21).
27 citations
Authors
Showing all 2160 results
Name | H-index | Papers | Citations |
---|---|---|---|
Richard R. Ernst | 96 | 352 | 53100 |
Fred E. Regnier | 88 | 412 | 25169 |
Norbert Schuff | 88 | 280 | 25442 |
James S. Hyde | 79 | 412 | 35755 |
Carl Djerassi | 77 | 1523 | 37630 |
Ray Freeman | 73 | 269 | 22872 |
Robert Kaptein | 72 | 436 | 24275 |
Minghwei Hong | 58 | 515 | 14309 |
Jesse L. Beauchamp | 55 | 275 | 10971 |
Herbert Kroemer | 52 | 237 | 9936 |
Hans J. Jakobsen | 49 | 274 | 8401 |
James N. Eckstein | 42 | 168 | 6634 |
Ivan Bozovic | 31 | 128 | 5060 |
John Glushka | 31 | 76 | 3004 |
Gary Virshup | 24 | 113 | 2374 |