Showing papers in "Applied Sciences in 1986"
TL;DR: In this paper, the authors studied the effects of gas ion implantation on the topology of the subsurface layers of a solid, and found that inhomogeneous erosion by sputtering is one major reason.
Abstract: Ion bombardment gives rise to modifications of the topography of the bombarded solid surfaces. Inhomogeneous erosion by sputtering is one major reason (see e.g. Carter et al. /1 /, G. Carter and J. Whitton, this conference). A second mechanism is due to the implantation of unsoluble gas ions, especially He, but also Ne, Ar, Kr, Xe, H, and N into the subsurface layers of a solid. It is the phenomena observed during gas ion implantation that this paper is concerned with.
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