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Showing papers in "Microelectronic Engineering in 2001"


Journal ArticleDOI
TL;DR: An overview of recent work on ultrathin (, 100 A) films of metal oxides deposited on silicon for advanced gate dielectrics applications is presented in this article, where the authors illustrate the 23 2 2 2 3 complex processing, integration and device related issues for high dielectric constant ('high-K') materials.

376 citations


Journal ArticleDOI
TL;DR: In this paper, the impact of visco-elastic properties of polymers on the fidelity of pattern transfer in hot embossing lithography has been studied using different imprint systems and process conditions.

212 citations


Journal ArticleDOI
TL;DR: In this paper, the authors focus on the leading alternate gate dielectrics and why it is important to have an amorphous gate Dielectric such as aluminum oxide and silicon dioxide.

130 citations


Journal ArticleDOI
TL;DR: In this paper, the current status of two specific approaches, the microcolumn and the single column with a multiple electron-beam source (photocathode), are reported, and a more detailed review of the recent advances in microcolumn technology is presented.

125 citations


Journal ArticleDOI
M. Otto1, M. Bender1, B. Hadam1, Bernd Spangenberg1, Heinrich Kurz1 
TL;DR: In this article, a UV-based nanoimprint technique with regard to its potential for large area applications is investigated, which depends on the geometry of the mold, and the best results will be obtained with periodic structures and periodically arranged structures.

95 citations


Journal ArticleDOI
TL;DR: In this paper, a process for providing precision deposits of metal films upon a working substrate by transmitting an ultrafast laser pulse thorough a transparent target substrate whose lower surface supports a metal film was described.

87 citations


Journal ArticleDOI
TL;DR: In this paper, an analytical model of threshold voltage and current voltage characteristics for short channel fully depleted cylindrical/surrounding gate MOSFETs based on the solution of Poisson's equation was proposed, taking into account the field-dependent mobility, velocity saturation and the effect of source/drain resistance.

84 citations



Journal ArticleDOI
TL;DR: In this paper, the authors demonstrate various nano-and microstructuring possibilities of electroforming in combination with hot embossing lithography, including periodic structures down to 120 nm and feature sizes.

74 citations


Journal ArticleDOI
TL;DR: In this paper, the effects of process conditions on the etch rate and post-etch surface roughness are also characterized, showing that the silver etch process in CF4 plasma depends strongly on the reactive neutrals and the removal rate is enhanced significantly by the presence of energetic ions as well.

65 citations


Journal ArticleDOI
TL;DR: In this paper, a fast parallel method for the fabrication of continuous profile structures in polymer surfaces using a XeCl excimer laser at a wavelength of 308 nm was investigated, where the used quartz grey tone phase masks consist of diffractive gratings which diffract a fraction of the impinging light out of the aperture of the projection lens.

Journal ArticleDOI
TL;DR: In this paper, a thermal probe based on the changes of the electrical resistivity of a nanometer-sized filament with temperature is presented, which is integrated into an atomic force scanning probe piezoresistive type cantilever.

Journal ArticleDOI
TL;DR: In this article, a three-dimensional additive nanolithography with electron beam-induced deposition is used for rapid prototyping of photonic crystals with an aspect ratio of 15.8 and an edge roughness of 2 nm.

Journal ArticleDOI
TL;DR: In this article, the mictamict is proposed to identify the general class of amorphous binary metallic alloys and their properties are reviewed. But their properties of these materials are not discussed.

Journal ArticleDOI
TL;DR: In this article, a novel method is proposed to fabricate refractive micro lens array using dichromate gelatin (DCG) and an enzyme, which greatly enhances the surface relief depth.

Journal ArticleDOI
TL;DR: In this paper, a high precision laser ablation machine for 3D structuring of hard metals and ceramics with UV light (355 nm) was developed and optimized with respect to surface quality.

Journal ArticleDOI
TL;DR: In this paper, the effect of elevated temperature on the structural stability of Mo/Si, Mo 2C/Si and Mo/Mo 2 C/Si/Mo2C ( d Mo2C = 0.6 nm) multilayers was investigated.

Journal ArticleDOI
TL;DR: In this paper, a combination of NIL and UV lithography is reported using polymers which are both imprintable and photosensitive based on an epoxy type negative tone chemically amplified resist system patterns were easily obtained using both techniques.

Journal ArticleDOI
TL;DR: In this article, the effect of the composition of the HfO 2 films on their electrical performance is discussed, as well as their effect on the mobility of the poly gate devices.

Journal ArticleDOI
TL;DR: In this paper, the effects of Cu concentration in intra-metal dielectrics have been examined: these two key reliability issues are fundamental in the development of Cu-based interconnects.

Journal ArticleDOI
TL;DR: Si manufacturers have to do things differently — they have to shift many paradigms, regarding cost reduction, communication and technology, to achieve challenging cost and capability goals at the right time.

Journal ArticleDOI
TL;DR: In this article, experimental results of temperature measurements in industrial scale silicon Czochralski melts under different magnetic field conditions were presented. But the results of numerical simulations carried out for growth parameters and magnetic fields were not used in the experiments.

Journal ArticleDOI
TL;DR: In this article, a self-assembled monolayer of dodecyltrichlorosilane was used as an organic surface coating for removal of microfabricated devices off the surface without wet chemical etching.

Journal ArticleDOI
TL;DR: In this article, a simple process for fabrication of silicon suspended wires with a cross section of about 0.25 μm 2 has been described, starting from a SOI n-type wafer.

Journal ArticleDOI
TL;DR: In this paper, a novel nanocomposite resist system was developed for sub-100 nm resolution e-beam lithography by dispersing surface-treated silica nanoparticles in a commercial ZEP520 resist.

Journal ArticleDOI
TL;DR: In this paper, the authors derived the energy band profiles of as-evaporated ZrO 2 /Si(100) and annealed Zr O 2/SiO x :Zr/Si (100) systems from the onset of the energy loss spectra of O1s photoelectrons.

Journal ArticleDOI
TL;DR: In this article, the authors demonstrate that gold nanostructures can be fabricated using aliphatic and aromatic thiol self-assembled monolayers as positive and negative electron beam resists.

Journal ArticleDOI
TL;DR: In this paper, the authors proposed a methodology to measure line edge roughness using scanning electron microscopy (SEM) with LER and critical dimension variation software both for resist lines as well as for silicon lines.

Journal ArticleDOI
TL;DR: An improved physical model including two-trap tunneling processes can account for the large current enhancement in the anomalous cells, as well as explaining for the first time their asymmetric and erratic behavior.

Journal ArticleDOI
TL;DR: In this paper, the effect of quenching on low temperature imprinting has been investigated and it is found that temperatures as low as 50°C can be used successfully for imprinting.