Showing papers in "Thin Solid Films in 1985"

TL;DR: In this article, the microstructures of thin films of TiN are reviewed and correlated to physical properties such as the electrical resistivity and the hardness of the films, and the origin of the various micro-structures that are obtained is also discussed in terms of the growth conditions used.

TL;DR: In this paper, the effect of processing on bond coating oxidation and durability is also reviewed, as well as the relationship between process-microstructure relationships and the ability to achieve TBC durability.

TL;DR: In this article, a sample holder was equipped with a special mechanism which enables sample rotation during depth analysis, which significantly improves the depth resolution of AES composition-depth profiles, but the results of these first investigations clearly show that sample rotation was not sufficient to obtain real depth profiles.

TL;DR: In this article, a method of depositing a porous wide-spectrum antireflective coating of pure SiO2 on fused silica surfaces is presented, which does not involve glass phase separation, nor does it require etching for the creation of porosity.

TL;DR: In this article, the role of nucleation in the formation of CoSi 2 over crystalline silicon and over amorphous silicon was investigated and it was shown that nucleation is a small driving force for the transition from CoSi to CoSi.

TL;DR: In this paper, the spraying method was used to prepare amorphous and partially crystalline tin dioxides at temperatures from 340 to 410°C and polycrystalline tin compounds at temperatures between 420 to 500°C, respectively.

TL;DR: In this paper, a novel electrochemical photodiode was fabricated by depositing complex Langmuir-Blodgett (LB) films which consisted of an electron acceptor (A), a sensitizer (S), and an electron donor (D) surfactant derivative.

TL;DR: In this article, a study of the amount of coverage of Si substrates by monolayers and multilayers of molecules deposited by the self-assembling technique was presented.

TL;DR: In this article, the authors measured the internal stress of three metals, including silver, copper and gold, as a function of film thickness and time after deposition under ultrahigh vacuum conditions.

TL;DR: In this article, the possibility of controlling the photochromic reactions of two different spiropyrans was investigated using the Langmuir-Blodgett technique, and the most stable monolayer was formed on mixing with n-octadecane in a molar ratio of 1:2.

TL;DR: In this article, second-harmonic generation from hemicyanine dye Langmuir-Blodgett multilayers has been investigated and values of second-order molecular polarizability β and its average polar angle ψ are deduced from measurements on the non-centrosymmetric films.

TL;DR: In this article, Bilayer-forming ammonium amphiphiles which contain the azobenzene chromophore form stable monolayers on aqueous solutions of negatively charged polymers.

TL;DR: In this paper, a simple method for the chemical deposition of Cu 2 O thin films is described, and the films obtained by this method are of high chemical purity and their thicknesses can easily be controlled during the deposition process.

TL;DR: In this paper, wave-dispersed third harmonic generation measurements on multilayers of polydiacetylene polysilicon have been carried out and the existence of two resonances in cubic susceptibility χ(3)xxxx(−3ω;ω,ω,

TL;DR: In this paper, high conductive films of undoped and aluminum-doped ZnO were prepared by r.f. magnetron sputtering in an applied external magnetic field in pure argon gas.

TL;DR: In this paper, the influence of sputtering conditions on the composition of MoS x films was investigated, and it was found that a rather low argon pressure as well as a substrate bias potential causes a high sulphur deficiency in the sputtered layers compared with the target material; this can be compensated by using an Ar-H 2 S sputtering atmosphere.

TL;DR: In this paper, a modified method has been developed for the deposition of transparent semiconducting thin films of tin oxide, involving the chemical vapour phase oxidation of tin iodide, showing sheet resistances greater than 100 Ω/□ and an average optical transmission in the visible range exceeding 80%.

TL;DR: In this article, the electrical properties of thin films of copper phthalocyanine (CuPc) were studied for samples with thicknesses up to 10μm, and the results yielded the following values: permittivity e = 3.19 × 10 −11 F m −1; hole mobility μ ≈ 5 × 10−7 m 2 V −1 s −1 ; room temperature hole concentration ρ O ≈ 9.1 × 10 17 m −3 ; concentration P o of traps per unit energy range at the valence band edge about 3.86

TL;DR: In this article, the critical role of the solvent in the preparation of monolayers of phthalocyanine was described, and the excellent stability of the Langmuir-Blodgett films has enabled them to incorporate them in a number of electronic devices.

TL;DR: In this paper, the effect of dilution gases, such as hydrogen, argon and helium, on the deposition of diamond-like carbon was examined on the basis of identification of the deposits and the results of plasma diagnostics.

TL;DR: In this paper, the M-7 high speed steel drill was tested with two different commercially available physical vapor deposition (PVD) processes (A and B) and by the high rate reactive sputtering process.

TL;DR: Anhydrous zinc acetate (Zn(CH 3 COO) 2 ) was found to be a suitable source material for growing thin films by the atomic layer epitaxy method as mentioned in this paper.

TL;DR: In this paper, photoelectrochemical measurements in a polysulfide electrolyte and by scanning electron microscopy and microprobe analyses correlated n- and p-type behavior with indium-rich and copper-rich areas respectively.

TL;DR: The principles of chemical and physical vapour deposition (CVD and PVD) in a partially ionized gaseous environment are briefly reviewed with emphasis on plasma-induced CVD as discussed by the authors.

TL;DR: The relative merits of some techniques for measuring the thickness of thin films are discussed in this article, where the authors compare stylus profilometry, interferometry, ellipsometry, spectrophotometric measurements and X-ray microanalysis.

TL;DR: In this paper, surface relief gratings on SiO2/TiO2 waveguides were used as humidity sensors for surface and volume adsorption, and the roles that each of the two adorption mechanisms play were determined quantitatively from measurements of the effective index changes ΔN of the zero-order transverse electric and transverse magnetic modes.

TL;DR: In this article, analytical transmission and Rutherford backscattering spectroscopy (RBS) measurements are collected to further understand the anodic barrier film growth on aluminium, and the inner region of the film is composed of Al 2 O 3 with an outer region of alumina contaminated with electrolyte anions.

TL;DR: In this article, a gas phase silanization of silicon surfaces at elevated temperatures is described, which consists of a washing and surface activation step followed by silanisation at about 0.5 −1 Nm −2 and 80 −190 °C depending on the type of silane.

TL;DR: The optical constants of porous silicon layers formed in wafers with resistivities of 0.01-25 Omega cm and densities of 20%-75% were determined by ellipsometry in the wavelength range 0.28-0.7 microm and by reflectance and transmission from 0.6 to 2.5 microm.

TL;DR: In this article, film pressure versus area data for a series of organic derivatives of phthalocyanine are presented in detail. But they are not observed in classical monomolecular films.