Showing papers in "Thin Solid Films in 1992"

TL;DR: In this article, a solid substrate with a positively charged planar surface is immersed in a solution containing an anionic polyelectrolyte and a monolayer of the polyanion is adsorbed.

TL;DR: Atomic layer epitaxy (ALE) is a surface-controlled process for thin film manufacturing, for formation of atomically controlled surfaces and for epitaxial growth of single crystals.

TL;DR: In this article, it was shown that van der Waals epitaxy can be applied to the epitaxial growth of a layered material on an ordinary three-dimensional material substrate, if regular termination of the surface dangling bonds is accomplished.

TL;DR: Magnetoresistive random-access memory (MRAM) is an integrated combination of nonvolatile thin film magnetic storage and semiconductor support circuits as mentioned in this paper, which can offer improvements of 100 in read time and substantial simplification in circuitry.

TL;DR: In this paper, the growth of the holes resulted in roughly circular agglomerated areas and the area fraction transformed was measured as a function of time for several temperatures in oxygen and argon.

TL;DR: In this paper, the morphology of x = 0.20−0.26 Si1−xGex alloy layers during vapour phase epitaxial (VPE) growth at 610-750 °C using in situ laser light scattering (LLS) and ex situ atomic force microscopy (AFM).

TL;DR: In this paper, the X-ray diffraction patterns of the thin films were investigated before and after the films had been annealed in a nitrogen atmosphere, and the results indicated that the films are p type.

TL;DR: In this article, the effects of the kind of solvent on the properties of TiO2 coating films prepared by the sol-gel method using titanium isopropoxide (Ti(OC3H74)i) as the starting material have been investigated.

TL;DR: In this article, the formation, composition and propagation of laser-produced plasmas used for pulsed laser deposition (PLD) of Y1Ba2Cu3O7−x have been studied under film growth conditions.

TL;DR: In this article, a thin films of mixtures of fluorocarbons and hydrocarbons are investigated by friction force microscopy, and the results are discussed in relation to the phenomenon of boundary lubrication.

TL;DR: In this article, a new class of amorphous hydrogenated carbon based films is described, which consists of atomic-scale composite random networks of carbon and silicon, and the carbon network is stabilized by hydrogen and the silicon network is stabilised by oxygen.

TL;DR: The potential of pulsed laser deposition to incorporate additives into MoS2 films was investigated in this paper, where composites were grown on stainless steel substrates using the 248 nm radiation from a KrF excimer laser.

TL;DR: The ability to grow thin films of polycrystalline diamond at atmospheric pressure and below is a relatively new development and has potential electronic applications in thermal management, packaging, lithography and active electronic devices.

TL;DR: In this article, the potential of reflectometry and microscopy at the Brewster angle was investigated and it was shown that formation of a monolayer at this air-water interface leads to a measurable reflectivity depending on various film properties.

TL;DR: In this paper, a series of novel polymers was synthesized and tested with the aim of developing the materials science background and the methodology to fabricate devices based on such ultrathin layers.

TL;DR: In this paper, a model is proposed based on the observed microstructure that explains the source of overstoichiometric oxygen and ion transport in these films, and the model is used to explain the redox currents, the efficiency of these films to color, and their optical properties were influenced by the processing conditions employed and the resulting micro-structure.

TL;DR: In this paper, the authors investigated the main theories reported through the use of the following compounds: AsS x, AsSe x, and GeSe x.5 films that were flash evaporated or deposited by plasmaenhanced chemical vapour deposition.

TL;DR: In this article, an ion nitriding of pure titanium and Ti6A1-4V was conducted at low pressure by intensifying the glow discharge, which resulted in a higher wear, corrosion and wear-corrosion resistance.

TL;DR: In this paper, a method was developed to determine simultaneously the thickness and the elastic modulus of surface layers from surface wave dispersion using a non-linear regression method based on the Fourier Transform technique.

TL;DR: High quality c axis oriented zinc oxide thin films have been deposited on glass substrates by low pressure, metal organic vapor deposition, using zinc acetate (Zn(CH3COO)2) and H2O as source materials.

TL;DR: The use of chemical-mechanical polishing (CMP) has been exploited by IBM in the development and manufacture of CMOS products since 1985 as mentioned in this paper and has been used in the planarization of oxide shallow isolation trenches, as in the 16-Mbit DRAM.

TL;DR: In this article, a time-temperature-transformation diagram was constructed for CVD κ-Al2O3 and the effects of the κ→α transformation on adhesion and cutting performance were studied by scratch adhension and cutting test respectively.

TL;DR: In this article, the effects of solution content (type of titanium alkoxide, type of solvent, equivalent oxide concentration, [H 2 O]/[Ti(OR) 4 ] ratio), gas moisture during deposition and heat treatment temperature on the film properties are discussed.

TL;DR: In this article, the anodizing of titanium in dilute sulphuric acid electrolyte at constant voltages was investigated to evaluate the optimum anodic conditions, and the anodic current density was found to increase with increasing applied voltage and with electrolyte temperature.

TL;DR: In this article, the structure of monolayers of Cd arachidate on water and on solid support, and the thickness dependent changes when building up a multilayer via the LB technique are studied by means of grazing incidence diffraction of X-ray.

TL;DR: In this paper, thin pyrite films have been prepared by sulphur-assisted magnetron sputtering at deposition temperatures between 88 and 390 °C. The films were microcrystalline, with an average grain size of about 400 A and a preferential orientation changing from (200) to (111) on going to higher deposition temperatures.

TL;DR: The porosity of the samples varied between 36% and 65% as mentioned in this paper and the presence of nanocrystals in the porous film was clearly observed by an asymmetric broadening of the optical silicon phonon in the Raman spectra.

TL;DR: In this article, thermal conductivities were determined in silicon oxide films of four thicknesses, which were deposited by plasma-enhanced chemical vapor deposition on monocrystalline silicon substrates.

TL;DR: In this article, surface modification processes using various excimer UV sources are described, in addition to applications of excimer lasers, photolytic processes using newly developed incoherent excimer UV and vacuum UV sources are discussed.