Showing papers in "Vacuum in 1989"

TL;DR: In this paper, a simple, inexpensive and versatile custom built reactor for experimental plasma deposition and surface treatment is presented, which is a compact web conveyancing system with a web speed that is variable in the range 0.15-6 m min−1, and a defined gas flow path.

TL;DR: In this article, the properties of thin indium-tin-oxide (ITO) layers prepared by a magnetron reactive sputtering from an 90% In+10% Sn target in an Ar+O2 atmosphere can be substantially modified by postdeposition annealing.

TL;DR: In this paper, an in situ ellipsometer and an optical emission spectroscopy system were used for the deposition of hydrogenated amorphous silicon (a-Si:H) thin films and related alloys.

TL;DR: Transparent conducting indium and indium alloy oxide thin films were coated onto acrylic, glass and polycarbonate substrates using a reactive magnetron sputtering technique as discussed by the authors, and the effect of oxygen partial pressures and the dopants was studied.

TL;DR: An optical characterization system connected to an rf plasma reactor is described in this article, which is based on polarization modulated ellipsometry (PME) and plasma optical emission spectroscopy (OES).

TL;DR: In this paper, a study of the thermal desorption of water adsorbed on a nearly perfect TiO 2 (001) surface at 250 K is presented, where evidence is given for H 2 O dissociation into OH and O Ti H hydroxyl radicals bonded to the Ti atoms.

TL;DR: In this article, a model for reactive sputtering of nitrides and oxides is presented, for small amounts of reactive gas, which is used to produce compound thin films.

TL;DR: In this paper, an attempt was made to reconstruct the behavior of impulse-generated plasma packets in a coaxial accelerator from the effect of this plasma on the structure of the central anode material and its magnetic properties.

TL;DR: In this article, a review of ion beam mixing and ion beam assisted deposition (IBAD) is presented, and recent results of chemically oriented studies are presented, dealing with heterogeneous catalysis in the liquid phase, protection against aqueous corrosion and high temperature oxidation.

TL;DR: In this article, a classical kinetic study of the simple temperature-programmed superficial reaction (TPSR) mechanism consisting of a superficial reaction accompanied by desorption of both reactant and product is presented.

TL;DR: In this article, the beam of cluster ions of CO 2, accelerated by 155 kV, was used to sputter copper targets, and the sputter coefficient was estimated to be 600 Cu-atoms per cluster ion.

TL;DR: A review of the basic principles, theory and instrumentation underlying the observation of ions with the technique of electron stimulated desorption and the results of some recent investigations with water adsorbed at metal and semiconductor surfaces are employed to illustrate the state of research in the field.

TL;DR: In this article, the adsorption of nitric oxide on a Pt(410) surface has been studied by Auger electron spectroscopy (AES) and photoelectron spectrographs (UPS and XPS).

TL;DR: In this article, the use of low energy ions for surface analysis is based on elastic scattering events and neutralization effects favour single scattering events such that with a double differential spectroscopy (energy and scattering angle) surface composition analysis with extreme surface sensitivity is achieved.

TL;DR: In this paper, the wall conditioning techniques developed to remove this film were described, and the success of this film may be partly due to the formation of a thin boron-rich film in non-bakable portholes.

TL;DR: A brief review of the basic physics of magnetron sputtering, starting with some physics of a glow discharge and proceeding to the magnetron effect using a single particle explanation of the phenomena is given together with the results of the author's own experience in designing these devices as discussed by the authors.

TL;DR: In this paper, X-ray analyses of the implanted layers show a correlation between the types of nitrides formed and the implantation dosage, and possible shearing mechanisms responsible for nitride formation are proposed.

TL;DR: In this article, a bakeable (120°C) optical window sealed with indium for ultrahigh vacuum was described and the surfaces to be in contact with the seal were coated with Cr (0.05 μm) and Au (0 2 ) using an ion plating method.

TL;DR: In this paper, the influence of surface binding energy and oxygen redistribution in the target on the sputtering yield of SiO 2 bombarded with Ar with energy 100 eV was studied and the experimental data were fitted very well by a model which corresponds to some form of desorption of oxygen from the target surface and diffusion of excess oxygen inside the target from regions of superstoichiometric O content to regions of substoichiometric O content.

TL;DR: In this paper, it is found that evidence for magic numbers and electron parity effects in clusters have existed in the sputtering literature for a long time, making more sophisticated stability criteria necessary.

TL;DR: In this paper, the role of continuos electron bombardment at aluminium alloy surfaces in vacuum −9 torr has been investigated for a range of treatments including bakeout and glow discharge cleaning.

TL;DR: In this article, broad-beam ion sources, both gridded and gridless, are reviewed, with an emphasis on those at less than 2000 eV. Conventional etching and deposition applications are included, as well as more recent properly modification applications.

TL;DR: In this paper, a modified MEVVA source was tested at the 50 kV testbench and at the UNILAC at GSI (Spadtke et al, GSI-88-20).

TL;DR: In this paper, the authors measured the single and double-electron detachment cross-sections of B, C, O, and Si negative ions on He, Ar, Xe, H 2 and N 2 gas targets in an ion beam energy range of 5-50 keV.

TL;DR: A review of recent experimental work on irradiation of thin films by ions, electrons and photons is given in this paper, where the principles of the adhesion process and techniques for measurement of adhesion are briefly discussed.

TL;DR: In this article, a model for ion assisted deposition under net growth conditions is proposed and analyzed, where separate fluxes of depositing atoms and energetic ions are assumed, the role of the latter being to directly implant into the growing film structure, to intermix all atoms in the structure and to sputter from the surface.

TL;DR: In this paper, the effects of ion implantation and surface nitriding treatment on the formation of hardened surface-layers in aluminum have been investigated, and the results showed that the hardened layers were formed successfully on the surface of aluminum.

TL;DR: In this article, the first reported use of the ion beam deposition technique to grow β-SiC films was reported and demonstrates the capability of using alternating beam deposition to prepare compound structures.

TL;DR: The electrical and structural properties of silicon nitride films deposited by plasma-enhanced chemical vapour deposition (PECVD) have been investigated in this article, where the films were grown using ammonia and silane diluted in nitrogen (2%) as reactants in a wide range of ammonia to silane flow ratios and plasma powers.

TL;DR: In this paper, the authors reported a stable 11% efficient nCdS/i-CdTe/p-ZnTe heterostructure solar cells.