Showing papers in "Vacuum in 1994"

TL;DR: In this article, the currentvoltage characteristic in the OFF-state and switching phenomenon in Ge 20 M 75 Bi 5 (M  S, Se or Te) chalcogenide semiconductor thin films was investigated.

TL;DR: In this paper, the authors discuss the use of tunnolling microscop! (STM) in a wide range of applications, including the atomic arrangement of the rcconstructcd surface of silicon.

TL;DR: In this paper, epitaxial films of evaporated Cu, Ag, Al, Au and Ni have been grown on single crystalline dielectric substrates (c-cut Al2O3 and (100) MgO) under high vacuum conditions.

TL;DR: In this article, the properties of zinc oxide films prepared by dc reactive magnetron sputtering were studied over a range of substrate temperatures (room temperature to 450°C) and the dependence of the structure of the films on the substrate temperature was studied using scanning electron microscopy and X-ray diffraction.

TL;DR: In this article, the authors studied thin layers of mixed iridium-tin oxides, deposited on Ti foils, using inductively coupled plasma emission spectroscopy and a number of surface sensitive spectroscopies and microscopies in order to characterize both the overall composition of the layers and their surface state.

TL;DR: X-ray photoelectron spectroscopy (XPS) is widely used in both surface and near surface regions of materials and the contribution that the data produced can make in the fields of chemistry.

TL;DR: In this paper, a self-consistent calculation of local electrostatic field distributions in the vicinity of single atoms adsorbed on a metal surface was performed for clean Rh and for Rh epitaxially covered with Ag and Au, respectively.

TL;DR: The basic factors affecting the corrosion resistance of thin and hard physically vapour-deposited coatings are reviewed in this paper, where methods used to reduce the risk of corrosion include controlling the deposition parameters, various passivation treatments, deposition of multilayer coatings and alloying the coating/substrate interface.

TL;DR: In this article, X-ray diffraction was used to characterize c-cut sapphire (Al 2 O 3 ) films and showed that the halfwidths in φ and ϰ depend strongly on the polishing method by which the substrates have prepared and on the substrate temperature during evaporation.

TL;DR: In this paper, a new model of the iron catalyst for the ammonia synthesis reaction has been proposed, on the grounds of studies on the interactions between potassium, oxygen, and nitrogen on the iron surface.

TL;DR: In this article, tungsten coatings doped with small percentages of nitrogen (% N at %) were deposited by sputtering and their characterization was focused in view of a possible future application as hard coatings.

TL;DR: In this paper, a UHV compatible deposition system for the growth of diamond films by 2.45 GHz microwave plasma chemical vapour deposition (CVD) was constructed for the purpose of in-situ monitoring by ellipsometry, optical emission spectrometer, mass spectrometry and laser reflectometry.

TL;DR: In this article, the authors synthesize amorphous carbon with the structure of mixed sp 3 + sp 2 bonding and show that carbon films bombarded by CH n + with low energies of 200-400 eV have more sp 3 bonding and high microhardness.

TL;DR: In this paper, a model for hydrogen adsorption on surface of thin gold film was proposed on the basis of measured parameters: (i) initial heat of adaption; (ii) activation energy for desorption at low coverages (θ ≊ 0.01); (iii) heat of hydrogen solution in the bulk of thin Gold film; and (iv) calculated activation power for dissociative H 2 adsorbing.

TL;DR: The optical and structural properties of Al 2 O 3 films produced by oxygen-ion assisted deposition (IAD) have been investigated as a function of ion energy (300-1000 eV), ion current density (50-220 μA cm −2 ), and substrate temperature (ambient-300°C) as discussed by the authors.

TL;DR: In this paper, in situ 1 MeV 4 He RBS and by ex situ XPS and AES analysis, Nitridation of Si and SiGe alloys under normal incidence 12 keV N + 2 bombardment has been studied by in situ RBS measurements, which alternate with the sputtering/bombardment cycles, show the build-up of the nitrogen content in the silicon and Si.86 Ge.14 sample with increasing N+ 2 dose.

TL;DR: In this paper, complete tiles from the X-point target region of the JET tokamak can be analyzed by ion beam techniques in a special chamber equipped to handle beryllium- and tritium-contaminated samples.

TL;DR: In this article, nanoscale amorphous silicon powder was prepared in a specially designed plasma reactor, operating with square-wave modulation (SQWM) of the rf power at low pressure and low temperature.

TL;DR: In this article, the influence of the oxygen partial pressure and total pressure on the X-ray diffraction, transmittance, resistivity, optical band gap, refractive index, packing density and deposition rate have been investigated systematically.

TL;DR: In this paper, the authors investigated the effect of flow velocities larger than sonic speed or average thermal speed on the transfer of gas from a vessel with high pressure to a vessel having much lower pressure or a vacuum.

TL;DR: In this paper, the influence of particle size on the photoelectron spectra of aggregates supported on SiO 2 has been studied in two systems: (a) TiO 2 evaporated on a flat surface of SiO2 and (b) samples in powder form withTiO 2 particles deposited on silica by a wet method.

TL;DR: In this article, the initiation and evolution of individual surface topographic features which extend, with increasing ion fluence, to produce terraced facet structures with ripple-like appearance have been investigated during 40 keV Ar +, O + and Cl + ion bombardment of Si under oblique incidence conditions.

TL;DR: In this paper, the authors used scanning electron microscopy, X-ray diffraction, optical transmission and electrical conductivity, including Hall effect measurements, to obtain highly conductive and transparent SnO 2 thin films.

TL;DR: In this article, the use of unbalanced magnetron sputtering for the production of pyrotechnic devices has been investigated, which is a novel application of such techniques and offers the potential to overcome many of the problems associated with conventional Pyrotechnics.

TL;DR: In this paper, a simple model of the poisoning process has been proposed and the relationship between the degree of poisoning and the nitrogen pressure was obtained, which was attributed to formation of Ti2N and TiN on the cathode surface.

TL;DR: In this paper, the effect of a high external electrostatic field on the strength of atomic binding at metal surfaces was examined using a probe hole field ion microscope equipped with an external gimbal system for manipulation of the emitter apex.