Showing papers in "Vacuum in 1998"

TL;DR: In this paper, the UHV behavior of stainless steel vacuum chambers, coated ex situ by sputtering with a thin film of a getter material, has been investigated and it was shown that the getter film could be activated after air exposure by in situ baking, so as to transform the vacuum chamber from a gas source into a pump.

TL;DR: A short survey of the state-of-the-art in low-pressure sputtering and self-sputtering can be found in this paper, where the main advantages of low pressure sputtering, particularly new physical conditions, are discussed.

TL;DR: In this article, NiO thin films were prepared on Si substrates by DC reactive magnetron sputtering from a nickel metal target in Ar+O2 with the relative O2 content varied from 15 to 50%.

TL;DR: In this article, a multicathode unbalanced magnetron sputtering system is used to produce a dense secondary plasma that is used for producing a well-adhered, fully dense film.

TL;DR: A short survey concerning the stress and strain kinetics in thin film starting from the definitions and covering most interesting recent experimental facts as well as theoretical models describing ion induced processes that define stress sign and level can be found in this article.

TL;DR: In this article, the influence of the preparation technique on the structural, optical and electrical properties of polycrystalline CdS films was investigated using X-ray diffraction (XRD), scanning electron microscopy (SEM), optical transmission and electrical resistivity.

TL;DR: In this paper, the authors showed that crystallization of ZnO thin films prepared by radio frequency sputtering is strongly influenced by the surface crystallinity and morphology of the substrates.

TL;DR: In this article, the ASDEX gauge has been developed at MPI fur Plasmaphysik, Garching, which can cope with the conditions inside the discharge vessels of fusion oriented plasma experiments: strong magnetic fields with direction changing by up to ±25°, and high levels of noise and background signals.

TL;DR: The physical properties of tin-nitride thin films deposited onto glass substrates by rf reactive sputtering were reported in this article, where the lattice parameters were calculated from X-ray diffraction patterns as a =0.369 nm and c = 0.529 nm.

TL;DR: In this article, NiO thin films were deposited by dc reactive magnetron sputtering Ni in an Ar + O2 mixed atmosphere at room temperature on unheated Si substrates, and its effect on the deposition rate, structural, composition and electrical properties of the films were studied using thickness measurement, X-ray diffraction, transmission electron microscopy, Rutherford backscattering spectrometry and resistivity measurement.

TL;DR: In this paper, an unbalanced DC magnetron co-sputtering was applied to a segmented TiN\Tib 2 target to characterize the microstructure and chemical composition of a nanocrystalline fcc TiN phase.

TL;DR: In this article, a brief overview of the potential of ion implantation in industrial applications is presented, along with reasons why there has been only a slow acceptance of the technology and what factors must be considered to enhance its use for optical applications with insulating materials.

TL;DR: In this article, the effect of the excitation frequency on the deposition rate and the film quality of a-SiNx:H and a-a-SiH films has been investigated.

TL;DR: In this paper, the energy transfer mechanism from an electron beam to a metal target, weld pool and keyhole of formation during electron beam welding was studied using a collector for secondary emitted particles, light photo diodes and CCD techniques.

TL;DR: In this paper, the effects of SiN x gate dielectric material properties to TFT devices and the large area PECVD silicon nitride (SiN x ) processes are discussed.

TL;DR: In this paper, the microstructure, hardness, refractive index and IR transmittance of a dc reactive magnetron sputtering was examined in an Ar+N 2 gas mixture.

TL;DR: In this article, a simple computer model of the charging process was developed to predict the equilibrium surface potential of a trapped grain in an electrodynamic quadrupole placed in an ultra-high vacuum chamber and bombarded by the electron beam.

TL;DR: In this article, the anatase phase of TiO2 was suppressed by energetic ion bombardment suppressing the rutile phase, and the dielectric constant of 60 (±5) showed no variation with a film thickness in the range between 20 to 200nm.

TL;DR: In this paper, the formation of self-assembly of polycrystalline gold monolayers has been investigated using FT-Raman spectroscopy using CH3(CH2)n SH (n = 2, 5, 7, 8, 9, 11 and 17).

TL;DR: In this article, the authors measured the adhesion strength between the Cu thin film and these polymer substrates and found that the ether moiety between the two benzene rings in ODA (oxydianiline) would play an important role in the Adhesion between a Cu thin films and a PI substrate.

TL;DR: In this article, a fcc cubic structure and a lattice parameter of 4.17A was found by X-ray diffraction ; this lattice value corresponded to an oxygen content of about 52%.

TL;DR: In this article, it was proposed that at the initial step, Si−N or N−C bonds of the monomer are broken by hydrogen radicals. And N atoms in the films are assumed to be originated from the plasma.

TL;DR: In this article, the electrical conductivity and differential thermal analysis on alloyed samples of Ge and Sn with Se, prepared under vacuum, to evaluate their glass-forming tendencies were made, and it was found that there is a correlation between the chalcogenide glass forming ability and the number of lone-pair electrons.

TL;DR: In this paper, it was found that the outgassing rate of a vacuum fired 316 LN stainless steel chamber increased with bakeout temperature in the range of 100 °C to 180 °C.

TL;DR: In this article, an r.f. reactive sputter deposition technique was adopted to deposit ferroelectric lead zirconate titanate (PZT) thin films with high rate from a ZrTi alloy target combined with PbO pellets.

TL;DR: In this paper, a combination of low and high angle X-ray diffraction as well as TEM is used for the characterisation of modulated structures and it is also very useful in the investigation of the thermal stability.

TL;DR: In this paper, a modified model for island films on insulating substrates is presented, which is based on electrostatically activated tunneling, but under-estimate actual conductances by orders of magnitude.

TL;DR: In this paper, the B2 ordered structure (CsCl prototype) was used to study the properties of NiAl and FeAl underlayers and showed that they have similar lattice constants to that of pure Cr and have a smaller grain size and more uniform equiaxed grains.

TL;DR: In this article, a model consisting of 72 chemical reactions between 35 active species in the discharge is analyzed in detail, the main attention being devoted both to the initial stages of methane decomposition and to the yield of stable products together with the most important reactions for the production of individual species.

TL;DR: In this paper, the conduction mechanism of the ZnO/Pr 6 O 11 double-layered thin film varistor was discussed on the basis of the measurements of voltage-current (V - I ) and capacitance-voltage (C - V ) characteristics and thermally stimulated current (TSC).