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Showing papers in "Vacuum in 1999"


Journal ArticleDOI
01 Dec 1999-Vacuum
TL;DR: A review of the deposition of multilayered coatings by reactive sputtering and characterization of these coatings using transmission electron microscopy and X-ray diffraction is presented in this paper.

413 citations


Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this article, a thin film (∼1.5μm) of a getter material, and subsequently exposed to ambient air, has been found to recover a pumping action after “in situ bakeout.

114 citations


Journal ArticleDOI
01 Jan 1999-Vacuum
TL;DR: In this paper, the effect of the doping and annealing atmosphere on the electrical, optical and structural properties of the produced zinc oxide thin films has been investigated, and the most pronounced changes were observed in the films annealed in Argon.

81 citations


Journal ArticleDOI
01 Dec 1999-Vacuum
TL;DR: In this paper, the reactive ion etching (RIE) of quartz and of silica-based glasses was examined in CF 4 /CHF 3 plasmas, and the etch rate was shown to reduce strongly with an increasing percentage of nonvolatile elements in the composition of the glass.

76 citations


Journal ArticleDOI
01 Jan 1999-Vacuum
TL;DR: In this article, a range of carbon coatings from transparent, electrically insulating to black, conductive coatings, can be produced and the effects of the nature of the substrates with different hardness properties (M42, stainless steel and Al) are investigated.

68 citations


Journal ArticleDOI
01 Jan 1999-Vacuum
TL;DR: In this paper, the preparation of layers of amorphous Ge x Se 1− x (with Ge atomic concentrations x = 0, 0.25 and 0.34) by plasma-enhanced chemical vapour deposition (PECVD) using the hydrides, GeH 4 and H 2 Se, as precursor gases was described in detail.

66 citations


Journal ArticleDOI
01 Mar 1999-Vacuum
TL;DR: In this article, polytetrafluorethylene (PTFE) was treated with N +, O + and C + ion beams with energies of 20 and 30 kV at 5 mA/cm 2 current density in the pulse regime.

54 citations


Journal ArticleDOI
01 Nov 1999-Vacuum
TL;DR: In this article, a fine grain near equiaxed microstructure was found to exhibit a compressive residual stress of 6.5 GPa in contrast to columnar Ti0.43Al0.53Cr0.03Y0.02N films.

54 citations


Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this paper, the dry sliding wear of monolayer TiAlCrN and multilayer multi-layer TiAlN/CrN coatings was investigated against a BM2 tool steel counterface.

51 citations


Journal ArticleDOI
01 Jan 1999-Vacuum
TL;DR: In this article, optical parameters, n (λ ), k (λ ) and E 0, of TiO 2 thin films were obtained, using only optical transmittance measurements.

50 citations


Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this article, a new type of sputtering discharge and its applications for film deposition are described, which is a pulse, quasi-stationary and high-current diffuse discharge in the magnetic field.

Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this paper, the basic mechanical and structural properties, as well as the oxidation behavior of Ti 1- x Al x N coatings sputtered at low temperature are reported. But the results were limited to the case of a sputtering at a temperature below 200°C.

Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this article, a micromachined mass filter made from silicon with Au metallised specially drawn glass fibres of length 30 mm and diameter 0.5 mm was mounted on a vacuum flange with a VG ANAVAC ion source and a Faraday plate collector.

Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this article, the authors explored the gas flow measurement by means of orifices and Venturi tubes, which act as converters which transform a throughput to a difference pressure which can be conveniently measured.

Journal ArticleDOI
01 Mar 1999-Vacuum
TL;DR: In this paper, the properties of ZrCu and ZrN magnetron sputtered from an alloyed ZrNi (70/30/wt.%) target in Ar and Ar+N 2 at the same total pressure of 0.7

Journal ArticleDOI
01 Mar 1999-Vacuum
TL;DR: In this article, the long-range effect of metal ion implantation was studied in alloys and in low ductility materials such as TiN. Microstructural studies of TiN coatings after MII were presented together with a model for the development of this effect.

Journal ArticleDOI
01 Apr 1999-Vacuum
TL;DR: In this paper, two (Cr,Ta)N coatings with different composition were deposited in a Sputron plasma beam sputtering apparatus at a temperature below 200°C on polished tool steel disks, polished alumina substrates and silicon wafers.

Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this article, the hydrogen pressure inside a well-baked stainless steel container was found to saturate at about 0.2mPa under seal-off conditions at room temperature.

Journal ArticleDOI
01 Apr 1999-Vacuum
TL;DR: In this paper, a characterization of amorphous plasma enhanced chemical vapour deposited (PECVD) silicon oxide films suitable for integrated optics applications is reported. But the composition of the layers depends mainly on the reactant gas flow ratio.

Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this paper, the performance of novel CrN/NbN superlattice coatings in comparison with a commercial CrN coating and a 304L control specimen was evaluated.

Journal ArticleDOI
01 Jan 1999-Vacuum
TL;DR: In this paper, a comparative study of modifications produced by Nitrogen implantations on three different commercial alloys is presented, where different Nitrogen doses have been implanted, hardness and wear tests have been carried out to investigate the influence of implantation parameters.

Journal ArticleDOI
01 Jan 1999-Vacuum
TL;DR: In this paper, the authors studied the reaction kinetics in dependence on the afterglow time in accordance with experimental data and found that the energy of excited particles is reduced, and the limited amount of reactions is important.

Journal ArticleDOI
01 Jul 1999-Vacuum
TL;DR: In this article, X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM) were used to study the nanoscale morphologies of the coatings.

Journal ArticleDOI
01 Oct 1999-Vacuum
TL;DR: In this article, the authors investigated the time dependence of water adsorption on polycrystalline barium titanate films fabricated on silicon under hydrothermal conditions and found that the typical amplitude change was about 0.05 eV for a 50% humidity variation, with higher variations at lower humidity.

Journal ArticleDOI
01 Apr 1999-Vacuum
TL;DR: The results of the volume ratios obtained with the spinning rotor gauge method were in agreement (relative differences ≤ 3×10 -4 ) with the results obtained with either of the two other independent methods.

Journal ArticleDOI
01 May 1999-Vacuum
TL;DR: In this paper, the influence of the acetylene flow rate on the tribological properties of TiC films produced by cathodic arc plasma deposition (CAPD) on the high-speed steel substrates was investigated.

Journal ArticleDOI
01 Oct 1999-Vacuum
TL;DR: In this article, X-ray photoelectron spectroscopy (XPS) and scanning Auger microscopy (SAM) have been used to study two ancient objects of the Vatican Museums: a Roman bronze found in seawater, and an Etruscan bronze, found in soil.

Journal ArticleDOI
S.S. Fouad1
01 Apr 1999-Vacuum
TL;DR: In this paper, the optical gap energy of glassy Te46-xAs32+xGe10Si12 alloys was calculated for the amorphous Te46xAs 32+x Ge10Si 12 system under vacuum with x = 0, 1, 2, 4 and 5.

Journal ArticleDOI
M. Fadel1
01 Mar 1999-Vacuum
TL;DR: In this article, the effect of antimony in concentrations from 0.01 to 0.20% to Se0.75Ge0.25-y glass on its dc conductivity is analyzed.

Journal ArticleDOI
01 Nov 1999-Vacuum
TL;DR: In this article, a planar magnetron sputtering system with an additional plasma confinement which can be operated at low argon pressures (down to 3.4×10−2