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Fig. 1. Sputter deposition rate (a) and simulation (b) of deposition rate in the reactive Al/oxygen system as function of the oxygen flow in DC and in HiPIMS mode of operation [12].
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Content maybe subject to copyright
Journal Article
•
DOI
•
α-alumina coatings on WC/Co substrates by physical vapor deposition
[...]
T. I. Selinder
,
E. Coronel
,
Erik Wallin
1
,
Ulf Helmersson
1
•
Institutions (1)
Linköping University
1
01 Mar 2009
-
International Journal of Refractory Metals & Hard Materials