A chip and pixel qualification methodology on imaging sensors
Summary (2 min read)
INTRODUCTION
- Imaging sensors of different varieties are widely used in commercial and scientific applications.
- There have been extensive research efforts to enhance the performance of the CMOS APS imaging sensors by adopting more robust digital/analog circuit designs and sampling techniques, as well as more advanced imaging processing technology and semiconductor fabrication technologies [1-9].
- On the other hand, few studies have concentrated on the reliability or qualification of the imaging sensors.
- It is taken for granted that the reliability of the imaging sensors should be automatically guaranteed when the semiconductor process technologies fabricating the imaging devices have been qualified.
- It should be noted that the environmental, mechanical and packaging evaluation procedures and tests are also part of the qualification plan and practice, but are not addressed herein.
EXPERIMENTAL DETAILS
- The image sensor is photodiode-type CMOS active pixel sensor imaging system on chip, designed by Jet Propulsion Laboratory and manufactured by a standard commercial CMOS production line.
- Schematic of the photodiode-type active pixel sensor cell.
- The image sensors were stressed in parallel and stopped in a pre-set time interval to be monitored one by one for Dark Rate, Linearity, Dark Current Non-Uniformity (DCNU), Fixed Pattern Noise (FPN) and Photon Response Non-Uniformity (PRNU).
- At the same time, the highest stress voltage at each stress temperature should be within the range when the sensor is still framing and functional.
- During the accelerated testing, the sensors were running at 5 MHz with the clock pulse matching the stress voltage applied on the chips.
CHIP RELIABILITY PROJECTION
- For overall VIDI APS chip reliability, Linearity and Dark Rate are the two parameters to be considered since they reflect the overall parametric shift or change on the imaging chips.
- The characteristics trend is representative for all imaging chips under all stress conditions.
- The percentage of the slope change of the linearity curves in Figure 4 is plotted in Figure 5, showing almost linear increasing Linearity slope versus stress time in a log-log scale.
- Assuming the Arrhenius model [12] o a o kT E V eet β~% where t% is the chip life time at certain failure fraction and is determined to be 0.1% in their case; β, Vo, Ea, k and To are the voltage acceleration factor, operating voltage, activation energy, Boltzmann’s constant and operating temperature in Kelvin, respectively.
- Life and failure rate can be also generated by using a percentage degradation of Dark Rate as well.
PIXEL RELIABILITY PROJECTION
- Therefore, pixel reliability needs to be considered and projected as well.
- The hot pixel generation rate is slow at the accelerated stress levels.
- The pixel distributions for DCNU, FPN and PRNU did not have significant shift during their accelerated testing.
- This happened during radiation testing when the imager failed in a sudden owing to the periphery circuit failure.
- Acceptable image quality can be chosen based on the same experimental data or simulation results using small degradation percentage increases.
SUMMARY
- While a reliability projection based on the imaging sensor’s overall parametric performance may provide some insight on the imager performance degradation, pixel reliability projection, either by experimental or by predicted pixel distributions, has to be performed.
- The projected pixel reliability can be directly related to imaging quality and provide additional sensor performance information.
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Citations
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Cites background from "A chip and pixel qualification meth..."
...Dark current is the thermally generated electrons [36] discharging the pixel just as if a photon had hit the pixel....
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...The exposure (integration) time was set to the value when the mean of acquired uniform images were equal to half of the saturation level of the sensor [36]....
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Cites background from "A chip and pixel qualification meth..."
...Until now, much of the attention on this topic has focused on imagers operating in harsh environments like space (see [12-14] for examples), while commercial DSC data has been limited to anecdotal reports of defective pixels from photographers....
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3 citations
References
45 citations
"A chip and pixel qualification meth..." refers background in this paper
...Figure 1 gives a schematic of the photodiode-type active pixel sensor cell [1, 3-4 , 11]....
[...]
...In this region, the gate to source voltage depends logarithmically on the drain current with a constant slope independent of the technology and equal to kT/q, as shown in the following simplified expression for the gate-source voltage for a transistor working in its weak inversion region [ 3-4 ,11]:...
[...]
...There have been extensive research efforts to enhance the performance of the CMOS APS imaging sensors by adopting more robust digital/analog circuit designs and sampling techniques, as well as more advanced imaging processing technology and semiconductor fabrication technologies [ 1-9 ]....
[...]
37 citations
"A chip and pixel qualification meth..." refers background in this paper
...There have been extensive research efforts to enhance the performance of the CMOS APS imaging sensors by adopting more robust digital/analog circuit designs and sampling techniques, as well as more advanced imaging processing technology and semiconductor fabrication technologies [1-9]....
[...]
5 citations
4 citations