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Fig. 1. TEM images taken in the early crystalline regimes of high CH HWCVD film (a) and (similar) high CH PECVD film (b). The crystalline volume fractions are roughly similar. The 600 °C anneal times are included in the figures.
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Journal Article
•
DOI
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A comparison of grain nucleation and grain growth during crystallization of HWCVD and PECVD a-Si:H films
[...]
A. H. Mahan
1
,
S. P. Ahrenkiel
1
,
Ruud E. I. Schropp
2
,
H. B. T. Li
2
,
D. S. Ginley
1
- Show less
+1 more
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Institutions (2)
National Renewable Energy Laboratory
1
,
Utrecht University
2
15 Jan 2008
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Thin Solid Films