Journal ArticleDOI
A RIE process for submicron, silicon electromechanical structures
Z L Zhang,N C MacDonald +1 more
Reads0
Chats0
TLDR
In this paper, a reactive ion etching (RIE) process is used for the fabrication of submicron, movable single-crystal silicon (SCS) mechanical structures and capacitor actuators.Abstract:
A reactive ion etching (RIE) process is used for the fabrication of submicron, movable single-crystal silicon (SCS) mechanical structures and capacitor actuators. The process is called SCREAM for single crystal reactive etching and metallization process. The RIE process gives excellent control of lateral dimensions (0.2 mu m approximately 2 mu m) while maintaining a large vertical depth (1 mu m approximately 4 mu m) for the formation of high aspect ratio, freely suspended SCS structures. The silicon etch processes are independent of crystal orientation and produce controllable vertical profiles. The process also incorporates process steps to form vertical, 4 mu m deep, aluminum, capacitor actuators. Using SCREAM, the authors have designed, fabricated and tested two-dimensional x-y microstages and circular SCS structures. For the x-y stage they measured a maximum displacement of +or-6 mu m in x and y with 40 V DC applied to either x or y, or both x and y actuators. The process technology offers the capability to use a structural stiffness as low as 10-2 N m-1.read more
Citations
More filters
Journal ArticleDOI
Bulk micromachining of silicon
TL;DR: In this article, the available etching methods fall into three categories in terms of the state of the etchant: wet, vapor, and plasma, and they are reviewed and compared by comparing the results, cost, complexity, process compatibility, and other factors.
Journal ArticleDOI
Lab-on-chip technologies: making a microfluidic network and coupling it into a complete microsystem : a review
Patrick Abgrall,Anne-Marie Gué +1 more
TL;DR: The use of various materials, such as silicon, glass and polymers, and their related technologies for the manufacturing of simple microchannels and complex systems is discussed in this paper.
Journal ArticleDOI
SCREAM I: A single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures
TL;DR: In this paper, a single-crystal slhcon, high aspect ratlo, low-temperature process sequence for the fabelfcatlon of suspended movable smgle-crystals s&on (SCS) beam structures is presented.
Proceedings ArticleDOI
Capacitance Based Tunable Micromechanical Resonators
TL;DR: In this article, actuators were used to tune the resonant frequency of micromechanical oscillators, and the results showed that resonant oscillations from 7.7% to 146% of the original frequency can be achieved.
Patent
Apparatus and method for the generation, separation, detection, and recognition of biopolymer fragments
TL;DR: In this article, an integrated instrument for the high-capacity electrophoretic analysis of biopolymer samples is presented, in which the migration lanes are formed between a bottom plate and a plurality of etched grooves in a top plate, permitting concurrent separation of 80 or more separate samples.
References
More filters
Journal ArticleDOI
Silicon as a mechanical material
TL;DR: This review describes the advantages of employing silicon as a mechanical material, the relevant mechanical characteristics of silicon, and the processing techniques which are specific to micromechanical structures.
Journal Article
Silicon as a mechanical material
TL;DR: In this article, the advantages of employing silicon as a mechanical material, the relevant mechanical characteristics of silicon, and the processing techniques which are specific to micromechanical structures are discussed.
Journal ArticleDOI
Laterally Driven Polysilicon Resonant Microstructures
TL;DR: In this article, a 2 μm-thick phosphorus-doped low-pressure chemical-vapor-deposited (LPCVD) polysilicon film was used for exciting the resonance.
Journal ArticleDOI
Fabrication of novel three-dimensional microstructures by the anisotropic etching of
TL;DR: In this paper, the anisotropic etching of single crystal silicon oil (loo) and orientation in a solution of pyrocatechol, ethylene di:nnine, and water is reviewed and the fabrication of three novel types of micro-structures is described in detail.
Journal ArticleDOI
Polycrystalline Silicon Micromechanical Beams
Roger T. Howe,Richard S. Muller +1 more
TL;DR: In this article, the dependences of maximum free standing length and beam deflection on the thickness of a polycrystalline silicon beam were investigated, and annealing the poly-Si prior to beam formation was improved.