Journal ArticleDOI
A SEM-image processing method for recognition and fast location of IC registration marks
N. K. L. Raja,Kamaljit Rangra +1 more
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TLDR
A method for extracting the features of a registration mark from its SEM image, for storing it as a template and for detection of similar registration marks on the wafer is described.About:
This article is published in Microelectronic Engineering.The article was published on 1990-04-01. It has received 0 citations till now. The article focuses on the topics: Image processing.read more
References
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Journal ArticleDOI
Experimental scanning electron‐beam automatic registration system
TL;DR: In this paper, an experimental registration system is discussed that is capable of precisely overlaying two or more levels of a microcircuit pattern written by an electron-beam lithographic machine.
Journal ArticleDOI
Control system design and alignment methods for electron lithography
TL;DR: The electron beam exposure system (EBES) as discussed by the authors was designed to economically expose integrated circuit masks on a production basis and to directly pattern semiconductor substrates for special applications where a limited number of devices are required.
Journal ArticleDOI
A pattern recognition technique using sequences of marks for registration in electron beam lithography
TL;DR: In this article, a pattern recognition technique for precise registration in electron beam lithography is described, where the usual simple mark on the substrate is replaced by a symbol of carefully chosen configuration, based on a pseudorandom binary sequence.
Journal ArticleDOI
High‐precision automatic alignment procedure for vector scan e‐beam lithography
D. Stephani,E. Fröschle +1 more
TL;DR: In this paper, an automatic alignment procedure for two successive exposure levels of better than ±50 nm in a deflection field of 600 μm at a beam current of 5×10−10 A within an average time of 3 s was described.
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