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Journal ArticleDOI

Academic and industry research progress in germanium nanodevices

Ravi Pillarisetty
- 17 Nov 2011 - 
- Vol. 479, Iss: 7373, pp 324-328
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TLDR
Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.
Abstract
Silicon has enabled the rise of the semiconductor electronics industry, but it was not the first material used in such devices. During the 1950s, just after the birth of the transistor, solid-state devices were almost exclusively manufactured from germanium. Today, one of the key ways to improve transistor performance is to increase charge-carrier mobility within the device channel. Motivated by this, the solid-state device research community is returning to investigating the high-mobility material germanium. Germanium-based transistors have the potential to operate at high speeds with low power requirements and might therefore be used in non-silicon-based semiconductor technology in the future.

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Citations
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Journal ArticleDOI

Investigation of electrochemical reduction of GeO2 to Ge in molten CaCl2-NaCl

TL;DR: In this article, the reduction of solid GeO2 to Ge occurred at a potential of about -0.50-V (vs. Ag/Ag+), but generating various calcium germanates simultaneously, whose reduction was a little more difficult and needed a potential more negative than -1.00-V.
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Fully Depleted Ge CMOS Devices and Logic Circuits on Si

TL;DR: In this article, the authors systematically studied Ge CMOS devices and logic circuits fabricated on a GeOI substrate, with the novel recessed channel and source/drain structures.
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A Ruthenium Dihydrogen Germylene Complex and the Catalytic Synthesis of Digermoxane

TL;DR: A germylene complex with a labile η2-H2 coligand, [RuH2(═GePh2)(η 2-H 2)(PCy3)2] (2), was isolated in very good yield from the reaction of the bis(dihydrogen) complex with Ph2GeH2.
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Self focusing SIMS: probing thin film composition in very confined volumes

TL;DR: In this article, a self focusing SIMS (SFSSIMS) approach is proposed to determine the composition of a specific compound using cluster ions which contain the constituents of the compound.
Journal ArticleDOI

Ge nanoparticles in SiO 2 for near infrared photodetectors with high performance

TL;DR: This work prepared films of amorphous germanium nanoparticles embedded in SiO2 deposited by magnetron sputtering on Si and quartz heated substrates at 300, 400 and 500 °C and investigated structure, morphology, optical, electrical and photoconduction properties.
References
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Proceedings ArticleDOI

A 90nm high volume manufacturing logic technology featuring novel 45nm gate length strained silicon CMOS transistors

TL;DR: In this article, the authors describe a novel strained transistor architecture which is incorporated into a 90nm logic technology on 300mm wafers, which features an epitaxially grown strained SiGe film embedded in the source drain regions.
Journal ArticleDOI

Controlling threading dislocation densities in Ge on Si using graded SiGe layers and chemical-mechanical polishing

TL;DR: In this paper, a method of controlling threading dislocation densities in Ge on Si involving graded SiGe layers and chemical-mechanical polishing (CMP) is presented.
Journal ArticleDOI

High-k/Ge MOSFETs for future nanoelectronics

TL;DR: In this article, the opportunities and challenges of high-k/Ge MOSFETs are discussed on the basis of the material properties of Ge oxide to provide insights for future progress.
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