Journal ArticleDOI
Adsorption dynamics and angular dependency of contaminants on Ru mirror surfaces
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TLDR
In this paper, a real time contamination of the Ru surface and corresponding effect on its work function were studied using extreme ultraviolet photoelectron spectroscopy with a 13.5-nm wavelength of light.Abstract:
A real time contamination of the Ru surface and corresponding effect on its work function were studied using extreme ultraviolet photoelectron spectroscopy with a 13.5-nm wavelength of light. The change in work function indicates formation of molecular dipoles, oriented outward from the Ru surface. X-ray photoelectron spectroscopy investigations suggest variation in electromagnetic interaction with the components of the adsorbed foreign species when the emission angle from the target surface was changed from 0° to 50°; H2O and C-On show a strong coupling at lower angles and OH dominates at higher angles, whereas carbon is found in the mid-range peaking at 30°.read more
Citations
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Journal Article
Chemical Effect of Dry and Wet Cleaning of the Ru Protective Layer of the Extreme ultraviolet (EUV) Lithography Reflector
TL;DR: In this paper, the chemical influence of cleaning of the Ru capping layer on the extreme ultraviolet (EUV) reflector surface has been investigated and two main approaches for EUV reflector cleaning: wet chemical treatments (sulfuric acid and hydrogen peroxide mixture) and dry cleaning (oxygen plasma and UV/ozone treatment) were tested.
Journal ArticleDOI
Time dependent changes in extreme ultraviolet reflectivity of Ru mirrors from electron-induced surface chemistry
TL;DR: In this paper, the surface properties of Ru films were analyzed in situ by means of X-ray photoelectron spectroscopy (XPS) and further verified by Auger electron spectrography (AES), and the impact on EUV reflectivity with time was examined in situ via continuous or discrete EUV exposures.
Proceedings ArticleDOI
Low energy electron bombardment induced surface contamination of Ru mirrors
A. Al-Ajlony,Aloke Kanjilal,M. Catalfano,Sivanandan S. Harilal,Ahmed Hassanein,Bryan J. Rice +5 more
TL;DR: In this paper, the impact of secondary electrons induced contamination of the Ru surface was investigated using X-ray and photoelectron spectroscopy (XPS) studies, and the corresponding effect on in-situ EUV reflectivity was examined by exposing Ru surface to photons at a wavelength of 13.5 nm in an ultrahigh vacuum chamber.
Journal ArticleDOI
Optical properties and oxidation resistance of different transition metals for soft X-ray and EUV applications
Robert A. Müller,Robert A. Müller,Sergiy Yulin,Philipp Naujok,Philipp Naujok,Norbert Kaiser,Andreas Tünnermann,Andreas Tünnermann +7 more
TL;DR: In this article, the results of a comparative study of Ru-, Mo-, Nb- and Pd- coatings designed for grazing angle applications in the soft X-ray and extreme ultraviolet (EUV) spectrum are presented.
Journal ArticleDOI
Probing temporal evolution of extreme ultraviolet assisted contamination on Ru mirror by x-ray photoelectron spectroscopy
A. Al-Ajlony,Aloke Kanjilal,M. Catalfano,M. D. Fields,Sivanandan S. Harilal,Ahmed Hassanein,Bryan J. Rice +6 more
TL;DR: In this paper, a time-dependent systematic decrease in EUV reflectivity with a 13.5 nm wavelength of light in high vacuum atmosphere was recorded and correlated with the change in chemical composition on the Ru surface as derived from in situ x-ray photoelectron spectroscopy (XPS).
References
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BookDOI
Photoelectron spectroscopy : principles and applications
TL;DR: In this paper, the three low-index faces of a Face-Centered Cubic (fcc) Crystal Face were modeled as 3D cubic faces, and a table of binding energies was presented.
Journal ArticleDOI
X-ray photoelectron spectroscopic studies of surface modified single-walled carbon nanotube material
TL;DR: In this paper, the surface chemical state of two carbon nanotube materials and the evidence of surface modification from a reaction with dichlorocarbene were determined using X-ray photoelectron spectroscopy (XPS).
Journal ArticleDOI
Surface phenomena related to mirror degradation in extreme ultraviolet (EUV) lithography
TL;DR: In this article, the authors summarize the thermal and radiation-induced surface chemistry of bare Ru exposed to gases; the emphasis is on H2O vapor, a dominant background gas in vacuum processing chambers.
Journal ArticleDOI
Modeling radiation-induced carbon contamination of extreme ultraviolet optics
TL;DR: In this paper, a comprehensive model of radiation-induced carbon contamination of extreme ultraviolet (EUV) optics is presented, which describes the key processes that contribute to the deposition of a carbon film on a multilayer optic when the optic is exposed to EUV radiation in the presence of residual hydrocarbons.
Journal ArticleDOI
XPS investigations of ruthenium deposited onto representative inner surfaces of nuclear reactor containment buildings
TL;DR: In the case of a severe accident in a nuclear power plant, interactions of gaseous RuO 4 with reactor containment building surfaces (stainless steel and epoxy paint) could possibly lead to a black Ru-containing deposit on these surfaces as mentioned in this paper.