Journal ArticleDOI
An X-ray photoelectron study of the dependence of HF concentration on an etched silicon surface
E.T.Paul Benny,J. Majhi +1 more
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TLDR
Using X-ray photoelectron spectroscopy, the chemical state of a silicon surface treated with hydrofluoric acid and the resulting contaminant species (fluorine, carbon and oxygen) were studied as a function of the etchant concentration.About:
This article is published in Journal of Electron Spectroscopy and Related Phenomena.The article was published on 1992-06-01. It has received 12 citations till now. The article focuses on the topics: Isotropic etching & Silicon.read more
Citations
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Characterization of a Surface Coating Formed from Carboxylic Acid-Based Coolants
TL;DR: In this paper, the surface films formed under these dynamic heat-transfer conditions are characterized with the use of X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared (FT-IR) is also used for the study and characterization of the surface film formed.
Patent
Olefin metathesis catalyst
Simon G. Kukes,Robert L Banks +1 more
TL;DR: In this article, a catalyst comprising an inorganic refractory oxide support containing at least one of tungsten oxide and molybdenum oxide and a promoting amount of at least a methylating agent under conditions suitable for the methylating agents to promote the activity of the oxides for the disproportionation reaction.
Journal ArticleDOI
Angle-resolved and depth profiling XPS investigation of a monolayer niobium oxide catalyst
TL;DR: In this paper, a combination of conventional, angle-resolved and depth profiling X-ray photoelectron spectroscopy (XPS) was used to characterize the Niobic acid monolayer.
Journal ArticleDOI
Olefin metathesis catalyst.: III. Angle-resolved XPS and depth profiling study of a tungsten oxide layer on silica
TL;DR: In this paper, a model support consisting of a thin layer of SiO2 on a Silicon single crystal has been used to study the [W]n+/SiO2/Si (100) model catalyst precursor prepared by a controlled reaction of π-C5H5W(CO)3Cl with the SiO 2 surface.
Journal ArticleDOI
Scanning tunneling microscopy and spectroscopy of tungsten oxide thin films in air
TL;DR: In this article, X-ray photoelectron spectroscopy valence band measurements have evidenced a structure near the Fermi level, which has been assigned to a structural oxygen deficiency of the deposited films, which is also observed in the conductance curve of some samples.
References
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ESCA study of fractional monolayer quantities of chemisorbed gases on tungsten
TL;DR: In this paper, the X-ray photoelectron spectroscopy (ESCA) has been used in a study of CO and O2 chemisorbed on polycrystalline tungsten sample.
Journal ArticleDOI
Effect of organic contaminants on the oxidation kinetics of silicon at room temperature
TL;DR: In this paper, the oxidation kinetics of HF-etched n and p-doped silicon in air at room temperature have been studied by electron spectroscopy for chemical analysis.
Journal ArticleDOI
The Influence of Silicon Surface Cleaning Procedures on Silicon Oxidation
G Gould,Eugene A. Irene +1 more
TL;DR: In this paper, the results of experiments which demonstrate the effect of pre-oxidation cleaning of silicon on the kinetics of oxidation for five different cleaning procedures are reported, these cleaning treatments include simply rinsing samples as obtained from the manufacturer as well as combinations of NH4OH-H2O2, HCl-H 2O2 and HF solutions.
Journal ArticleDOI
Studies of atomic and molecular fluorine reactions on silicon surfaces
C. D. Stinespring,A. Freedman +1 more
TL;DR: In this article, the results indicate that molecular fluorine is dissociatively chemisorbed to form an SiF2-like surface species, which saturates at approximately one monolayer surface coverage.
Journal ArticleDOI
Dielectric characteristics of fluorinated ultradry SiO2
TL;DR: In this paper, the possible role of fluorine on the improvement of the dielectric characteristics of metal-oxide-semiconductor capacitors with fluorinated ultradry oxides has been discussed.