Analysis of temperature dependent I―V measurements on Pd/ZnO Schottky barrier diodes and the determination of the Richardson constant
TL;DR: In this paper, the Richardson constant and the mean barrier height were obtained as 167 A K - 2 cm - 2 and 061 EV in the temperature range 80-180 K, respectively.
Abstract: Temperature dependent current–voltage ( I – V ) and Hall measurements were performed on Pd/ZnO Schottky barrier diodes in the range 20–300 K The apparent Richardson constant was found to be 860 × 10 - 9 A K - 2 cm - 2 in the 60–160 K temperature range, and mean barrier height of 050 eV in the 180–300 K temperature range After barrier height inhomogeneities correction, the Richardson constant and the mean barrier height were obtained as 167 A K - 2 cm - 2 and 061 eV in the temperature range 80–180 K, respectively A defect level with energy at 012 eV below the conduction band was observed using the saturation current plot and ( 011 ± 001 ) eV using deep level transient spectroscopy measurements
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TL;DR: In this paper, a single phase of ZnO microring with outer diameter ranging from 2.2μm to 1.72μm and inner diameters ranging from 125nm to 470nm was obtained.
161 citations
TL;DR: In this article, the temperature-dependent electrical parameters of Pd/n-ZnO thin film-based Schottky diodes grown on n-Si substrates by thermal evaporation method were investigated by considering a Gaussian distributed barrier height across the Pd-n-znO interface with a standard deviation σ 0 around a mean barrier height qφB,m.
Abstract: This letter reports the temperature-dependent electrical parameters of Pd/n-ZnO thin film-based Schottky diodes grown on n-Si substrates by thermal evaporation method. The parameters have been investigated by considering a Gaussian distributed barrier height across the Pd/n-ZnO interface with a standard deviation σ0 around a mean barrier height qφB,m. As compared with the reported results, the estimated values of the Richardson constant (~19.54Acm-2K-2) and mean barrier height (~1.41 eV) are much closer to their theoretically predicted values of 32Acm-2K-2 (for me*=0.27 m0) and 1.42 eV (for work function of Pd = 5.12 eV and electron affinity of ZnO = 3.7 eV), respectively.
53 citations
Cites background or methods from "Analysis of temperature dependent I..."
...A number of reports are available in the literature on the temperature-dependent electrical characteristics of bulk ZnO-based Schottky diodes [5]–[9]....
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...Through assuming a pure thermionic emission model [5]–[9], the forward current at the Pd/ZnO thin-film Schottky junction can be expressed as...
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...To incorporate the effect of barrier inhomogeneities [15], [16] at the Pd/ZnO thin film contact, the temperaturedependent I–V results have been analyzed by modeling the lateral fluctuations of the φB,ef f under zero-bias condition as a Gaussian distribution function with a standard deviation σ0 around a mean barrier height qφB0,m as considered by other researchers [5]–[7]....
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...The increase (decrease) of barrier height (ideality factor) with the increased temperature is commonly attributed to the barrier inhomogeneity at the Pd/ZnO interface [5]–[7], [11], [15], [16]....
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TL;DR: In this paper, the forward bias currentvoltage (I-V) characteristics of Al/Rhodamine-101/n-GaAs structure have been investigated in the temperature range of 80-350 K.
53 citations
TL;DR: Solution-processed ZnO Schottky diodes based on a coplanar Al/ZnO/Au nanogap architecture are reported on and the nature of the rectifying contact formed at the ZnNO/ au interface is studied.
Abstract: Much work has been carried out in recent years in fabricating and studying the Schottky contact formed between various metals and the n-type wide bandgap semiconductor zinc oxide (ZnO). In spite of significant progress, reliable formation of such technologically interesting contacts remains a challenge. Here, we report on solution-processed ZnO Schottky diodes based on a coplanar Al/ZnO/Au nanogap architecture and study the nature of the rectifying contact formed at the ZnO/Au interface. Resultant diodes exhibit excellent operating characteristics, including low-operating voltages (±2.5 V) and exceptionally high current rectification ratios of >106 that can be independently tuned via scaling of the nanogap’s width. The barrier height for electron injection responsible for the rectifying behavior is studied using current–voltage–temperature and capacitance–voltage measurements (C–V) yielding values in the range of 0.54–0.89 eV. C–V measurements also show that electron traps present at the Au/ZnO interface ...
45 citations
TL;DR: In this paper, the electrical properties of n-zinc oxide (ZnO) nanowires (NWs)/p-Si (100) heterojunction diodes fabricated by the oxidation of thermally deposited metallic Zn on Al:Zn O-coated p-Si 〈1 0 0〉 substrates were presented.
Abstract: This paper presents the electrical characteristics of n-zinc oxide (ZnO) nanowires (NWs)/p-Si (100) heterojunction diodes fabricated by the oxidation of thermally deposited metallic Zn on Al:ZnO-coated p-Si 〈1 0 0〉 substrates. The electrical parameters of the n-ZnO NWs/p-Si diodes have been estimated by using the room temperature capacitance-voltage (C-V) and temperature-dependent current-voltage (I-V) characteristics of the heterojunction. The carrier concentration of the ZnO NW film and the barrier height of the diode estimated from the C-V characteristics at room temperature are 1.54 × 10 15 cm -3 and 0.75 eV, respectively. The thermionic emission model was used to analyze the temperature-dependent measured I-V characteristics to estimate the parameters of the diode. The estimated values of the barrier height and ideality factor at room temperature were 0.715 eV and 2.13, respectively. The spatial barrier inhomogeneity was included in the aforementioned analysis by assuming a Gaussian distribution for the barrier height at the n-ZnO NWs/p-Si heterojunction. The Richardson constant A* of ZnO was found to be increased from a relatively low value of 9.75 ×10 - 8 A ·cm - 2 ·K - 2 to a more realistic value of 49A ·cm - 2 ·K - 2 after incorporating the barrier inhomogeneity phenomenon in the aforementioned analysis.
43 citations
Cites result from "Analysis of temperature dependent I..."
...This estimated value of the Richardson constant A∗ for ZnO is found better than the reported works of other researchers [25], [35]....
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14,205 citations
Book•
04 Jul 1990
TL;DR: In this article, the authors present a characterization of the resistivity of a two-point-versus-four-point probe in terms of the number of contacts and the amount of contacts in the probe.
Abstract: Preface to Third Edition. 1 Resistivity. 1.1 Introduction. 1.2 Two-Point Versus Four-Point Probe. 1.3 Wafer Mapping. 1.4 Resistivity Profiling. 1.5 Contactless Methods. 1.6 Conductivity Type. 1.7 Strengths and Weaknesses. Appendix 1.1 Resistivity as a Function of Doping Density. Appendix 1.2 Intrinsic Carrier Density. References. Problems. Review Questions. 2 Carrier and Doping Density. 2.1 Introduction. 2.2 Capacitance-Voltage (C-V). 2.3 Current-Voltage (I-V). 2.4 Measurement Errors and Precautions. 2.5 Hall Effect. 2.6 Optical Techniques. 2.7 Secondary Ion Mass Spectrometry (SIMS). 2.8 Rutherford Backscattering (RBS). 2.9 Lateral Profiling. 2.10 Strengths and Weaknesses. Appendix 2.1 Parallel or Series Connection? Appendix 2.2 Circuit Conversion. References. Problems. Review Questions. 3 Contact Resistance and Schottky Barriers. 3.1 Introduction. 3.2 Metal-Semiconductor Contacts. 3.3 Contact Resistance. 3.4 Measurement Techniques. 3.5 Schottky Barrier Height. 3.6 Comparison of Methods. 3.7 Strengths and Weaknesses. Appendix 3.1 Effect of Parasitic Resistance. Appendix 3.2 Alloys for Contacts to Semiconductors. References. Problems. Review Questions. 4 Series Resistance, Channel Length and Width, and Threshold Voltage. 4.1 Introduction. 4.2 PN Junction Diodes. 4.3 Schottky Barrier Diodes. 4.4 Solar Cells. 4.5 Bipolar Junction Transistors. 4.6 MOSFETS. 4.7 MESFETS and MODFETS. 4.8 Threshold Voltage. 4.9 Pseudo MOSFET. 4.10 Strengths and Weaknesses. Appendix 4.1 Schottky Diode Current-Voltage Equation. References. Problems. Review Questions. 5 Defects. 5.1 Introduction. 5.2 Generation-Recombination Statistics. 5.3 Capacitance Measurements. 5.4 Current Measurements. 5.5 Charge Measurements. 5.6 Deep-Level Transient Spectroscopy (DLTS). 5.7 Thermally Stimulated Capacitance and Current. 5.8 Positron Annihilation Spectroscopy (PAS). 5.9 Strengths and Weaknesses. Appendix 5.1 Activation Energy and Capture Cross-Section. Appendix 5.2 Time Constant Extraction. Appendix 5.3 Si and GaAs Data. References. Problems. Review Questions. 6 Oxide and Interface Trapped Charges, Oxide Thickness. 6.1 Introduction. 6.2 Fixed, Oxide Trapped, and Mobile Oxide Charge. 6.3 Interface Trapped Charge. 6.4 Oxide Thickness. 6.5 Strengths and Weaknesses. Appendix 6.1 Capacitance Measurement Techniques. Appendix 6.2 Effect of Chuck Capacitance and Leakage Current. References. Problems. Review Questions. 7 Carrier Lifetimes. 7.1 Introduction. 7.2 Recombination Lifetime/Surface Recombination Velocity. 7.3 Generation Lifetime/Surface Generation Velocity. 7.4 Recombination Lifetime-Optical Measurements. 7.5 Recombination Lifetime-Electrical Measurements. 7.6 Generation Lifetime-Electrical Measurements. 7.7 Strengths and Weaknesses. Appendix 7.1 Optical Excitation. Appendix 7.2 Electrical Excitation. References. Problems. Review Questions. 8 Mobility. 8.1 Introduction. 8.2 Conductivity Mobility. 8.3 Hall Effect and Mobility. 8.4 Magnetoresistance Mobility. 8.5 Time-of-Flight Drift Mobility. 8.6 MOSFET Mobility. 8.7 Contactless Mobility. 8.8 Strengths and Weaknesses. Appendix 8.1 Semiconductor Bulk Mobilities. Appendix 8.2 Semiconductor Surface Mobilities. Appendix 8.3 Effect of Channel Frequency Response. Appendix 8.4 Effect of Interface Trapped Charge. References. Problems. Review Questions. 9 Charge-based and Probe Characterization. 9.1 Introduction. 9.2 Background. 9.3 Surface Charging. 9.4 The Kelvin Probe. 9.5 Applications. 9.6 Scanning Probe Microscopy (SPM). 9.7 Strengths and Weaknesses. References. Problems. Review Questions. 10 Optical Characterization. 10.1 Introduction. 10.2 Optical Microscopy. 10.3 Ellipsometry. 10.4 Transmission. 10.5 Reflection. 10.6 Light Scattering. 10.7 Modulation Spectroscopy. 10.8 Line Width. 10.9 Photoluminescence (PL). 10.10 Raman Spectroscopy. 10.11 Strengths and Weaknesses. Appendix 10.1 Transmission Equations. Appendix 10.2 Absorption Coefficients and Refractive Indices for Selected Semiconductors. References. Problems. Review Questions. 11 Chemical and Physical Characterization. 11.1 Introduction. 11.2 Electron Beam Techniques. 11.3 Ion Beam Techniques. 11.4 X-Ray and Gamma-Ray Techniques. 11.5 Strengths and Weaknesses. Appendix 11.1 Selected Features of Some Analytical Techniques. References. Problems. Review Questions. 12 Reliability and Failure Analysis. 12.1 Introduction. 12.2 Failure Times and Acceleration Factors. 12.3 Distribution Functions. 12.4 Reliability Concerns. 12.5 Failure Analysis Characterization Techniques. 12.6 Strengths and Weaknesses. Appendix 12.1 Gate Currents. References. Problems. Review Questions. Appendix 1 List of Symbols. Appendix 2 Abbreviations and Acronyms. Index.
6,573 citations
TL;DR: In this article, a new analytical potential fluctuations model for the interpretation of current/voltage and capacitance/voltages measurements on spatially inhomogeneous Schottky contacts is presented.
Abstract: We present a new analytical potential fluctuations model for the interpretation of current/voltage and capacitance/voltage measurements on spatially inhomogeneous Schottky contacts. A new evaluation schema of current and capacitance barriers permits a quantitative analysis of spatially distributed Schottky barriers. In addition, our analysis shows also that the ideality coefficient n of abrupt Schottky contacts reflects the deformation of the barrier distribution under applied bias; a general temperature dependence for the ideality n is predicted. Our model offers a solution for the so‐called T0 problem. Not only our own measurements on PtSi/Si diodes, but also previously published ideality data for Schottky diodes on Si, GaAs, and InP agree with our theory.
1,439 citations
TL;DR: Results suggest that the formation mechanism of the Schottky barrier is locally nonuniform at common, polycrystalline, metal-semiconductor interfaces.
Abstract: A dipole-layer approach is presented, which leads to analytic solutions to the potential and the electronic transport at metal-semiconductor interfaces with arbitrary Schottky-barrier-height profiles. The presence of inhomogeneities in the Schottky-barrier height is shown to lead to a coherent explanation of many anomalies in the experimental results. These results suggest that the formation mechanism of the Schottky barrier is locally nonuniform at common, polycrystalline, metal-semiconductor interfaces.
1,347 citations