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Application of RF discharges to sputtering
H. R. Koenig,Leon I Maissel +1 more
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In this paper, the operation of rf discharges is described and the internal distribution of voltages is considered, and the significance of this with respect to sputtering, particularly of insulators, is then discussed.Abstract:
The operation of rf discharges is described and the internal distribution of voltages is considered. The significance of this with respect to sputtering, particularly of insulators, is then discussed. An equivalent circuit for the discharge is presented and the influence of such parameters as pressure and magnetic field on the components of this circuit is described. Finally, energy distributions for positive ions, electrons, and negative ions incident at the substrate during deposition are given.read more
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Journal ArticleDOI
Plasma etching: Yesterday, today, and tomorrow
Vincent M. Donnelly,A. Kornblit +1 more
TL;DR: The field of plasma etching is reviewed in this paper, where basic principles related to plasma etch such as evaporation rates and Langmuir-Hinshelwood adsorption are introduced.
Journal ArticleDOI
Analytical solution for capacitive RF sheath
TL;DR: In this paper, a self-consistent solution for the dynamics of a high voltage, capacitive radio frequency (RF) sheath driven by a sinusoidal current source is obtained under the assumptions of time-independent, collisionless ion motion and inertialess electrons.
Journal ArticleDOI
Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
J. W. Coburn,Eric Kay +1 more
TL;DR: In this article, the authors measured the potential of an electrically isolated surface in an rf diode sputtering glow discharge and investigated the influence on these potentials of both the geometry enclosing the discharge volume and of a positively biased auxiliary electrode in contact with the discharge.
Journal ArticleDOI
Plasma potentials of 13.56-MHz rf argon glow discharges in a planar system
TL;DR: In this paper, the capacitive sheath approximation is used to relate the measured voltages to the measured plasma potential, and the effects of superimposing dc voltages on the excitation electrode are discussed.
Journal ArticleDOI
Ion energy distributions in rf sheaths; review, analysis and simulation
TL;DR: In this paper, a review and analysis of ion energy distributions arriving at the target of a radio frequency (rf) discharge is presented, which mainly discusses the collisionless regime, which is of great interest to experimentalists and modellers studying high-density discharges.
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Related Papers (5)
Positive‐ion bombardment of substrates in rf diode glow discharge sputtering
J. W. Coburn,Eric Kay +1 more