Journal ArticleDOI
Control of reactive sputtering processes
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TLDR
In this paper, both pulsed dc and mid-frequency ac power was used to prevent arcing during reactive sputtering of insulating films. But the results showed that the results were not optimal.About:
This article is published in Thin Solid Films.The article was published on 2005-11-22. It has received 337 citations till now. The article focuses on the topics: Sputter deposition & Sputtering.read more
Citations
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Journal ArticleDOI
High power impulse magnetron sputtering discharge
TL;DR: The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma-based sputtering technology as mentioned in this paper, where high power is applied to the magnetron target in unipolar pulse.
Journal ArticleDOI
Biaxial alignment in sputter deposited thin films
TL;DR: In this paper, an extended structure zone model is proposed for the in-plane alignment of biaxially aligned thin films, which can only be obtained when an overgrowth mechanism drives the microstructural evolution of the thin film.
Journal ArticleDOI
Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
TL;DR: In this paper, a step-by-step approach is described for reactive high power impulsive magnetron sputtering (R-HiPIMS), which is a coating technology for high and low sputter yield materials, respectively.
Journal ArticleDOI
Review Article: Tracing the recorded history of thin-film sputter deposition: From the 1800s to 2017
TL;DR: In this article, the authors describe the history of thin-film growth by sputter deposition, which required the development of vacuum pumps and electrification of the electrical system to deal with the problem.
References
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Journal ArticleDOI
A 2dvEv- bit distributed algorithm for the directed Euler trail problem
Wen-Huei Chen,Chuan Yi Tang +1 more
TL;DR: The algorithm can be used as a building block for solving other distributed graph problems, and can be slightly modified to run on a strongly-connected diagraph for generating the existent Euler trail or to report that no Euler trails exist.
Journal ArticleDOI
A novel pulsed magnetron sputter technique utilizing very high target power densities
TL;DR: In this paper, the potential for high-aspect-ratio trench filling applications by high power pulsed magnetron sputtering is demonstrated by deposition in via-structures.
Journal ArticleDOI
Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
TL;DR: In this article, the authors have discussed the hysteresis effect and the instability in the reactive gas pressure, differential poisoning of magnetron cathode, as well as the methods which are used to control the process.
Book
Handbook of Thin Film Process Technology: 98/1 Reactive Sputtering
TL;DR: In this article, the authors present a review of the state-of-the-art in the field of chemical vapor deposition and its application in semiconductor wafers, including the following:
Book
Handbook of sputter deposition technology
Kiyotaka Wasa,S. Hayakawa +1 more
TL;DR: A comprehensive overview of sputter deposition technology, a key technology for materials research in the next decade, can be found in this paper, where the authors present an overview of the main applications of sputtering in the microelectronics industry.
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Fundamental understanding and modeling of reactive sputtering processes
Sören Berg,Tomas Nyberg +1 more