Digital Photoelasticity: Advanced Techniques and Applications

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Digital Photoelasticity: Advanced Techniques and Applications

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Digital Photoelasticity: Advanced Techniques and Applications

K. Ramesh¹, G Lewis²•Institutions (2)

Indian Institute of Technology Kanpur¹, University of Memphis²

01 Jan 2000-

TL;DR: In this article, phase shifting, Polarization Stepping and Fourier Transform Methods are used for phase unwrapping and Optically Enhanced Tiling in digital photoelasticity.

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Abstract: Transmission Photoelasticity.- Reflection Photoelasticity.- Digital Image Processing.- Fringe Multiplication.- Fringe Thinning and Fringe Clustering.- Phase Shifting, Polarization Stepping and Fourier Transform Methods.- Phase Unwrapping and Optically Enhanced Tiling in Digital Photoelasticity.- Colour Image Processing Techniques.- Evaluation of Contact Stress Parameters and Fracture Parameters.- Stress Separation Techniques.- Fusion of Digital Photoelasticity, Rapid Prototyping and Rapid Tooling Technologies.- Recent Developments and Future Trends.

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Proceedings Article•DOI•

Numerical methods of phase shifting to stress measurement with digital photoelasticity using plane polariscope

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Filipe Gomes Vieira, Jordana Simões Ribeiro Martins, João Marcos Simões Ribeiro, Marcos Vinícius dos Santos Rocha, Pedro Américo Almeida Magalhães Júnior, Tiago Augusto da Silva - Show less +2 more

01 Jan 2017

Cites background or methods from "Digital Photoelasticity: Advanced T..."

...1, both along and perpendicular to the analyzer axis (Eβ, Eβ+90°) are given as (Ramesh, 2000) tiKe ii ii E E sin cos 2cos 2 sin 2 cos2sin 2 sin 2sin 2 sin2cos 2 sin 2 cos cossin sincos 90 ,(1) where 1i ....
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...To find the output light intensity the following operation is made (Ramesh, 2000): * EEI ....
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...1, both along and perpendicular to the analyzer axis (Eβ, Eβ+90°) are given as (Ramesh, 2000)...
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...(2), the output intensity emerging from analyzer of the polariscope arrangement     A R P , is given by (Ramesh, 2000)...
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...1 shows the typical arrangement (Ramesh, 2000), where P, R and A represent polarizer, retarder (stressed model) and analyzer, respectively....
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Journal Article•DOI•

Validation of Fresnel–Kirchhoff Integral Method for the Study of Volume Dielectric Bodies

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Soumia Imane Taleb, Cristian Neipp, Jorge Francés, Andrés Márquez, Mariela L. Alvarez, Antonio Hernández Prados, Sergi Gallego, Augusto Beléndez - Show less +4 more

22 Apr 2021-Applied Sciences

TL;DR: In this article, the authors proposed a method to support the work of the “Ministerio de Ciencia e Innovación (Spain) under project FIS2017-82919-R (MINECO/AEI/FEDER, UE).

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Abstract: This work was supported by the “Ministerio de Ciencia e Innovacion” (Spain) under project FIS2017-82919-R (MINECO/AEI/FEDER, UE).

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Cites methods from "Digital Photoelasticity: Advanced T..."

...Photoelasticity [6] has also been applied to evaluate the stress and strain field around cracks [7], etc....
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Journal Article•DOI•

数字光弹性中六步混合相移技术

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陈念年 Chen Niannian, 巫. 玲. Wu Ling, 范. 勇. Fan Yong

01 Jan 2023-Guangxue Xuebao

Proceedings Article•DOI•

Full field and full tensor stress metrology for flexible electronics, packaging, and optoelectronic applications: AM: Advanced metrology

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Wojciech J. Walecki, Wei-Chun Hung

01 Apr 2018

TL;DR: In this paper, the authors describe a system for measurement of the stress tensor in polyimide (PI) substrates for flexible electronic application, which uses photo-elastic effects and was used for measuring real life PI coated with conductive layers used for optoelectronic applications and reference bare substrates.

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Abstract: We describe the system for measurement of the stress tensor in polyimide (PI) substrates for flexible electronic application. System uses photo-elastic effects and was used for measurement of real life PI coated with conductive layers used for optoelectronic applications and reference bare substrates. Tool allows measurements with resolution better than 1 MPa, and covers entire range up-to mechanical failure of PI films. And can be readily integrated in roll to roll applications. The same tool gives promise to be used for the metrology of stress in other materials such as SiN, and use in mainstream semiconductor manufacturing when used on backend passivation PI films.

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Cites background or methods from "Digital Photoelasticity: Advanced T..."

...INTRODUCTION The photo-elastic stress metrology is well known measurement technique widely used in mechanical engineering applications since at least 1940 [1]....
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...Extract difference of principal stresses (σ1 – σ2) from the images We closely follow the derivation presented in [1]....
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Book Chapter•DOI•

Design of Tabletop Automated Plane Polariscope for Digital Photoelastic Measurements

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M. Gagan Keerthi¹, Ananthesh D. Shenoy¹, B. Devanarayanan¹, V. S. Sharath¹, M. P. Hariprasad¹ - Show less +1 more•Institutions (1)

Amrita Vishwa Vidyapeetham¹

01 Jan 2022

TL;DR: In this paper, the rotational procedure of the plane polariscope-based optical configurations is automatically automated by using a compact table-top optical box design for analyser and polariser.

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Abstract: Digital photoelasticity, a non-contact, non-destructive and optical technique is the most widely accepted methodology for stress measurement. Phase shifting technique (PST) algorithms serve the purpose of evaluating the isochromatic and isoclinic data with more accuracy. However, manual operations of the polariscope for PST is tedious and time-consuming. Further, manual operations confront with high chances of errors during calculations due to the manual rotation of the optical elements. This work aims towards overcoming these limitations by automating the rotational procedure of the plane polariscope-based optical configurations. A compact, table-top optical box design for analyser and polariser is proposed in this work. The plane polariscope-based optical modules can be effectively used for automating the plane polariscope-based phase shifting procedures and thereby enhancing the scope of digital photoelastic stress measurements.

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