Fig. 4: Fabrication of SU-8 microchannels using photolithography and sealing of the microchannel with a Bungard dry film laminator. (a) Deposition of SU-8 on PZT subtrate and mask used to pattern the SU-8 channel during photolithography. (b) SU-8 channel after wet etching of a patterned surface. (c) Laminted MHE with Bunduard film laminator.
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