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Journal ArticleDOI

Effect of annealing temperature on the properties of IZO films and IZO based transparent TFTs

15 Oct 2007-Thin Solid Films (Elsevier)-Vol. 515, Iss: 24, pp 8450-8454
TL;DR: In this paper, the effect of the annealing temperature and atmosphere on the properties of r.f. magnetron sputtered indium-zinc oxide (IZO) thin-films of two types: as-deposited and semiconductor films.
About: This article is published in Thin Solid Films.The article was published on 2007-10-15. It has received 90 citations till now. The article focuses on the topics: Transparent conducting film & Annealing (metallurgy).
Citations
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Journal ArticleDOI
TL;DR: The recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed andp-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed.
Abstract: Transparent electronics is today one of the most advanced topics for a wide range of device applications. The key components are wide bandgap semiconductors, where oxides of different origins play an important role, not only as passive component but also as active component, similar to what is observed in conventional semiconductors like silicon. Transparent electronics has gained special attention during the last few years and is today established as one of the most promising technologies for leading the next generation of flat panel display due to its excellent electronic performance. In this paper the recent progress in n- and p-type oxide based thin-film transistors (TFT) is reviewed, with special emphasis on solution-processed and p-type, and the major milestones already achieved with this emerging and very promising technology are summarizeed. After a short introduction where the main advantages of these semiconductors are presented, as well as the industry expectations, the beautiful history of TFTs is revisited, including the main landmarks in the last 80 years, finishing by referring to some papers that have played an important role in shaping transparent electronics. Then, an overview is presented of state of the art n-type TFTs processed by physical vapour deposition methods, and finally one of the most exciting, promising, and low cost but powerful technologies is discussed: solution-processed oxide TFTs. Moreover, a more detailed focus analysis will be given concerning p-type oxide TFTs, mainly centred on two of the most promising semiconductor candidates: copper oxide and tin oxide. The most recent data related to the production of complementary metal oxide semiconductor (CMOS) devices based on n- and p-type oxide TFT is also be presented. The last topic of this review is devoted to some emerging applications, finalizing with the main conclusions. Related work that originated at CENIMAT|I3N during the last six years is included in more detail, which has led to the fabrication of high performance n- and p-type oxide transistors as well as the fabrication of CMOS devices with and on paper.

2,440 citations

Journal ArticleDOI
TL;DR: High efficiency and stable inverted PSCs (i-PSC) are presented by employing sol-gel processed simultaneously doped ZnO by Indium and fullerene derivative (BisNPC60-OH) film as cathode interlayer and PTB7-Th:PC71BM as the active layer.
Abstract: We present high efficiency and stable inverted PSCs (i-PSC) by employing sol-gel processed simultaneously doped ZnO by Indium and fullerene derivative (BisNPC60-OH) (denoted as InZnO-BisC60) film as cathode interlayer and PTB7-Th:PC71BM as the active layer (where PTB7-Th is a low bandgap polymer we proposed previously). This dual-doped ZnO, InZnO-BisC60, film shows dual and opposite gradient dopant concentration profiles, being rich in fullerene derivative at the cathode surface in contact with active layer and rich in In at the cathode surface in contact with the ITO surface. Such doping in ZnO not only gives improved surface conductivity by a factor of 270 (from 0.015 to 4.06 S cm−1) but also provides enhanced electron mobility by a factor of 132 (from 8.25*10−5 to 1.09*10−2 cm2 V−1 s−1). The resulting i-PSC exhibits the improved PCE 10.31% relative to that with ZnO without doping 8.25%. This PCE 10.31% is the best result among the reported values so far for single junction PSC.

482 citations

Journal ArticleDOI
TL;DR: In this paper, the role of processing parameters on the electrical performance of GIZO (Ga 2 O 3 :In 2O 3 :ZnO) films and thin-film transistors (TFTs) was analyzed.
Abstract: This work analyzes the role of processing parameters on the electrical performance of GIZO (Ga 2 O 3 :In 2 O 3 :ZnO) films and thin-film transistors (TFTs). Parameters such as oxygen partial pressure, deposition pressure, target composition, thickness, and annealing temperature are studied. Generally, better devices are obtained when low oxygen partial pressure is used. This is related to the damage induced by oxygen ion bombardment and very high film's resistivity when higher oxygen partial pressures are used. Low deposition pressures and targets with richer indium compositions led to films with high carrier concentration, resulting in transistors with field-effect mobility as high as ∼ 80 cm 2 /Vs but poor channel conductivity modulation, becoming ineffective as switching devices. Nevertheless, it is demonstrated that reducing the GIZO thickness from 40 to 10 nm greatly enhances the switching behavior of those devices, due to the lower absolute number of free carriers and hence to their easier depletion. Annealing also proves to be crucial to control device performance, significantly modifying GIZO electrical resistivity and promoting local atomic rearrangement, being the optimal temperature determined by the as-produced films' properties. For the best-performing transistors, even with a low annealing temperature (150°C), remarkable properties such as μ FE = 73.9 cm 2 /Vs, on/off ratio as 7 × 10 7 , V T ≈ 0.2 V, and S = 0.29 V/dec are achieved.

255 citations

Journal ArticleDOI
TL;DR: The results obtained are comparable to ones produced for conventional cellulose paper, marking this out as a promising approach for attaining high-performance disposable electronics such as paper displays, smart labels, smart packaging, RFID (radio-frequency identification) and point-of-care systems for self-analysis in bioscience applications, among others.
Abstract: Cotton-based nanocrystalline cellulose (NCC), also known as nanopaper, one of the major sources of renewable materials, is a promising substrate and component for producing low cost fully recyclable flexible paper electronic devices and systems due to its properties (lightweight, stiffness, non-toxicity, transparency, low thermal expansion, gas impermeability and improved mechanical properties). Here, we have demonstrated for the first time a thin transparent nanopaper-based field effect transistor (FET) where NCC is simultaneously used as the substrate and as the gate dielectric layer in an ‘interstrate’ structure, since the device is built on both sides of the NCC films; while the active channel layer is based on oxide amorphous semiconductors, the gate electrode is based on a transparent conductive oxide. Such hybrid FETs present excellent operating characteristics such as high channel saturation mobility (>7 cm 2 V 1 s 1 ), drain‐source current on=off modulation ratio higher than 10 5 , enhancement n-type operation and subthreshold gate voltage swing of 2.11 V=decade. The NCC film FET characteristics have been measured in air ambient conditions and present good stability, after two weeks of being processed, without any type of encapsulation or passivation layer. The results obtained are comparable to ones produced for conventional cellulose paper, marking this out as a promising approach for attaining high-performance disposable electronics such as paper displays, smart labels, smart packaging, RFID (radio-frequency identification) and point-of-care systems for self-analysis in bioscience applications, among others.

232 citations


Cites background from "Effect of annealing temperature on ..."

  • ...sputtering at room temperature, serving as the gate electrode [35]....

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Journal ArticleDOI
TL;DR: In this paper, the authors report the architecture and performances of a memory based on a single field effect transistor built on paper able to write-erase and read, which exhibits a large counterclockwise hysteresis associated with the memory effect, with a turn-on voltage shift between 1 and −14.5V.
Abstract: We report the architecture and the performances of a memory based on a single field-effect transistor built on paper able to write-erase and read. The device is composed of natural multilayer cellulose fibers that simultaneously act as structural support and gate dielectric; active and passive multicomponent amorphous oxides that work as the channel and gate electrode layers, respectively, complemented by the use of patterned metal layers as source/drain electrodes. The devices exhibit a large counterclockwise hysteresis associated with the memory effect, with a turn-on voltage shift between 1 and −14.5V, on/off ratio and saturation mobilities of about 104 and 40cm2V−1s−1, respectively, and estimated charge retention times above 14000h.

135 citations

References
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Journal ArticleDOI
25 Nov 2004-Nature
TL;DR: A novel semiconducting material is proposed—namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)—for the active channel in transparent thin-film transistors (TTFTs), which are fabricated on polyethylene terephthalate sheets and exhibit saturation mobilities and device characteristics are stable during repetitive bending of the TTFT sheet.
Abstract: Transparent electronic devices formed on flexible substrates are expected to meet emerging technological demands where silicon-based electronics cannot provide a solution. Examples of active flexible applications include paper displays and wearable computers1. So far, mainly flexible devices based on hydrogenated amorphous silicon (a-Si:H)2,3,4,5 and organic semiconductors2,6,7,8,9,10 have been investigated. However, the performance of these devices has been insufficient for use as transistors in practical computers and current-driven organic light-emitting diode displays. Fabricating high-performance devices is challenging, owing to a trade-off between processing temperature and device performance. Here, we propose to solve this problem by using a novel semiconducting material—namely, a transparent amorphous oxide semiconductor from the In-Ga-Zn-O system (a-IGZO)—for the active channel in transparent thin-film transistors (TTFTs). The a-IGZO is deposited on polyethylene terephthalate at room temperature and exhibits Hall effect mobilities exceeding 10 cm2 V-1 s-1, which is an order of magnitude larger than for hydrogenated amorphous silicon. TTFTs fabricated on polyethylene terephthalate sheets exhibit saturation mobilities of 6–9 cm2 V-1 s-1, and device characteristics are stable during repetitive bending of the TTFT sheet.

7,301 citations

Journal ArticleDOI
TL;DR: A review of surface science studies of single crystal surfaces, but selected studies on powder and polycrystalline films are also incorporated in order to provide connecting points between surface sciences studies with the broader field of materials science of tin oxide as discussed by the authors.

2,232 citations

Journal ArticleDOI
TL;DR: In this paper, the authors reviewed work on In2O3:Sn films prepared by reactive e−beam evaporation of In2 O3 with up to 9 mol'% SnO2 onto heated glass.
Abstract: We review work on In2O3:Sn films prepared by reactive e‐beam evaporation of In2O3 with up to 9 mol % SnO2 onto heated glass. These films have excellent spectrally selective properties when the deposition rate is ∼0.2 nm/s, the substrate temperature is ≳150 °C, and the oxygen pressure is ∼5×10−4 Torr. Optimized coatings have crystallite dimensions ≳50 nm and a C‐type rare‐earth oxide structure. We cover electromagnetic properties as recorded by spectrophotometry in the 0.2–50‐μm range, by X‐band microwave reflectance, and by dc electrical measurements. Hall‐effect data are included. An increase of the Sn content is shown to have several important effects: the semiconductor band gap is shifted towards the ultraviolet, the luminous transmittance remains high, the infrared reflectance increases to a high value beyond a certain wavelength which shifts towards the visible, phonon‐induced infrared absorption bands vanish, the microwave reflectance goes up, and the dc resisitivity drops to ∼2×10−4 Ω cm. The corre...

2,124 citations

Book
01 Jan 1995
TL;DR: In this paper, a comprehensive account of the properties, growth and applications of semiconducting transparent thin films is provided, which is a valuable reference tool for the established researcher, and provides a comprehensive introcution to the subject for graduates of electrical and electronic engineering.
Abstract: A comprehensive account of the properties, growth and applications of semiconducting transparent thin films, this book provides a single source reference for researchers in the field. It discusses the underlying physics of such films, and their commercial applications in such areas as gas sensors and temperature control coatings in the aerospace industry. It is clearly written, with sections on the different materials, different growth techniques, electrical properties, optical properties, and selected applications, for coatings, sensors, detectors and display devices.It is a valuable reference tool for the established researcher, and provides a comprehensive introcution to the subject for graduates of electrical and electronic engineering.The international team of authors, under the leadership of one of the world's authorities on the subject have written a book which has become the standard work in the field.

859 citations