Effect of N/Ga flux ratio on transport behavior of Pt/GaN Schottky diodes

Barrier height inhomogeneity in electrical transport characteristics of InGaN/GaN heterostructure interfaces

Abstract: We have grown InGaN/GaN heterostructures using plasma-assisted molecular beam epitaxy and studied the temperature dependent electrical transport characteristics. The barrier height (φb) and the ideally factor (η) estimated using thermionic emission model were found to be temperature dependent. The conventional Richardson plot of ln(Js/T2) versus 1/kT showed two temperature regions (region-I: 400–500 K and region-II: 200–350 K) and it provides Richardson constants (A∗) which are much lower than the theoretical value of GaN. The observed variation in the barrier height and the presence of two temperature regions were attributed to spatial barrier inhomogeneities at the heterojunction interface and was explained by assuming a double Gaussian distribution of barrier heights with mean barrier height values 1.61 and 1.21 eV with standard deviation (σs2) of 0.044 and 0.022 V, respectively. The modified Richardson plot of ln(Js/T2) − (q2σs2/2k2T2) versus 1/kT for two temperature regions gave mean barrier height v...

Enhanced light sensing characteristics of nanostructured gallium nitride/silicon heterojunctions: Interface matters

Abstract: We report on the growth of highly pure and single crystalline gallium nitride (GaN) nanostructures on different silicon (Si) substrates by thermal vapor deposition via the direct reaction of gallium with volatile ammonia solution. The structural and optical characteristics of the as-grown GaN/Si nanostructured heterojunctions are investigated. The morphology of the formed GaN nanostructures is strongly dependent on the crystal orientation of the Si substrate. The X-ray diffraction and Raman analysis reveal that the fabricated GaN nanostructures have a hexagonal wurtzite structure. The photoluminescence spectra of all GaN nanostructures exhibit a strong near-band-edge ultraviolet (UV) emission peak (365–372 nm), which illustrates their potential in optoelectronic applications. The current–voltage measurements under dark, visible, and UV illumination conditions are performed to study the light sensing ability of the fabricated heterojunctions. Under reverse bias (5 V), the photocurrent of the GaN/n-Si (111) photodetector was comparably much higher than that of the GaN/n-Si (100) photodetector, probably due to the better quality of the GaN formed on Si (111) compared with those formed on Si (100), resulting in a higher photoresponse. The calculated rectification ratio revealed that the sensitivity of the GaN/n-Si (111) photodiode is higher than that of the GaN/n-Si (100), indicating the importance of the interface architecture. The fabricated photodiodes showed photoresponse toward UV and visible wavelengths, demonstrating shorter rise and decay times compared with other materials used to fabricate UV and visible light photodetectors. The prototype device shows a simple method for GaN synthesis and demonstrates the possibility of constructing nanoscale photodetectors for nano-optics applications.

Photodetection Properties of Nonpolar a‐Plane GaN Grown by Three Approaches Using Plasma‐Assisted Molecular Beam Epitaxy

Abstract: Present work focuses on improving the quality of nonpolar a-plane GaN thin films by introducing unconventional new efficient growth conditions without compromising their UV photodetection properties. These epitaxial thin films are grown on r-plane sapphire using three different growth approaches by plasma-assisted molecular beam epitaxy (PAMBE). In situ reflection high-energy electron diffraction (RHEED) analysis is performed during and after the growth to monitor the growth mode, and it is found that the films assumed desired 2D mode during the growth. The crystalline quality and the phase purity of the films are assessed with the help of high-resolution X-ray diffraction and Raman spectroscopy. All the films are found to contain compressive stress, which indicate that all the films are strained and epitaxial. The temporal response is carried out in all the three batches, which is very stable. Sensitivity, responsivity, transit time, and gain values are estimated. Highest responsivity and the corresponding gain are found to be around 25 AW(-1), 86.47 at 1 V bias, respectively. These are the highest reported values so far for a-plane GaN at such low voltages.

Growth and electrical transport properties of InGaN/GaN heterostructures grown by PAMBE

Abstract: InGaN epitaxial films were grown on GaN template by plasma-assisted molecular beam epitaxy. The composition of indium incorporation in single phase InGaN film was found to be 23%. The band gap energy of single phase InGaN was found to be similar to 2.48 eV: The current-voltage (I-V) characteristic of InGaN/GaN heterojunction was found to be rectifying behavior which shows the presence of Schottky barrier at the interface. Log-log plot of the I-V characteristics under forward bias indicates the current conduction mechanism is dominated by space charge limited current mechanism at higher applied voltage, which is usually caused due to the presence of trapping centers. The room temperature barrier height and the ideality factor of the Schottky junction were found to 0.76 eV and 4.9 respectively. The non-ideality of the Schottky junction may be due to the presence of high pit density and dislocation density in InGaN film. (C) 2014 Elsevier Ltd. All rights reserved.

Effect of carrier concentration of InN on the transport behavior of InN/GaN heterostructure based Schottky junctions

Abstract: We present the study involving the dependence of carrier concentration of InN films, grown on GaN templates using the plasma assisted molecular beam epitaxy system, on growth temperature. The influence of InN carrier concentration on the electrical transport behavior of InN/GaN heterostructure based Schottky junctions is also discussed. The optical absorption edge of InN film was found to be strongly dependent on carrier concentration, and was described by Kane's k.p model, with non-parabolic dispersion relation for carrier in the conduction band. The position of the Fermi-level in InN films was modulated by the carrier concentration in the InN films. The barrier height of the heterojunctions as estimated from I – V characteristic was also found to be dependent on the carrier concentration of InN.

Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies

Abstract: In the past several years, research in each of the wide‐band‐gap semiconductors, SiC, GaN, and ZnSe, has led to major advances which now make them viable for device applications. The merits of each contender for high‐temperature electronics and short‐wavelength optical applications are compared. The outstanding thermal and chemical stability of SiC and GaN should enable them to operate at high temperatures and in hostile environments, and also make them attractive for high‐power operation. The present advanced stage of development of SiC substrates and metal‐oxide‐semiconductor technology makes SiC the leading contender for high‐temperature and high‐power applications if ohmic contacts and interface‐state densities can be further improved. GaN, despite fundamentally superior electronic properties and better ohmic contact resistances, must overcome the lack of an ideal substrate material and a relatively advanced SiC infrastructure in order to compete in electronics applications. Prototype transistors have been fabricated from both SiC and GaN, and the microwave characteristics and high‐temperature performance of SiC transistors have been studied. For optical emitters and detectors, ZnSe, SiC, and GaN all have demonstrated operation in the green, blue, or ultraviolet (UV) spectra. Blue SiC light‐emitting diodes (LEDs) have been on the market for several years, joined recently by UV and blue GaN‐based LEDs. These products should find wide use in full color display and other technologies. Promising prototype UV photodetectors have been fabricated from both SiC and GaN. In laser development, ZnSe leads the way with more sophisticated designs having further improved performance being rapidly demonstrated. If the low damage threshold of ZnSe continues to limit practical laser applications, GaN appears poised to become the semiconductor of choice for short‐wavelength lasers in optical memory and other applications. For further development of these materials to be realized, doping densities (especially p type) and ohmic contact technologies have to be improved. Economies of scale need to be realized through the development of larger SiC substrates. Improved substrate materials, ideally GaN itself, need to be aggressively pursued to further develop the GaN‐based material system and enable the fabrication of lasers. ZnSe material quality is already outstanding and now researchers must focus their attention on addressing the short lifetimes of ZnSe‐based lasers to determine whether the material is sufficiently durable for practical laser applications. The problems related to these three wide‐band‐gap semiconductor systems have moved away from materials science toward the device arena, where their technological development can rapidly be brought to maturity.

Recent advances in Schottky barrier concepts

Abstract: Theoretical models of Schottky-barrier height formation are reviewed. A particular emphasis is placed on the examination of how these models agree with general physical principles. New concepts on the relationship between interface dipole and chemical bond formation are analyzed, and shown to offer a coherent explanation of a wide range of experimental data.

Role of threading dislocation structure on the x‐ray diffraction peak widths in epitaxial GaN films

Abstract: In this letter we demonstrate that the anomalously low (002) x‐ray rocking curve widths for epitaxial hexagonal GaN films on (001) sapphire are a result of a specific threading dislocation (TD) geometry. Epitaxial GaN films were grown on c‐plane sapphire by atmospheric pressure metalorganic chemical vapor deposition (MOCVD) in a horizontal flow reactor. Films were grown with (002) rocking curves (ω‐scans) widths as low as 40 arcsec and threading dislocation densities of ∼2×1010 cm−2. The threading dislocations in this film lie parallel to the [001] direction and within the limit of imaging statistics, all are pure edge with Burgers vectors parallel to the film/substrate interface. These TDs will not distort the (002) planes. However, distortion of asymmetric planes, such as (102), is predicted and confirmed in (102) rocking curve widths of 740 arcsec. These results are compared with films with (002) rocking curves of ∼270 arcsec and threading dislocation densities of ∼7×108 cm−2.