Journal ArticleDOI
Electroless metal discharge layers for electron beam lithography
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TLDR
In this paper, the authors used a room temperature, aqueous-based, electroless deposition technique on silica and polymer planarizer surfaces for fabrication of continuous, conformal, ultrathin (i.e., 15-30 nm) Cu films, which are sufficiently homogeneous, electrically conductive, and optically transparent for use as resist discharge layers during resist discharge.Abstract:
We report a method for fabrication of continuous, conformal, ultrathin (i.e., 15–30 nm) Cu films using a room temperature, aqueous-based, electroless deposition technique on silica and polymer planarizer surfaces. The Cu films are sufficiently homogeneous, electrically conductive, and optically transparent for use as resist discharge layers during e-beam patterning of the substrate. The grounded Cu film, deployed here as a resist underlayer, eliminates the 0.1–0.4 μm subfield stitching errors normally observed in the absence of the Cu film during resist patterning on a glass or insulating substrate. The Cu is readily removed using a nitric acid wet etch following patterning.read more
Citations
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Fabrication of Metal Nanowires Using Microcontact Printing
Matthias Geissler,Heiko Wolf,R. Stutz,Emmanuel Delamarche,Ulrich-Walter Grummt,Bruno Michel,Alexander Bietsch +6 more
TL;DR: In this article, the authors demonstrate the high-resolution capabilities of this technique for the microcontact printing (μCP) technique for patterning substrates using an elastomeric stamp.
Journal ArticleDOI
Copper nanowires within the central channel of tobacco mosaic virus particles
Sinan Balci,Alexander M. Bittner,Kersten Hahn,Christina Scheu,Mato Knez,Anan Kadri,Christina Wege,Holger Jeske,Klaus Kern +8 more
TL;DR: In this paper, a low pH (∼7.5) copper electroless deposition solution was used to produce 3 nm in diameter and up to 150 nm in length by using a 4 nm wide channel of tobacco mosaic virus (TMV) particles.
Journal ArticleDOI
Selective Electroless Metallization of Patterned Polymeric Films for Lithography Applications
TL;DR: The fabrication of approximately 50-nm-width features in metal with high fidelity and sufficient control of edge acuity to satisfy current industry design rules is demonstrated using top-surface imaging and hybrid photoresist/self-assembled monolayer patterning approaches.
Journal ArticleDOI
Nanoscale patterning on insulating substrates by critical energy electron beam lithography.
TL;DR: This Letter describes a method to generate nanometer scale patterns on insulating substrates and wide band gap materials using critical energy electron beam lithography that removes the need for conductive dissipation layers or differentially pumped e-beam columns with sophisticated gas delivery systems to control charging effects.
Journal ArticleDOI
Block copolymer micelle nanolithography on non-conductive substrates
Roman Glass,Marco Arnold,Elisabetta Ada Cavalcanti-Adam,Jacques Blümmel,Christian Haferkemper,Charlotte Dodd,Joachim P. Spatz +6 more
TL;DR: In this article, the diblock copolymer self-assembly and electron beam lithographic techniques were used to attach 6'nm Au particles in periodic and non-periodic pattern onto non-conductive substrates.
References
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Journal ArticleDOI
Conducting polymers in microelectronics
TL;DR: This paper reviews some of potential applications and briefly describes possible future applications of conducting polymers for use as interconnections or for electronic devices.
Journal ArticleDOI
The Morphology of Electroless Ni Deposition on a Colloidal Pd(II) Catalyst
TL;DR: The surface morphology of a surface-bound colloidal Pd(II) catalyst and its effect on the particle sizes with the largest particles reaching approximately 50 nm in diameter were investigated in this article.
Journal ArticleDOI
Water soluble conducting polyanilines: Applications in lithography
TL;DR: A new class of water soluble conducting polyanilines has been developed by oxidatively polymerizing aniline monomers on a template such as a polymeric acid as discussed by the authors, which can be applied as removable discharge layers for electron-beam lithography and for mask inspection by scanning electron microscopy.
Journal ArticleDOI
Size‐Controlled Colloidal Pd(II) Catalysts for Electroless Ni Deposition in Nanolithography Applications
Susan L. Brandow,Mu-San Chen,Wang T,Charles S. Dulcey,Jeffrey M. Calvert,John F. Bohland,Gary S. Calabrese,Walter J. Dressick +7 more
TL;DR: A new Pd(II) electroless metal deposition catalyst dispersion, PD2, prepared by quenching a PdCl 4 2 solution with HCl and excess NaCl following rapid hydrolysis at pH ∼ 7 and ∼ 0.8 mM NaCl is described in this article.
Journal ArticleDOI
Characterization of a colloidal Pd(II)-based catalyst dispersion for electroless metal deposition
Walter J. Dressick,Lynne M. Kondracki,Mu-San Chen,Susan L. Brandow,Egon Matijević,Jeffrey M. Calvert +5 more
TL;DR: In this article, an aqueous Pd(II) dispersion, useful as a catalyst for the selective electroless deposition of nickel metal at ligand-bearing surfaces, is prepared by the hydrolysis of PdCl 4 2− at pH 5 in an approximately 0.01 mol dm −3 NaCl solution.