In this paper, a step-by-step approach was proposed to estimate the finger temperature in a silicon-based multifinger bipolar transistor structure from conventional measurements, where the superposition of raw measured data at around 40 mW power underestimates the true finger temperature by around 10% due to the linearity of the heat diffusion equation.
Abstract:
In this brief, we propose a step-by-step strategy to accurately estimate the finger temperature in a silicon-based multifinger bipolar transistor structure from conventional measurements First we extract the nearly zero-power self-heating resistances ( ${R}_{\text {th},\textit {ii}}$ ( ${T}_{a}$ )) and thermal coupling factors ( ${c}_{\textit {ij}}$ ( ${T}_{a}$ )) at a given ambient temperature Now, by applying the superposition principle on these variables at nearly zero-power, where the linearity of the heat diffusion equation is preserved, we estimate an effective thermal resistance ( ${R}_{\text {th},{i}}$ ( ${T}_{a}$ )) and the corresponding revised finger temperature ${T}_{i}$ ( ${T}_{a}$ ) Finally, the Kirchhoff’s transformation on ${T}_{i}$ ( ${T}_{a}$ ) yields the true temperature at each finger ( ${T}_{i}$ ( ${T}_{a},{P}_{d}$ )) The proposed extraction technique automatically includes the effects of back-end-of-line metal layers and different types of trenches present within the transistor structure The technique is first validated against 3-D TCAD simulation results of bipolar transistors with different emitter dimensions and then applied on actual measured data obtained from the state-of-the-art multifinger SiGe HBT from STMicroelectronics B5T technology It is observed that the superposition of raw measured data at around 40 mW power underestimates the true finger temperature by around 10%
TL;DR: In this paper , the authors present a compact modeling framework to optimize finger spacing for improving the thermal stability in multifinger bipolar transistors with shallow-trench isolation, and demonstrate its efficacy to achieve finger spacing optimization with the aid of an iterative algorithm.
TL;DR: In this article , the authors present a compact modeling framework to optimize finger spacing for improving the thermal stability in multifinger bipolar transistors with shallow-trench isolation, and demonstrate its efficacy to achieve finger spacing optimization with the aid of an iterative algorithm.
TL;DR: In this paper , a physics-based compact model of thermal resistance in resistive Random Access Memory (RRAM) devices considering thermal properties of electrode materials, temperature-induced variations in material thermal conductivity, and parasitic heat losses through the oxide surrounding the filament is presented.
TL;DR: In this paper , a robust technique to extract the thermal resistance component originating from the BEOL metal layers in silicon germanium heterojunction bipolar transistors (SiGe HBTs) is presented.
TL;DR: In this article , a robust technique to extract the thermal resistance component originating from the BEOL metal layers in silicon germanium heterojunction bipolar transistors (SiGe HBTs) is presented.
TL;DR: In this paper, a mathematical model of the three-dimensional transient heat flow problem is presented which takes into account the physical structure of the device and the actual region of power dissipation.
TL;DR: In this paper, the first 55 nm SiGe BiCMOS technology developed on a 300 mm wafer line in STMicroelectronics is presented, which features Low Power (LP) and General Purpose (GP) CMOS devices and 0.45 µm2 6T-SRAM bit cell.
TL;DR: Kirchhoff's transformation is summarised in a form appropriate for semiconductor-device heat sinks and then illustrated with a brief application to the thermal resistance of a GaAs laser.
TL;DR: In this paper, a measurement system comprised of an ultra-low-distortion function generator, lock-in amplifier, and semiconductor parameter analyzer is used for sensitive extraction of the small-signal thermal impedance network of bipolar devices and circuits.
TL;DR: A fully integrated stacked power amplifier in 0.25-μm SiGe BiCMOS technology that reaches a very high bandwidth of 800 MHz around 2 GHz and fulfilling the LTE specifications in terms of adjacent channel leakage ratio and error vector magnitude.
Q1. What have the authors contributed in "Extraction of true finger temperature from measured data in multi-finger bipolar transistors" ?
In this brief, the authors propose a step-by-step strategy to accurately estimate the finger temperature in a silicon based multi-finger bipolar transistor structure from conventional measurements. First the authors extract the nearly zero-power self-heating resistances ( Rth, ii ( Ta ) ) and thermal coupling factors ( cij ( Ta ) ) at a given ambient temperature.
Q2. What is the effect of the technique on the heating finger?
Base-emitter voltage (VBE) of the heating finger is varied from 0.4 to 0.98 V while a constant emitter current (IE) of 1 µA is forced at the sensing fingers.
Q3. What is the effect of the technique on the test structure?
The emitter fingers of the test structure (each with AE = 0.18 × 5 µm2) are individually accessible with a common collector while the bases are all connected to ground as detailed in [8].
Q4. What is the way to extract the true temperature of a multi-finger transistor?
one has to be careful while extracting the Rth,ii(Ta) and cij(Ta) by means of non-linear fitting and extrapolation towards zero dissipated power since the measurement uncertainty tends to increase at lower dissipated power.
Q5. What are the results of the on-wafer measurements?
On-wafer measurements were carried out on the test structure using a SUSS MicroTec probing station equipped with a thermal chuck to obtain the self-heating thermal resistances (Rth,ii) and coupling coefficients (cij) following the techniques elaborated in [7] and [8], respectively.
Q6. What is the corresponding temperature dependence of the thermal conductivity of the material?
the application of Kirchhoff’s transformation [15] on the calculated ∆Ti(Ta) takes care of the temperature dependence of material thermal conductivity and provides us with the true finger temperature asTi(Ta, Pd) = Ta( 1 +(1− α)Rth,i(Ta)Pd,i Ta) 1 1−α. (3)Here the parameter α is originated from the temperature dependent thermal conductivity of the heat flow medium which is modeled as κ(T ) = κ(Ta)(T/Ta)−α.
Q7. What is the effect of direct superposition on the junction temperature?
It is observed that the conventional approach of direct superposition underestimates the total junction temperature (Ti) by around 10% at around 40 mW power dissipation.
Q8. What is the temperature of the 4th finger?
5. Measured dissipated power-dependent (a) self-heating thermal resistance of 1st, 2nd and 3rd finger, and (b) coupling coefficients obtained when only 1stfinger is heating.