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Journal ArticleDOI

Fabrication and Analysis of Epitaxially Grown Ge $_{1-x}$ Sn $_x$ Microdisk Resonator With 20-nm Free-Spectral Range

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TLDR
In this article, a whispering gallery mode (WGM) microdisk resonator based on Ge1-xSnx grown by molecular beam epitaxy (MBE) was fabricated and characterized.
Abstract
In this work, a whispering gallery mode (WGM) microdisk resonator based on Ge1-xSnx grown by molecular beam epitaxy (MBE) was fabricated and characterized. Various process conditions and different Sn contents (4% and 1%) were explored to confirm the feasibility of Ge1-xSnx for microcavity device operation. Optical modes with wavelengths in the infrared (IR) range beyond 1550 nm were successfully confined in the devices fabricated with different diameters, and free-spectral ranges (FSRs) near 20 nm were obtained.

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Journal ArticleDOI

Si–Ge–Sn alloys: From growth to applications

TL;DR: In this paper, the transition from an indirect to a fundamental direct bandgap material will be discussed, and the most commonly used approaches, i.e., molecular beam epitaxy (MBE) and chemical vapor deposition (CVD), will be reviewed in terms of crucial process parameters, structural as well as optical quality and employed precursor combinations including Germanium hydrides, Silicon hydride and a variety of Sn compounds like SnD4, SnCl4 or C6H5SnD3.
Journal ArticleDOI

Group IV direct band gap photonics: Methods, Challenges and Opportunities

TL;DR: The concept of direct band gap group IV materials offers a paradigm change for Si-photonics concerning the monolithic implementation of light emitters: the idea is to integrate fully compatible group IV material with equally favorable optical properties as the chemically incompatible group III-V-based systems.
Journal ArticleDOI

Demonstration of a Ge/GeSn/Ge quantum-well microdisk resonator on silicon: enabling high-quality Ge(Sn) materials for micro- and nanophotonics.

TL;DR: A pseudomorphic Ge/Ge0.92Sn0.08/Ge quantum-well microdisk resonator on Ge/Si (001) as a route toward a compact GeSn-based laser on silicon is theoretically studied and experimentally demonstrated.
Journal ArticleDOI

Germanium based photonic components toward a full silicon/germanium photonic platform

TL;DR: In this paper, the authors show that optical germanium-on-insulator (GeOI) substrates fabricated by the Smart Cut™ technology is a key feature for future Si-complementary metal oxide Semiconductor (CMOS) compatible laser demonstration.
Journal ArticleDOI

Room-temperature electroluminescence from germanium in an Al 0.3 Ga 0.7 As/Ge heterojunction light-emitting diode by Γ-valley transport

TL;DR: Electroluminescence peaks were observed near 1550 nm and the energy around this wavelength corresponds to that emitted from direct recombination at the Γ-valley of germanium.
References
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Journal ArticleDOI

High- Q surface-plasmon-polariton whispering-gallery microcavity

TL;DR: A high-Q SPP whispering-gallery microcavity that is made by coating the surface of a high- Q silica microresonator with a thin layer of a noble metal is demonstrated and Q factors of 1,376 ± 65 can be achieved in the near infrared for surface-plasmonic whispering- gallery modes at room temperature.
Journal ArticleDOI

Whispering Gallery Mode Carousel--a photonic mechanism for enhanced nanoparticle detection in biosensing.

TL;DR: This Carousel trap, caused by attractive optical gradient forces, interfacial interactions, and the circulating momentum flux, considerably enhances the rate of transport to the sensing region, thereby overcoming limitations posed by diffusion on such small area detectors.
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Study of whispering gallery modes in anisotropic single-crystal dielectric resonators

TL;DR: In this article, the Rayleigh-Ritz method and the finite element method nongenerating spurious solutions are employed for analysis of whispering gallery modes (WGMs) in cylindrical single-crystal anisotropic dielectric resonators.
Journal ArticleDOI

Determination of the optical energy gap of Ge1−xSnx alloys with 0<x<0.14

TL;DR: In this article, the optical energy gap of Ge1−xSnx alloys has been determined from transmittance measurements, using a fast-Fourier-transform infrared interferometer, showing that the change from indirect to direct band gap occurs at a lower critical Sn concentration than the value predicted from the virtual crystal approximation, tight binding, and pseudopotential models.
Journal ArticleDOI

Mobility Behavior of Ge1-xSnxLayers Grown on Silicon-on-Insulator Substrates

TL;DR: In this paper, the authors investigated the behaviors of the carrier mobility and concentration of the undoped Ge1-xSnx layers epitaxially grown on silicon-on-insulator (SOI) substrates.
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